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公开(公告)号：US06624930B1
公开(公告)日：2003-09-23
申请号：US09589088
申请日：2000-06-08
IPC分类号： F21V904
CPC分类号： G02B21/16
摘要： An illumination device for a DUV microscope has an illumination beam path, proceeding from a DUV light source in which are arranged a condenser and a reflection filter system which generates a DUV wavelength band and comprises four reflection filters. At these, the illumination beam is reflected in each case at the same reflection angle &agr;, the illumination beam path extending coaxially in front of and behind the reflection filter system. According to the present invention, the reflection angle &agr;=30° and the DUV wavelength band &lgr;DUV+&Dgr;&lgr; has a half-value width of max. 20 nm and a peak with a maximum value S of more than 90% of the incoming light intensity. The resulting very narrow half-value width of the DUV wavelength band makes it possible for the DUV objectives of the DUV microscope to be very well-corrected.
摘要翻译： 用于DUV显微镜的照明装置具有照明光束路径，从设置有冷凝器的DUV光源和产生DUV波长带并包括四个反射滤光器的反射滤光器系统进行。 在这些情况下，照射光束在每种情况下以相同的反射角α被反射，照明光束路径在反射滤光镜系统的前面和后面同轴地延伸。 根据本发明，反射角α= 30°和DUV波长带lambdDUV + Deltalambd具有最大值的半值宽度。 20nm，最大值S大于入射光强度的90％以上的峰。 所得到的DUV波长带的非常窄的半值宽度使得DUV显微镜的DUV目标可以被很好地校正。
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公开(公告)号：US07268940B2
公开(公告)日：2007-09-11
申请号：US10475559
申请日：2002-04-10
申请人： Michael Veith , Lambert Danner
发明人： Michael Veith , Lambert Danner
CPC分类号： G02B21/16
摘要： An illuminating device, as for a microscope, includes a light source and a reflecting filter system. The beam of light of the light source undergoes a plurality of reflections in the reflecting filter system. The entering beam of the reflecting filter system has an optical beam offset and/or a change in direction relative to the exiting beam.
摘要翻译： 对于显微镜，照明装置包括光源和反射滤光器系统。 光源的光束在反射滤光器系统中经历多次反射。 反射滤光器系统的进入光束相对于出射光束具有光束偏移和/或方向变化。
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公开(公告)号：US06879440B2
公开(公告)日：2005-04-12
申请号：US10355868
申请日：2003-01-31
申请人： Franz Cemic , Lambert Danner , Robert Mainberger , Michael Veith , Martin Osterfeld , Uwe Graf
发明人： Franz Cemic , Lambert Danner , Robert Mainberger , Michael Veith , Martin Osterfeld , Uwe Graf
CPC分类号： G02B7/28 , G02B21/247
摘要： An autofocus module for a microscope-based system includes at least two light sources, each of which generates a light beam for focusing. An optical directing device is provided that directs a respective portion of each light beam onto an incoupling means, which couples each of the light beams into the illuminating light beam of the microscope-based system and directs the light beams onto a specimen. A first and a second detector receive the light beams of the first and second light source reflected from the surface of the specimen, and ascertain the intensities on the first and second detector in time-multiplexed fashion.
摘要翻译： 用于基于显微镜的系统的自动对焦模块包括至少两个光源，每个光源产生用于聚焦的光束。 提供一种光引导装置，其将每个光束的相应部分引导到一个耦合装置上，该耦合装置将每个光束耦合到基于显微镜的系统的照明光束中，并将光束引导到样本上。 第一和第二检测器接收从样本表面反射的第一和第二光源的光束，并以时分复用的方式确定第一和第二检测器上的强度。
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公开(公告)号：US20110205553A1
公开(公告)日：2011-08-25
申请号：US12931886
申请日：2011-02-14
摘要： A method for focusing an object plane (42) through an objective (30) and an optical assembly (10), with which the method can be carried out, are disclosed. A geometric reference structure (21) is positioned in a plane (36) conjugate to a field plane (34) of the objective (30) and is imaged onto the object plane (42). The geometric reference structure (21) is illuminated with a light beam (24), which encloses a non-zero angle (φ) with a normal direction (38) of the conjugate plane (36). Therefore a position (Y) of an image (22) of the geometric reference structure (21) in the object plane (42) depends on the signed distance (37) between the object plane (42) and the field plane (34), and correspondingly is evaluated for the determination of the focus position. The optical assembly (10) preferentially may be a metrology tool (100) for measuring structures (120) on masks (100), wherein the objective (30) is the measurement objective of the metrology tool (100).
