公开(公告)号：US20180208773A1

公开(公告)日：2018-07-26

申请号：US15934365

申请日：2018-03-23

Applicant: FUJIFILM Corporation

Inventor： Takashi IIZUMI ,  Kazunari YAGI ,  Keiichi TATEISHI

IPC: C09B11/14 ,  C09D11/328 ,  D06P1/40 ,  D06P3/24 ,  D06P5/30

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) described in the specification, a coloring composition for dyeing or textile printing including the compound, an ink for ink jet textile printing, a method of printing on fabric, and a dyed or printed fabric.

公开(公告)号：US20170247544A1

公开(公告)日：2017-08-31

申请号：US15592749

申请日：2017-05-11

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Keiichi TATEISHI ,  Takashi IIZUMI ,  Akihiro HAKAMATA ,  Yoshihiko FUJIE

IPC: C09B11/28 ,  B41M5/52 ,  D06P1/40 ,  C09D11/328 ,  D06P3/24 ,  B41J3/407 ,  B41J2/21

CPC classification number: C09B11/28 ,  B41J2/01 ,  B41J2/21 ,  B41J3/4078 ,  B41M5/00 ,  B41M5/50 ,  B41M5/52 ,  C09B11/24 ,  C09D11/328 ,  C09D11/54 ,  D06P1/00 ,  D06P1/40 ,  D06P3/04 ,  D06P3/241 ,  D06P5/00

Abstract: Provided are: a coloring composition for dyeing including a compound represented by Formula (1) shown in this specification or a salt thereof; a coloring composition for textile printing in which the coloring composition for dyeing is used for textile printing; a compound which is preferable as a material of the coloring compositions; a textile printing method in which the above-described coloring composition for textile printing is used; an ink for ink jet textile printing including the above-described coloring composition for textile printing; and a dyed fabric.

公开(公告)号：US20150037546A1

公开(公告)日：2015-02-05

申请号：US14517926

申请日：2014-10-20

Applicant: FUJIFILM CORPORATION

Inventor： Kazunari YAGI ,  Yasuhiro ISHIWATA ,  Yutaro NORIZUKI

IPC: D06P3/24 ,  D06P5/30 ,  D06P1/08

CPC classification number: D06P3/24 ,  B41J2/01 ,  B41M5/00 ,  C09B29/0051 ,  C09B29/0801 ,  C09B29/0809 ,  C09B43/11 ,  C09D11/00 ,  C09D11/328 ,  D06P1/08 ,  D06P1/18 ,  D06P3/26 ,  D06P5/30 ,  Y10T428/2481

Abstract: A coloring composition for inkjet textile printing, containing water and a dye represented by Formula (I) [R1 represents H, halogen, alkyl, aralkyl, aryl, heteroaryl, alkoxy, or cyano; R2 represents H, halogen, cyano, —COOR6, —COR7, —CONR8R9, or an ionic hydrophilic group; R3 represents alkyl, aralkyl, alkenyl, alkynyl, aryl, or heteroaryl; each of R4 and R5 independently represents H, alkyl, cycloalkyl, aralkyl, alkenyl, alkynyl, aryl, or heteroaryl; R15 represents H or a substituent; X represents alkyl, cycloalkyl, aralkyl, aryl, heteroaryl, —COR12, or —CONR13R14; R6 represents alkyl, aryl, or heteroaryl; each of R7 to R14 independently represents H, alkyl, aryl, or heteroaryl; and a number of ionic hydrophilic groups in one molecule is from 1 to 5].

Abstract translation: 用于喷墨织物印花的着色组合物，含有水和由式（I）表示的染料[R1表示H，卤素，烷基，芳烷基，芳基，杂芳基，烷氧基或氰基; R 2表示H，卤素，氰基，-COOR 6，-COR 7，-CONR 8 R 9或离子性亲水基团; R 3表示烷基，芳烷基，烯基，炔基，芳基或杂芳基; R 4和R 5各自独立地表示H，烷基，环烷基，芳烷基，烯基，炔基，芳基或杂芳基; R 15表示H或取代基; X表示烷基，环烷基，芳烷基，芳基，杂芳基，-COR 12或-CONR 13 R 14; R6表示烷基，芳基或杂芳基; R 7至R 14各自独立地表示H，烷基，芳基或杂芳基; 并且一个分子中的多个离子亲水基团为1〜5]。

公开(公告)号：US20140084578A1

公开(公告)日：2014-03-27

申请号：US14036166

申请日：2013-09-25

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Shinya HAYASHI ,  Yutaro NORIZUKI ,  Takashi IIZUMI ,  Ichiro AMASAKI ,  Hiroshi YAMADA ,  Shigeaki TANAKA

IPC: C09D11/00 ,  B41J2/175

CPC classification number: C09D11/328 ,  B41J2/17503 ,  C09B31/153 ,  C09D11/40

Abstract: There is provided a compound represented by the following formula (1): wherein each of R1a to R1k independently represents a hydrogen atom or a monovalent substituent, the substituents may combine with each other to form a ring, each of M1a and M1b independently represents a hydrogen atom or a monovalent counter cation, Y1 represents a nitrogen atom or a carbon atom having a hydrogen atom or monovalent substituent, A1 represents an aromatic group, and the aromatic group represented by A1 may contain a heteroatom or may have a substituent.

