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    RADIATION-SENSITIVE RESIN COMPOSITION
    1.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
    辐射敏感性树脂组合物

    公开(公告)号：US20120183902A1

    公开(公告)日：2012-07-19

    申请号：US13338260

    申请日：2011-12-28

    申请人： Hiroki Nakagawa ,  Takehiko Naruoka ,  Shinichi Nakamura ,  Kazuki Kasahara

    发明人： Hiroki Nakagawa ,  Takehiko Naruoka ,  Shinichi Nakamura ,  Kazuki Kasahara

    IPC分类号： G03F7/027

    CPC分类号： G03F7/0397 ,  G03F7/0045

    摘要： A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.

    摘要翻译： 辐射敏感性树脂组合物包括含酸不稳定基团的树脂，辐射敏感性酸产生剂和包含由以下通式（1-1）表示的第一化合物的酸扩散控制剂和由 以下通式（1-2）或（1-3）。 式（1-1）中，R 1和R 2分别表示氢原子等，R p表示酸不稳定基。 式（1-2）中，R3表示氢原子等，R4〜R6各自表示氢原子等。 在式（1-3）中，R 3表示氢原子等，R q表示单键等，R 5和R 6各自表示氢原子等。

    PATTERN-FORMING METHOD
    2.
    发明申请
    PATTERN-FORMING METHOD 有权
    图案形成方法

    公开(公告)号：US20130107235A1

    公开(公告)日：2013-05-02

    申请号：US13283582

    申请日：2011-10-28

    申请人： Hayato NAMAI ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

    发明人： Hayato NAMAI ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

    IPC分类号： G03B27/52

    CPC分类号： G03F7/40 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405 ,  H01L21/0337

    摘要： A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

    摘要翻译： 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量％以上的显影剂显影抗蚀剂膜，以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。

    Pattern-forming method
    3.
    发明授权
    Pattern-forming method 有权
    图案形成方法

    公开(公告)号：US08703395B2

    公开(公告)日：2014-04-22

    申请号：US13283582

    申请日：2011-10-28

    申请人： Hayato Namai ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

    发明人： Hayato Namai ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

    IPC分类号： G03F7/26

    CPC分类号： G03F7/40 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405 ,  H01L21/0337

    摘要： A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

    摘要翻译： 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量％以上的显影剂显影抗蚀剂膜，以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。

    RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD
    4.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD 审中-公开
    辐射敏感性树脂组合物和耐蚀图案形成方法

    公开(公告)号：US20110212401A1

    公开(公告)日：2011-09-01

    申请号：US13045962

    申请日：2011-03-11

    申请人： Yukio NISHIMURA ,  Yasuhiko Matsuda ,  Hiroki Nakagawa ,  Tomohisa Fujisawa ,  Yukari Hama ,  Kazuki Kasahara

    发明人： Yukio NISHIMURA ,  Yasuhiko Matsuda ,  Hiroki Nakagawa ,  Tomohisa Fujisawa ,  Yukari Hama ,  Kazuki Kasahara

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin.

    摘要翻译： 辐射敏感性树脂组合物包括树脂，光致酸产生剂，含氟树脂和内酯化合物。 该树脂不包含第一含氟重复单元。 树脂包括由于酸而变成碱溶性的第一重复单元。 含氟树脂包括第二含氟重复单元和由于酸而变成碱溶性的第二重复单元。 辐射敏感性树脂组合物中的内酯化合物的含量相对于100质量份的树脂为约31〜约200质量份。

    Copolymer and top coating composition
    6.
    发明授权
    Copolymer and top coating composition 有权
    共聚物和顶涂组合物

    公开(公告)号：US08580482B2

    公开(公告)日：2013-11-12

    申请号：US13338569

    申请日：2011-12-28

    申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
    8.
    发明授权
    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
    用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法

    公开(公告)号：US08247165B2

    公开(公告)日：2012-08-21

    申请号：US10586187

    申请日：2005-01-14

    申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    IPC分类号： G03C1/00 ,  G03F7/00 ,  C08F18/20

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中 在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。 当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂， 和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

    Ejector
    9.
    发明申请
    Ejector 有权
    喷射器

    公开(公告)号：US20110236227A1

    公开(公告)日：2011-09-29

    申请号：US13065695

    申请日：2011-03-28

    申请人： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

    发明人： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

    IPC分类号： F04F5/00

    CPC分类号： F04F5/20 ,  F04F5/46

    摘要： A nozzle of an ejector depressurizes and injects fluid, which is supplied to the nozzle. The nozzle is received in a receiving space of a body. The nozzle and the body are formed by press working. The nozzle includes nozzle-side ribs, which extend in an axial direction and project radially outward. The body includes body-side ribs, which extend in the axial direction and project radially outward. In a predetermined cross section of each of the nozzle and the body, which is perpendicular to the axial direction and includes the corresponding ribs, the nozzle or the body is formed seamlessly as a continuous single piece member.

    摘要翻译： 喷射器的喷嘴减压并喷射供给喷嘴的流体。 喷嘴被容纳在身体的容纳空间中。 喷嘴和主体通过冲压加工形成。 喷嘴包括沿轴向延伸并径向向外突出的喷嘴侧肋。 主体包括沿轴向延伸并径向向外突出的主体侧肋。 在每个喷嘴和主体的垂直于轴向方向并且包括相应的肋的预定横截面中，喷嘴或主体无缝地形成为连续的单件构件。