摘要翻译： 公开了一种用于将物平面（42）聚焦通过物镜（30）和光学组件（10）进行该方法可以实现的方法。 几何参考结构（21）位于与物镜（30）的场平面（34）共轭的平面（36）中，并被成像到物平面（42）上。 几何参考结构（21）用光束（24）照射，光束（24）与共轭平面（36）的法线方向（38）包围非零角度（＆phgr）。 因此，物平面（42）中的几何参考结构（21）的图像（22）的位置（Y）取决于物平面（42）和场平面（34）之间的有符号距离（37） 并且相应地评估焦点位置的确定。 光学组件（10）优选地可以是用于测量掩模（100）上的结构（120）的计量工具（100），其中物镜（30）是计量工具（100）的测量目标。
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公开(公告)号：US09091525B2
公开(公告)日：2015-07-28
申请号：US12931886
申请日：2011-02-14
摘要： A method for focusing an object plane (42) through an objective (30) and an optical assembly (10), with which the method can be carried out, are disclosed. A geometric reference structure (21) is positioned in a plane (36) conjugate to a field plane (34) of the objective (30) and is imaged onto the object plane (42). The geometric reference structure (21) is illuminated with a light beam (24), which encloses a non-zero angle (φ) with a normal direction (38) of the conjugate plane (36). Therefore a position (Y) of an image (22) of the geometric reference structure (21) in the object plane (42) depends on the signed distance (37) between the object plane (42) and the field plane (34), and correspondingly is evaluated for the determination of the focus position. The optical assembly (10) preferentially may be a metrology tool (100) for measuring structures (120) on masks (100), wherein the objective (30) is the measurement objective of the metrology tool (100).
摘要翻译： 公开了一种用于将物平面（42）聚焦通过物镜（30）和光学组件（10）进行该方法可以实现的方法。 几何参考结构（21）位于与物镜（30）的场平面（34）共轭的平面（36）中，并被成像到物平面（42）上。 几何参考结构（21）用光束（24）照射，光束（24）与共轭平面（36）的法线方向（38）包围非零角度（＆phgr）。 因此，物平面（42）中的几何参考结构（21）的图像（22）的位置（Y）取决于物平面（42）和场平面（34）之间的有符号距离（37） 并且相应地评估焦点位置的确定。 光学组件（10）优选地可以是用于测量掩模（100）上的结构（120）的计量工具（100），其中物镜（30）是计量工具（100）的测量目标。
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公开(公告)号：US06600560B2
公开(公告)日：2003-07-29
申请号：US09845763
申请日：2001-05-02
申请人： Hakon Mikkelsen , Horst Engel , Lambert Danner , Christof Stey
发明人： Hakon Mikkelsen , Horst Engel , Lambert Danner , Christof Stey
IPC分类号： G01J400
CPC分类号： G01B11/0641 , G01N21/211
摘要： The invention concerns an optical measurement arrangement having an ellipsometer, in which an incident beam (16) of polarized light is directed at an angle of incidence &agr;≠0° onto a measurement location (M) on the surface of a specimen (P). Information concerning properties of the specimen (P), preferably concerning layer thicknesses and optical material properties such as refractive index n, extinction coefficient k, and the like, is obtained from an analysis of a return beam (17) reflected from the specimen (P). The incident beam (16) is directed by a mirror objective (15) onto the surface of the specimen (P). The return beam (17) is also captured by the mirror objective (15). The result is to create an optical measurement arrangement, operating on the ellipsometric principle, which has a simple, compact configuration and permits a high measurement accuracy down to the sub-nanometer range.
