公开(公告)号：US09298110B2

公开(公告)日：2016-03-29

申请号：US13046303

申请日：2011-03-11

申请人： Jens Arno Steinhoff ,  Vadim Yevgenyevich Banine ,  Richard Joseph Bruls ,  Erik Roelof Loopstra ,  Hendrik Antony Johannes Neerhof ,  Adrianus Johannes Maria Van Dijk ,  Andrei Mikhailovich Yakunin ,  Luigi Scaccabarozzi

发明人： Jens Arno Steinhoff ,  Vadim Yevgenyevich Banine ,  Richard Joseph Bruls ,  Erik Roelof Loopstra ,  Hendrik Antony Johannes Neerhof ,  Adrianus Johannes Maria Van Dijk ,  Andrei Mikhailovich Yakunin ,  Luigi Scaccabarozzi

IPC分类号： G03B27/42 ,  G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70916 ,  H05G2/003

摘要： A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.

摘要翻译： 在EUV辐射源装置中使用污染物阱。 产生EUV辐射束并通过低压气体气氛聚焦成虚拟源点。 EUV辐射在其通过的低压氢气氛中产生等离子体。 当辐射束接近虚拟源点时，包括电极的污染物陷阱位于辐射束内或周围。 DC偏置源连接到电极以产生电场，该电场被定向以偏离由等离子体带负电的光束路径污染物颗粒。 附加的RF电极和/或电离器增强等离子体以增加颗粒的充电。 偏转电极可以用RF偏压短时间操作，以确保增强等离子体的耗散。

公开(公告)号：US20130070218A1

公开(公告)日：2013-03-21

申请号：US13580364

申请日：2011-03-03

申请人： Vladimir Vitalevich Ivanov ,  Pavel Stanislavovich Antsiferov ,  Yurii Victorovitch Sidelnikov ,  Luigi Scaccabarozzi ,  Hendrik Antony Johannes Neerhof ,  Andrei Mikhailovich Yakunin ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Richard Joseph Bruls

发明人： Vladimir Vitalevich Ivanov ,  Pavel Stanislavovich Antsiferov ,  Yurii Victorovitch Sidelnikov ,  Luigi Scaccabarozzi ,  Hendrik Antony Johannes Neerhof ,  Andrei Mikhailovich Yakunin ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Richard Joseph Bruls

IPC分类号： G03B27/52 ,  C23F1/08

CPC分类号： G03F7/70916

摘要： A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.

摘要翻译： 提供了一种用于从EUV辐射束的路径去除污染物颗粒的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级 作为电压状态的第二阶段，向电极提供直流电压。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US20120327381A1

公开(公告)日：2012-12-27

申请号：US13582261

申请日：2011-01-31

申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin

发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/52

CPC分类号： H05G2/008 ,  G02B5/00 ,  G02B19/00 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003

摘要： A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.

摘要翻译： 用于产生用于光刻设备的极紫外辐射的辐射源具有碎片减轻装置，其包括布置在辐射束的中间焦点（IF）处或其附近的喷嘴。 喷嘴用于引导气体（330）流向辐射源或收集器光学元件，以便偏转由辐射源发射的颗粒物（43）。

公开(公告)号：US09395630B2

公开(公告)日：2016-07-19

申请号：US13704222

申请日：2011-03-17

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  C01B31/04 ,  G02B5/08 ,  G02B5/20 ,  G02B27/00 ,  G03F1/24 ,  G03F1/62 ,  G21K1/06 ,  H01B1/04 ,  H01B1/24 ,  G03B27/54

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。

公开(公告)号：US08755032B2

公开(公告)日：2014-06-17

申请号：US13063139

申请日：2009-07-21

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Dzmitry Labetski

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Dzmitry Labetski

IPC分类号： G03B27/54 ,  G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。

公开(公告)号：US20130088699A1

公开(公告)日：2013-04-11

申请号：US13704222

申请日：2011-03-17

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03B27/54 ,  G02B5/20 ,  G02B5/08

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。

公开(公告)号：US09726989B2

公开(公告)日：2017-08-08

申请号：US13643265

申请日：2011-02-22

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B5/20 ,  G03F7/20

CPC分类号： G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

公开(公告)号：US20140160455A1

公开(公告)日：2014-06-12

申请号：US14181076

申请日：2014-02-14

申请人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03F7/20

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

摘要翻译： 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。

公开(公告)号：US20140085619A1

公开(公告)日：2014-03-27

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。