Abstract translation: 提供由下式（1）表示的化合物：其中R1a至R1k各自独立地表示氢原子或一价取代基，取代基可以相互结合形成环，M1a和M1b各自独立地表示 氢原子或一价抗衡阳离子，Y1表示氮原子或具有氢原子或一价取代基的碳原子，A1表示芳香族基，由A1表示的芳香族基可以含有杂原子，也可以具有取代基。

公开(公告)号：US20230045851A1

公开(公告)日：2023-02-16

申请号：US17903158

申请日：2022-09-06

Applicant: FUJIFILM CORPORATION

Inventor： Naohiro TANGO ,  Michihiro SHIRAKAWA ,  Kyohei SAKITA ,  Akiyoshi GOTO ,  Kazunari YAGI ,  Mitsuhiro FUJITA

IPC: G03F7/039

Abstract: A method for producing a resist composition includes setting parameter, acquiring a pattern size for a regression analysis, analyzing performing a regression analysis, calculating a pattern size of a target resist composition based on the regression analysis, comparing the pattern size of the target resist composition and the target pattern size, determining a formulating amount of the resist composition in a case where a difference between the pattern size of the target resist composition and the target pattern size is within an allowable range, and producing a resist composition based on the determined formulating amount, in which, in a case where the difference is out of the allowable range, the method further includes changing at least the content of components in the target resist composition, and the formulating amount of the resist composition is determined based on the changed physical quantity to produce the resist composition.

公开(公告)号：US20210191265A1

公开(公告)日：2021-06-24

申请号：US17193007

申请日：2021-03-05

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Michihiro OGAWA ,  Akiyoshi GOTO ,  Daisuke ASAKAWA

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F220/28 ,  C08F212/14

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in the sensitivity of a resist film to be formed to EUV and excellent in the LER of a positive tone pattern to be formed upon EUV exposure. In addition, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin having a polarity that increases by an action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1).

公开(公告)号：US20170101533A1

公开(公告)日：2017-04-13

申请号：US15384497

申请日：2016-12-20

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Hiromi KOBAYASHI ,  Takashi IIZUMI ,  Yoshiaki NAGATA ,  Keiichi TATEISHI ,  Kazushi FURUKAWA

IPC: C09B11/12 ,  D06P1/00 ,  D06P5/00 ,  C09D11/037 ,  D06P5/30 ,  D06P1/46 ,  C09D11/328 ,  C09B11/04 ,  D06P5/20

CPC classification number: C09B11/12 ,  C09B11/04 ,  C09B11/10 ,  C09D11/037 ,  C09D11/328 ,  D06P1/00 ,  D06P1/40 ,  D06P1/46 ,  D06P5/00 ,  D06P5/20 ,  D06P5/2077 ,  D06P5/30

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) (for example, the following compound), a coloring composition for dyeing or textile printing including the compound, an ink jet ink including the coloring composition for dyeing or textile printing, a method of printing on fabric, and a dyed or printed fabric, in which the color is excellent, the color optical density is high, and light fastness, water fastness, and chlorine fastness are excellent.

公开(公告)号：US20140366285A1

公开(公告)日：2014-12-18

申请号：US14472372

申请日：2014-08-29

Applicant: FUJIFILM CORPORATION

Inventor： Hiromi KOBAYASHI ,  Yoshiaki KONDOU ,  Yoshiharu YABUKI ,  Kazunari YAGI

IPC: D06P5/30 ,  C09B47/04 ,  D06P1/30

CPC classification number: D06P5/30 ,  C09B47/04 ,  C09B47/0675 ,  C09B47/18 ,  C09D11/328 ,  D06P1/14 ,  D06P1/30 ,  D06P3/241

Abstract: A coloring composition for textile printing including a dye represented by Formula (X) and water are provided [in Formula (X), each of X21 to X24 independently represents an oxygen atom or a sulfur atom; each of R21 to R24 represents an alkyl group, an aryl group, or a heteroaryl group; M represents a hydrogen atom, a metal element, a metal oxide, a metal hydroxide, or a metal halide; each of P1 to P4 independently represents an aromatic ring, and the aromatic ring may have a particular substituent; each of n21 to n24 independently represents from 0 to 4, and the sum of n21 to n24 is at least 1; provided that, the structure of Formula (X) contains at least two ionic hydrophilic groups].

Abstract translation: [式（X）中，[X 21〜X 24]各自独立地表示氧原子或硫原子，作为纺丝印刷用着色组合物，包括由式（X）表示的染料和水。 R21〜R24各自表示烷基，芳基或杂芳基; M表示氢原子，金属元素，金属氧化物，金属氢氧化物或金属卤化物; P1〜P4各自独立地表示芳香环，芳环可以具有特定的取代基; n21〜n24各自独立地表示0〜4，n21〜n24的和为1以上。 条件是式（X）的结构含有至少两个离子亲水基团]。

公开(公告)号：US20250043183A1

公开(公告)日：2025-02-06

申请号：US18919071

申请日：2024-10-17

Applicant: FUJIFILM Corporation

Inventor： Shinichi MORISHIMA ,  Kazunari YAGI

IPC: C09K19/38

Abstract: An optically anisotropic layer; a liquid crystal cell; a liquid crystal display device; a sensor; a lens; a switching element; an isolator; and a camera include a composition, the composition which can form a liquid crystal layer having a maximal absorption wavelength in an infrared region (particularly, a wavelength of 1,000 to 1,700 nm) and excellent absorption anisotropy. The composition contains at least one specific compound selected from the group consisting of a coloring agent compound having a cationic structure represented by Formula (I) and a reduction body of the coloring agent compound, and a liquid crystal compound.

公开(公告)号：US20220382153A1

公开(公告)日：2022-12-01

申请号：US17877316

申请日：2022-07-29

Applicant: FUJIFILM Corporation

Inventor： Akira TAKADA ,  Akiyoshi GOTO ,  Kazunari YAGI ,  Michihiro SHIRAKAWA ,  Kazuhiro MARUMO

IPC: G03F7/039 ,  G03F7/20

Abstract: The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.