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公开(公告)号：US07271889B2
公开(公告)日：2007-09-18
申请号：US10524687
申请日：2003-08-21
申请人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sönksen , Volker Knorz
发明人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sönksen , Volker Knorz
CPC分类号： G02B21/10 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8825 , G01N2021/8838 , G01N2201/0696 , G02B21/125
摘要： A device and method for inspecting an object (2) uses a bright field illumination beam path (4) of a bright field light source (5), said beam path being formed so that it passes through the projection optics (3), and a dark field illumination beam path (6) of a dark field light source (7), this beam path being formed so that it also passes through the projection optics (3). The object (2) can be projected by the projection optics (3) onto the least one detector (8), and the object (2) is simultaneously illuminated by both light sources (5, 7). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the light used for the dark field illumination is pulsed and the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.
摘要翻译： 用于检查物体（2）的装置和方法使用亮场光源（5）的亮场照明光束路径（4），所述光束路径形成为使得其通过投影光学器件（3），并且 暗场光源（7）的暗场照明光束路径（6），该光束路径被形成为使得其也穿过投影光学器件（3）。 物体（2）可以被投影光学器件（3）投影到最少一个检测器（8）上，物体（2）同时被两个光源（5,7）照射。 为了同时检测亮场图像和暗场图像而不涉及复杂的滤波操作，用于暗场照明的光被脉冲，并且用于暗场照明的光的脉冲强度大于至少一个数量级 比在脉冲间隔期间用于亮场照明的连续光的强度高。
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8.发明授权Illumination device, and coordinate measuring instrument having an illumination device 有权照明装置和具有照明装置的坐标测量仪器公开(公告)号：US07209243B2
公开(公告)日：2007-04-24
申请号：US10776256
申请日：2004-02-12
申请人： Franz Cemic , Lambert Danner , Gerhard Hoppen
发明人： Franz Cemic , Lambert Danner , Gerhard Hoppen
IPC分类号： G01B11/14
CPC分类号： G03F7/70058 , G01B11/005 , G02B6/0001 , G02B6/4298 , G02B27/09
摘要： A coordinate measuring instrument includes a horizontally X-Y displaceable measurement stage for receiving a substrate with a feature that is to be measured, an illumination system, and a detector device. The illumination system includes a light source, an optical fiber bundle, a coupling-in optical system before the optical fiber bundle, a coupling-out optical system after the optical fiber bundle, an illuminating optical system for illuminating an image field, and a homogenizing optical system which is arranged between said coupling-out optical system and said illuminating optical system. The homogenizing optical system homogenizes the non-uniform intensity distribution in the image field of the light emerging from the optical fiber bundle. The light of said light source is picked off via said coupling-in optical system with a large numerical entrance aperture, and is coupled into said optical fiber bundle. The detector device determines the values of X and Y coordinates of the feature within the X-Y displaceable measurement stage.
摘要翻译： 坐标测量仪器包括用于接收具有要测量的特征的基板的水平X-Y可移位的测量台，照明系统和检测器装置。 照明系统包括光源，光纤束，光纤束前的耦合光学系统，光纤束之后的耦合出光学系统，用于照明图像场的照明光学系统，以及均匀化 光学系统，其布置在所述耦合输出光学系统和所述照明光学系统之间。 均匀化光学系统均匀化从光纤束出射的光的图像场中的不均匀强度分布。 所述光源的光通过具有大数值入口孔的所述耦合入光学系统被拾取，并且耦合到所述光纤束中。 检测器装置确定X-Y可置换测量阶段内的特征的X和Y坐标的值。
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公开(公告)号：US20050259245A1
公开(公告)日：2005-11-24
申请号：US10524687
申请日：2003-08-21
申请人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sonksen , Volker Knorz
发明人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sonksen , Volker Knorz
IPC分类号： G01B11/30 , G01N21/88 , G01N21/95 , G01N21/956 , G02B21/06 , G02B21/10 , G02B21/12 , H01L21/66
CPC分类号： G02B21/10 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8825 , G01N2021/8838 , G01N2201/0696 , G02B21/125
摘要： The invention relates to a device and method for inspecting an object (2) involving the use of a bright field illumination beam path (4) of a bright field light source (5), said beam path being formed so that it passes through the projection optics (3), and involving the use or a dark field illumination beam path (6) of a dark field light source (7), this beam path being formed so that it also passes through the projection optics (3). The object (2) can be projected by the projection optics (3) onto the least one detector (8), and the object (2) is simultaneously illuminated by both light sources (5, 7). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the inventive device or method for inspecting an object (2) is characterized in that the light used for the dark field illumination is pulsed and in that the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.
