EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
    3.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD 有权
    极光紫外线发光装置和超极紫外光发生方法

    公开(公告)号:US20130320232A1

    公开(公告)日:2013-12-05

    申请号:US13904117

    申请日:2013-05-29

    CPC classification number: H05G2/008 G21K5/04 H05G2/005 H05G2/006

    Abstract: An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device.

    Abstract translation: 极紫外线发生装置可以包括:液滴制造装置,其被配置为在预定的行进方向上产生目标物质的液滴;第一激光装置,其被配置为产生第一激光束并用第一激光束照射液滴, 液滴,第二激光装置,被配置为产生第二激光束并且通过用第二激光束照射第一激光束来照射被扩散的目标物质,以产生扩散目标物质的等离子体并从目标的等离子体产生极紫外光 以及光束整形单元,其被配置为在由液滴产生装置产生的液滴的行进方向上拉长第一激光束的束斑。

    Extreme ultraviolet light generation by polarized laser beam
    4.
    发明授权
    Extreme ultraviolet light generation by polarized laser beam 有权
    通过极化激光束产生极紫外光

    公开(公告)号:US09055657B2

    公开(公告)日:2015-06-09

    申请号:US13904117

    申请日:2013-05-29

    CPC classification number: H05G2/008 G21K5/04 H05G2/005 H05G2/006

    Abstract: An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device.

    Abstract translation: 极紫外线发生装置可以包括:液滴制造装置,其被配置为在预定的行进方向上产生目标物质的液滴;第一激光装置,其被配置为产生第一激光束并用第一激光束照射液滴, 液滴,第二激光装置,被配置为产生第二激光束并且通过用第二激光束照射第一激光束来照射被扩散的目标物质,以产生扩散目标物质的等离子体并从目标的等离子体产生极紫外光 以及光束整形单元,其被配置为在由液滴产生装置产生的液滴的行进方向上拉长第一激光束的束斑。

    Two-beam interference apparatus and two-beam interference exposure system
    5.
    发明授权
    Two-beam interference apparatus and two-beam interference exposure system 有权
    双光束干涉仪和双光束干涉曝光系统

    公开(公告)号:US09507248B2

    公开(公告)日:2016-11-29

    申请号:US13681744

    申请日:2012-11-20

    CPC classification number: G03B27/522 G03F7/70408

    Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

    Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台,分束器,用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光, 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光,从与第一方向垂直但与第二方向不同的第三方向照射第三激光,从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。

    Discharge-pumped gas laser device
    6.
    发明授权
    Discharge-pumped gas laser device 有权
    排气泵气体激光装置

    公开(公告)号:US09225139B2

    公开(公告)日:2015-12-29

    申请号:US14531876

    申请日:2014-11-03

    Abstract: A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber.

    Abstract translation: 放电泵浦气体激光装置可以包括激光室,设置在激光室中的一对放电电极,具有磁性轴承的风扇设置在激光室中并且能够使激光室中的气体循环, 被配置为容纳激光室的壳体,以及与磁性轴承电连接的磁性轴承控制器,其能够控制磁性轴承,并且与激光室分开设置在壳体中。

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