公开(公告)号：US20140248556A1

公开(公告)日：2014-09-04

申请号：US14280128

申请日：2014-05-16

Applicant: FUJIFILM CORPORATION

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Hidenori TAKAHASHI ,  Sou KAMIMURA

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/325 ,  H01L21/0274

Abstract: A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.

Abstract translation: 一种图案形成方法，包括：（i）使用含有具有通过酸的作用分解产生极性基团的重复单元的树脂（A）的光化射线敏感性或辐射敏感性树脂组合物形成膜 和具有芳基的重复单元，在用光化射线或辐射照射时产生酸的化合物（B）和溶剂（C）; （ii）曝光胶片; 和（iii）使用包含有机溶剂的显影剂显影曝光的膜以形成负色调图案，其中树脂（A）是具有萘基的重复单元的树脂等，和/或光化射线 敏感性或辐射敏感性树脂组合物含有具有萘环的化合物（D）等。

公开(公告)号：US20140127629A1

公开(公告)日：2014-05-08

申请号：US14153613

申请日：2014-01-13

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO ,  Shohei KATAOKA ,  Shoichi SAITOH

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/40

Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm or greater amount to a density of 30 particles/ml or less.

Abstract translation: 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成在膜中，（b）将膜曝光，和（c）用含有第一有机溶剂的显影剂显影曝光的膜，其中在 显影剂，每个具有0.3μm或更大直径的颗粒的密度为30个/ ml或更小。

公开(公告)号：US20220252985A1

公开(公告)日：2022-08-11

申请号：US17724956

申请日：2022-04-20

Applicant: FUJIFILM Corporation

Inventor： Toshiaki FUKUHARA ,  Takeshi KAWABATA ,  Sou KAMIMURA

IPC: G03F7/075 ,  G03F7/11 ,  G03F7/32 ,  G03F7/20

Abstract: A composition for forming an underlayer film is used for forming an underlayer film under a resist film, the composition including a silicon atom-containing compound and a halogen-based solvent, in which a content of the halogen-based solvent is 1.0 ppb by mass to 50.0 ppm by mass with respect to a total mass of the composition for forming an underlayer film.

公开(公告)号：US20160004156A1

公开(公告)日：2016-01-07

申请号：US14853119

申请日：2015-09-14

Applicant: FUJIFILM CORPORATION

Inventor： Shinichi SUGIYAMA ,  Sou KAMIMURA ,  Akiyoshi GOTO

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/038 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  C08F212/12 ,  C08F220/24 ,  C08F220/06 ,  C08F2220/1858

Abstract: There is provided a pattern forming method including: (1) filtering, by using a filter, a resin solution containing (A) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent, and (C1) a solvent; (2) preparing an actinic ray-sensitive or radiation-sensitive resin composition containing the resin (A) obtained from the filtrating (1) and a solvent (C2) different from the solvent (C1); (3) filtering the actinic ray-sensitive or radiation-sensitive resin composition by using a filter; (4) forming a film by using a filtrate obtained by the filtering (3); (5) exposing the film; and (6) performing development using a developer containing an organic solvent to form a negative pattern, wherein an absolute value of the difference between solubility parameter (SPC1) of the solvent (C1) and solubility parameter (SPDEV) of the developer (C1), |SPC1−SPDEV|, is 1.00 (cal/cm3)1/2 or less.

Abstract translation: 提供了一种图案形成方法，包括：（1）通过使用过滤器过滤包含（A）能够通过酸的作用增加其极性的树脂的树脂溶液，以降低在包含有机溶剂的显影剂中的溶解度， 和（C1）溶剂; （2）制备含有从过滤（1）得到的树脂（A）和不同于溶剂（C1）的溶剂（C2））的光化射线敏感或辐射敏感性树脂组合物; （3）使用过滤器过滤光化学敏感或辐射敏感性树脂组合物; （4）通过使用通过过滤（3）获得的滤液形成膜; （5）曝光胶片; 和（6）使用包含有机溶剂的显影剂进行显影以形成负图案，其中溶剂（C1）的溶解度参数（SPC1）与显影剂（C1）的溶解度参数（SPDEV）之间的差异的绝对值 SPC1-SPDEV |为1.00（cal / cm3）1/2以下。