摘要翻译： 本发明涉及一种用于检查涉及使用明场光源（5）的亮场照明光束路径（4）的物体（2）的装置和方法，所述光束路径被形成为使得其通过突起 光学器件（3），并且涉及暗场光源（7）的使用或暗场照明光束路径（6），该光束路径被形成为使得其也穿过投影光学器件（3）。 物体（2）可以被投影光学器件（3）投影到最少一个检测器（8）上，物体（2）同时被两个光源（5,7）照射。 为了同时检测亮场图像和暗场图像而不涉及复杂的滤波操作，本发明的用于检测物体（2）的装置或方法的特征在于用于暗场照明的光是脉冲的，并且脉冲强度 用于暗场照明的光比在脉冲间隔期间用于亮场照明的连续光的强度至少大一个数量级。
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公开(公告)号：US20100295938A1
公开(公告)日：2010-11-25
申请号：US12716612
申请日：2010-03-03
申请人： Kurt Hahn , Roland Hedrich , Gerhard Hoppen , Lambert Danner , Albert Kreh , Wolfgang Vollrath , Alexander Büttner , Christof Krampe-Zadler , Henning Backhauss , Hermann Bittner
发明人： Kurt Hahn , Roland Hedrich , Gerhard Hoppen , Lambert Danner , Albert Kreh , Wolfgang Vollrath , Alexander Büttner , Christof Krampe-Zadler , Henning Backhauss , Hermann Bittner
IPC分类号： H04N7/18
CPC分类号： G01N21/9501 , G01N2021/8825
摘要： An apparatus (1) for the optical inspection of wafers is disclosed, which comprises an assembly unit (10) which carries optical elements (30, 31, 32, 33) of at least one illumination path (3) for a bright field illumination and optical elements (50, 51, 52, 60, 61, 62, 70, 71, 72, 80, 81, 82) of at least one illumination path (5, 6, 7, 8) for a dark field illumination. The assembly unit (10) furthermore carries plural optical elements (91, 92, 93, 94, 95, 96, 97, 98, 99, 100) of at least one detection path (91, 92). An imaging optical element (32) of the at least one illumination path (3) for the bright field illumination (30), imaging optical elements (51, 61, 71, 81) of the at least one illumination path for the dark field illumination, and imaging optical elements (91, 95, 96) of the at least one detection path (9) are designed in such a way that all illumination paths (3, 5, 6, 7, 8) and all detection paths (91, 92) are telecentric.
摘要翻译： 公开了一种用于光学检查晶片的设备（1），其包括：组装单元（10），其承载用于明场照明的至少一个照明路径（3）的光学元件（30,31,32,33），以及 用于暗场照明的至少一个照明路径（5,6,7,8）的光学元件（50,51,52,60,61,62,70,71,72,80,81,82）。 组装单元（10）还承载至少一个检测路径（91,92）的多个光学元件（91,92,93,94,95,96,97,98,99,100）。 用于明场照明（30）的至少一个照明路径（3）的成像光学元件（32），用于暗场照明的至少一个照明路径的成像光学元件（51,61,71,81） ，并且所述至少一个检测路径（9）的成像光学元件（91,95,96）被设计成使得所有照明路径（3,5,6,7,8）和所有检测路径（91， 92）是远心的。
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