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14 条记录 (耗时 0.015 秒)

    Piezoresistive sensing structure
    4.
    发明授权
    Piezoresistive sensing structure 有权
    压阻感测结构

    公开(公告)号：US07371601B2

    公开(公告)日：2008-05-13

    申请号：US11127457

    申请日：2005-05-12

    申请人： David B. Rich ,  Steven M. Crist

    发明人： David B. Rich ,  Steven M. Crist

    IPC分类号： H01L21/00 ,  G01P15/00

    CPC分类号： B81C1/00142 ,  B81B2201/0235 ,  B81B2201/032 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81C2201/016 ,  G01P15/0802 ,  G01P15/123 ,  G01P2015/0828

    摘要： A technique for manufacturing a piezoresistive sensing structure includes a number of process steps. Initially, a piezoresistive element is implanted into a first side of an assembly that includes a semiconductor material. A passivation layer is then formed on the first side of the assembly over the element. The passivation layer is then removed from selected areas on the first side of the assembly. A first mask is then provided on the passivation layer in a desired pattern. A beam, which includes the element, is then formed in the assembly over at least a portion of the assembly that is to provide a cavity. The passivation layer provides a second mask, in the formation of the beam, that determines a width of the formed beam.

    摘要翻译： 制造压阻感测结构的技术包括多个工艺步骤。 最初，将压阻元件植入包括半导体材料的组件的第一侧。 然后在元件的组件的第一侧上形成钝化层。 然后从组件的第一侧上的选定区域去除钝化层。 然后以期望的图案在钝化层上提供第一掩模。 包括元件的梁然后在组件中形成在组件的至少一部分上以提供空腔。 钝化层在形成光束时提供第二掩模，其确定形成的光束的宽度。

    Handle and handled implement
    6.
    发明授权
    Handle and handled implement 失效
    把手处理工具

    公开(公告)号：US5274872A

    公开(公告)日：1994-01-04

    申请号：US846963

    申请日：1992-03-06

    申请人： David B. Rich

    发明人： David B. Rich

    IPC分类号： A46B5/00 ,  B25G3/04 ,  B25G3/30 ,  A46B5/02

    CPC分类号： A46B5/0095 ,  B25G3/04 ,  B25G3/30

    摘要： A handle for a handled implement. The handle has a stub, a yoke and a haft. The stub has a shank and a head. The stub has a longitudinal axis. The yoke is disposed on the shank. The yoke abuts the head axially. The yoke is free to rotate about the axis relative to the stub. The yoke has at least one lug disposed in spaced radial relation to the shank. The haft is elongate and engages the head. The haft is joined to the yoke in fixed rotational relation.

    摘要翻译： 处理工具的手柄。 手柄有一个短柄，一个轭和一个。 刀柄有柄和头。 短截线具有纵向轴线。 轭设置在柄上。 磁轭轴向与磁头相接。 轭可绕相对于短截线的轴线自由旋转。 轭具有至少一个与柄相隔成径向关系的凸耳。 头部是细长的并与头部接合。 磁轭以固定的旋转关系连接到磁轭。

    Impact detector
    7.
    发明授权
    Impact detector 失效
    冲击检测器

    公开(公告)号：US5177331A

    公开(公告)日：1993-01-05

    申请号：US726099

    申请日：1991-07-05

    申请人： David B. Rich ,  Dan W. Chilcott

    发明人： David B. Rich ,  Dan W. Chilcott

    IPC分类号： G01L5/00 ,  G01P15/135 ,  H01H1/00 ,  H01H35/14

    CPC分类号： G01P15/135 ,  H01H1/0036 ,  H01H35/14 ,  H01H2001/0063 ,  H01H35/142

    摘要： An impact detector includes a center chip of micromachined silicon, a top cap, and a back plate, with the center chip being sandwiched between the top cap and the back plate. The center chip is micromachined to provide a seismic mass, a perimeter ring, and a plurality of beams interconnecting the perimeter ring and the seismic mass. The center chip and back plate mount aligned switch contacts which close to each other when the seismic mass moves from its static or nondisplaced position to its operative or displaced position. An electrostatic attractive force is generated between the seismic mass and the back plate. This electrostatic attractive force is less than the tensile force applied to the seismic mass by the beams so that the seismic mass remains in its static or nondisplaced position unless the impact detector is subjected to an impulsive force of sufficient magnitude and duration such that the inertial reaction force of the seismic mass when coupled with the electrostatic attractive force is greater than the tensile force so that the seismic mass moves to the operative displaced position. In the operative displaced position, the electrostatic attractive force latches the switch contacts to each other until the electrostatic attractive force is reduced and the tensile force can then return the seismic mass to its static or nondisplaced position.

    SURGICAL VIEWING SYSTEM
    8.
    发明申请
    SURGICAL VIEWING SYSTEM 审中-公开

    公开(公告)号：US20170164958A1

    公开(公告)日：2017-06-15

    申请号：US15441759

    申请日：2017-02-24

    申请人： David B. Rich

    发明人： David B. Rich

    IPC分类号： A61B17/17 ,  A61B17/16 ,  A61B90/00

    CPC分类号： A61B17/1703 ,  A61B17/1615 ,  A61B17/162 ,  A61B17/1622 ,  A61B17/1626 ,  A61B17/1717 ,  A61B17/1725 ,  A61B90/37 ,  A61B90/39 ,  A61B2017/0092 ,  A61B2090/376 ,  A61B2090/3966

    摘要： A surgical viewing system including an X-ray source, a screw placing surgical tool, a detector, a fiducial marker, and an image correction system. The X-ray source creates a beam of radiation, and the surgical tool is coupled thereto. The X-ray detector detects an image, the detected image resulting from receiving a portion of the radiation. There is at least one fiducial marker coupled to a part of the surgical tool, the fiducial marker being radiopaque and blocking a portion of the beam of radiation from the detector to produce a profile on the detected image. The surgical tool has an axis of rotation and the fiducial marker is axially symmetric to the axis of rotation. The image correction system takes the detected image and produces a corrected image by using a shape of the profile of the fiducial marker and/or a location of the profile of the fiducial marker.

    Piezoresistive sensing structure
    10.
    发明申请
    Piezoresistive sensing structure 审中-公开
    压阻感测结构

    公开(公告)号：US20080179698A1

    公开(公告)日：2008-07-31

    申请号：US12079726

    申请日：2008-03-28

    申请人： David B. Rich ,  Steven M. Crist

    发明人： David B. Rich ,  Steven M. Crist

    IPC分类号： H01L29/08

    CPC分类号： B81C1/00142 ,  B81B2201/0235 ,  B81B2201/032 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81C2201/016 ,  G01P15/0802 ,  G01P15/123 ,  G01P2015/0828

    摘要： A piezoresistive sensing structure includes an assembly formed of a semiconductor material and including a cavity and a plurality of piezoresistive elements implanted into the assembly. The assembly includes a central mass coupled to a peripheral frame with a plurality of beams. Each beam is about 15 microns in width and includes one of the piezoresistive elements. The assembly may also include a first wafer having the cavity formed into a first side, and a second wafer with a plurality of beams formed in a first side. The second side of the second wafer is bonded to the first side of the first wafer.

    摘要翻译： 压阻感测结构包括由半导体材料形成并包括腔体和多个压电元件的组件，所述压电元件植入组件中。 组件包括耦合到具有多个梁的外围框架的中心质量。 每个光束的宽度约为15微米，并且包括压阻元件之一。 组件还可以包括具有形成为第一侧的空腔的第一晶片和在第一侧中形成有多个梁的第二晶片。 第二晶片的第二面被结合到第一晶片的第一侧。