NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    非易失性半导体存储器件及其制造方法

    公开(公告)号:US20120205612A1

    公开(公告)日:2012-08-16

    申请号:US13454625

    申请日:2012-04-24

    IPC分类号: H01L45/00 H01L21/8239

    摘要: A nonvolatile semiconductor memory device comprises a semiconductor substrate; a cell array block formed on the semiconductor substrate and including plural stacked cell array layers each with a plurality of first lines, a plurality of second lines crossing the plurality of first lines, and memory cells connected at intersections of the first and second lines between both lines; and a plurality of via-holes extending in the stacked direction of the cell array layers to individually connect the first or second line in the each cell array layer to the semiconductor substrate. The via-holes are formed continuously through the plural cell array layers, and multiple via-holes having equal lower end positions and upper end positions are connected to the first or second lines in different cell array layers.

    摘要翻译: 非易失性半导体存储器件包括半导体衬底; 形成在所述半导体衬底上的单元阵列块,并且包括多个堆叠的单元阵列层,每个堆叠的单元阵列层具有多个第一线,与所述多条第一线交叉的多个第二线,以及在所述第一和第二线的两个交点处连接的存储单元 线条 以及在单元阵列层的堆叠方向上延伸的多个通孔,以将每个单元阵列层中的第一或第二线分别连接到半导体基板。 通孔连续地形成在多个单元阵列层中,并且具有相同的下端位置和上端位置的多个通孔与不同的单元阵列层中的第一或第二线连接。

    SEMICONDUCTOR MEMORY DEVICE
    3.
    发明申请
    SEMICONDUCTOR MEMORY DEVICE 有权
    半导体存储器件

    公开(公告)号:US20110241225A1

    公开(公告)日:2011-10-06

    申请号:US13158098

    申请日:2011-06-10

    IPC分类号: H01L23/48

    摘要: A semiconductor memory device includes a memory block having a three-dimensional memory cell array structure in which memory cell arrays are stacked, the memory cell array including: a plurality of first interconnections which are parallel to one another; a plurality of second interconnections which are formed so as to intersect with the plurality of first interconnections, the second interconnections being parallel to one another; and a memory cell which is disposed in each intersection portion of the first interconnection and the second interconnection, one end of the memory cell being connected to the first interconnection, the other end of the memory cell being connected to the second interconnection. The first interconnection disposed between the adjacent memory cell arrays is shared by memory cells above and below the first interconnection, and the vertically-overlapping first interconnections are connected to each other.

    摘要翻译: 一种半导体存储器件包括具有堆叠存储单元阵列的三维存储单元阵列结构的存储块,所述存储单元阵列包括:彼此平行的多个第一互连; 多个第二互连形成为与所述多个第一互连相交,所述第二互连彼此平行; 以及存储单元,其设置在所述第一互连和所述第二互连的每个交叉部分中,所述存储单元的一端连接到所述第一互连,所述存储单元的另一端连接到所述第二互连。 设置在相邻存储单元阵列之间的第一互连由第一互连之上和之下的存储单元共享,并且垂直重叠的第一互连彼此连接。

    SEMICONDUCTOR MEMORY DEVICE
    4.
    发明申请
    SEMICONDUCTOR MEMORY DEVICE 有权
    半导体存储器件

    公开(公告)号:US20090141532A1

    公开(公告)日:2009-06-04

    申请号:US12325040

    申请日:2008-11-28

    IPC分类号: G11C5/02 G11C5/06

    摘要: A semiconductor memory device includes a memory block having a three-dimensional memory cell array structure in which memory cell arrays are stacked, the memory cell array including: a plurality of first interconnections which are parallel to one another; a plurality of second interconnections which are formed so as to intersect with the plurality of first interconnections, the second interconnections being parallel to one another; and a memory cell which is disposed in each intersection portion of the first interconnection and the second interconnection, one end of the memory cell being connected to the first interconnection, the other end of the memory cell being connected to the second interconnection. The first interconnection disposed between the adjacent memory cell arrays is shared by memory cells above and below the first interconnection, and the vertically-overlapping first interconnections are connected to each other.

    摘要翻译: 一种半导体存储器件包括具有堆叠存储单元阵列的三维存储单元阵列结构的存储块,所述存储单元阵列包括:彼此平行的多个第一互连; 多个第二互连形成为与所述多个第一互连相交,所述第二互连彼此平行; 以及存储单元,其设置在所述第一互连和所述第二互连的每个交叉部分中,所述存储单元的一端连接到所述第一互连,所述存储单元的另一端连接到所述第二互连。 设置在相邻存储单元阵列之间的第一互连由第一互连之上和之下的存储单元共享,并且垂直重叠的第一互连彼此连接。

    NONVOLATILE SEMICONDUCTOR STORAGE APPARATUS AND METHOD FOR MANUFACTURING THE SAME
    6.
    发明申请
    NONVOLATILE SEMICONDUCTOR STORAGE APPARATUS AND METHOD FOR MANUFACTURING THE SAME 有权
    非挥发性半导体存储装置及其制造方法

    公开(公告)号:US20080099819A1

    公开(公告)日:2008-05-01

    申请号:US11874004

    申请日:2007-10-17

    摘要: According to an aspect of the present invention, there is provided a nonvolatile semiconductor storage apparatus including: a substrate; a columnar semiconductor disposed perpendicular to the substrate; a charge storage laminated film disposed around the columnar semiconductor; a first conductor layer that is in contact with the charge storage laminated film and that has a first end portion having a first end face; a second conductor layer that is in contact with the charge storage laminated film, that is separated from the first conductor layer and that has a second end portion having a second end face; a first contact plug disposed on the first end face; and a second contact plug disposed on the second end face.

    摘要翻译: 根据本发明的一个方面,提供了一种非易失性半导体存储装置,包括:基板; 垂直于衬底设置的柱状半导体; 设置在所述柱状半导体周围的电荷存储层叠膜; 与所述电荷存储叠层膜接触并具有第一端部的第一导体层,所述第一端部具有第一端面; 与电荷存储叠层膜接触的第二导体层,其与第一导体层分离并且具有具有第二端面的第二端部; 设置在所述第一端面上的第一接触插塞; 以及设置在所述第二端面上的第二接触插塞。