公开(公告)号：US20240053679A1

公开(公告)日：2024-02-15

申请号：US18362376

申请日：2023-07-31

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Sou KAMIMURA ,  Yoichi NISHIDA ,  Hideaki TSUBAKI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/2006

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) undergoing an increase in alkali solubility due to action of acid; a compound (C) generating acid upon irradiation with an actinic ray or radiation; and a solvent (S) including a solvent SA having a boiling point of 130° C. to 150° C. and a solvent SB having a boiling point of 155° C. to 250° C., in which a content of the solvent SA is higher than a content of the solvent SB, the content of the solvent SB relative to the whole solvent is 1% to 30% by mass, and a concentration of solid contents is 10% by mass or more.

公开(公告)号：US20150293454A1

公开(公告)日：2015-10-15

申请号：US14749035

申请日：2015-06-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Kaoru IWATO ,  Keita KATO ,  Kana FUJII

IPC: G03F7/42

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

Abstract translation: 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中 显影剂含有基于显影剂总质量为0至小于500ppm的醇化合物（X）。

公开(公告)号：US20150147699A1

公开(公告)日：2015-05-28

申请号：US14607146

申请日：2015-01-28

Applicant: FUJIFILM Corporation

Inventor： Sou KAMIMURA ,  Hidenori TAKAHASHI ,  Keita KATO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F212/14 ,  C08F212/32 ,  C08F220/04 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/58 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/30 ,  G03F7/325 ,  G03F7/40

Abstract: The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (B) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film using a KrF excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tonetone pattern by developing the exposed film using a developer which includes an organic solvent.

Abstract translation: 本发明的图案形成方法包括：（i）使用含有具有包含能够产生极性基团的重复单元的树脂（A）的光化射线敏感性或辐射敏感性树脂组合物形成膜， 由于酸和包含羧基的重复单元的作用，根据光化射线或辐射照射产生酸的化合物（B）和溶剂（C）而分解; （ii）使用KrF准分子激光器，极紫外线或电子束曝光该膜; 和（iii）通过使用包括有机溶剂的显影剂显影所述曝光的膜来形成阴性图案。

公开(公告)号：US20160223905A1

公开(公告)日：2016-08-04

申请号：US15092871

申请日：2016-04-07

Applicant: FUJIFILM Corporation

Inventor： Keiyu OU ,  Keita KATO ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO ,  Sou KAMIMURA

IPC: G03F7/004 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/325

Abstract: This active light-sensitive or radiation-sensitive resin composition contains a resin (A), a compound (B) capable of generating an acid upon irradiation with active light or radiation, and a compound (C) having at least one oxygen atom. The compound (C) does not include the resin (A) and the compound (B).

Abstract translation: 该活性的光敏性或辐射敏感性树脂组合物含有树脂（A），能够用活性光或辐射照射时能产生酸的化合物（B）和具有至少一个氧原子的化合物（C）。 化合物（C）不包括树脂（A）和化合物（B）。

公开(公告)号：US20130122427A1

公开(公告)日：2013-05-16

申请号：US13725483

申请日：2012-12-21

Applicant: FUJIFILM CORPORATION

Inventor： Shohei KATAOKA ,  Kaoru IWATO ,  Kana FUJII ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Keita KATO ,  Shuhei YAMAGUCHI

IPC: G03F7/004

CPC classification number: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

Abstract translation: 图案形成方法包括：（i）由光化学射线敏感或辐射敏感的树脂组合物形成膜，所述树脂组合物含有（A）在用光化射线或辐射照射时能够产生酸的化合物，并通过 酸降低化合物（A）对有机溶剂的溶解度的作用; （ii）曝光胶片; 和（iii）通过使用含有有机溶剂的显影剂进行显影。

公开(公告)号：US20130045365A1

公开(公告)日：2013-02-21

申请号：US13656960

申请日：2012-10-22

Applicant: FUJIFILM CORPORATION

Inventor： Keita KATO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO

IPC: G03F7/20 ,  B32B3/30 ,  G03F7/004

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.

Abstract translation: 一种图案形成方法，包括：（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）通过使用含有机溶剂的显影膜的步骤 显影剂，其中抗蚀剂组合物包含：（A）树脂，（B）在用光化射线或辐射照射时能够产生酸的非离子化合物，（C）交联剂和（D）溶剂。