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10 条记录 (耗时 0.03 秒)

    Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition
    6.
    发明授权
    Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition 失效
    基于光抑制获得环氧树脂配方中的图像反转的方法和组合物

    公开(公告)号：US5266444A

    公开(公告)日：1993-11-30

    申请号：US943075

    申请日：1992-09-10

    申请人： Burton J. Carpenter, Jr. ,  Joseph LaTorre ,  Michael G. McMaster ,  Logan L. Simpson

    发明人： Burton J. Carpenter, Jr. ,  Joseph LaTorre ,  Michael G. McMaster ,  Logan L. Simpson

    IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/38 ,  C03C1/725

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/38 ,  Y10S430/118

    摘要： A method and composition are shown for producing a positive-acting photoimagible epoxy resin. In addition to the epoxy resin, the compositions include a dual component cross-linking system which combines a basic curing agent with an onium or arylonium salt. The onium or arylonium salt produces a protic acid upon exposure to irradiation causing a reaction with the basic curing agent which renders the agent ineffective as an epoxy curing agent during subsequent heating. During a subsequent bake operation, only the unexposed regions of the epoxy will cross-link. As a result, the exposed areas wash away, leaving only the cured reverse image.

    摘要翻译： 显示了用于制备正性光可氧化环氧树脂的方法和组合物。 除了环氧树脂之外，组合物还包括将碱性固化剂与鎓盐或芳基鎓盐组合的双组分交联体系。 鎓或芳基盐在暴露于照射时产生质子酸，引起与碱性固化剂的反应，其使得该试剂在随后的加热期间作为环氧固化剂无效。 在随后的烘烤操作中，仅环氧树脂的未曝光区域将交联。 结果，暴露的区域被洗掉，只剩下固化的反转图像。

    Composition for photo imaging
    7.
    发明授权
    Composition for photo imaging 失效
    摄影成像的组成

    公开(公告)号：US5439766A

    公开(公告)日：1995-08-08

    申请号：US976115

    申请日：1992-11-13

    申请人： Richard A. Day ,  Donald H. Glatzel ,  John R. Mertz ,  Joel L. Roth ,  David J. Russell ,  Logan L. Simpson

    发明人： Richard A. Day ,  Donald H. Glatzel ,  John R. Mertz ,  Joel L. Roth ,  David J. Russell ,  Logan L. Simpson

    IPC分类号： G03C1/725

    CPC分类号： G03C1/725

    摘要： According to the present invention, good image resolution of a cationically polymerized epoxy based coating, such as a solder mask or dielectric or etch resist, is provided by combining a cationically polymerized epoxy based coating with conventional epoxy glass substrates cured with a curing agent that does not produce basic reaction products. Preferably, the coating is photoimagable. The method for making the same is also provided. The coating material includes an epoxy resin system comprising between from about 10% to about 90%, preferably about 28% to about 57% by weight of a polyol epoxy resin, and from about 10% to about 90%, preferably about 43% to 72% by weight, of a brominated epoxy resin. Optionally, a polyepoxy resin or an epoxy creosol novolak resin is added to the resin system. The polyepoxy resin may be added from an effective amount up to less than 90% of the resin system; the epoxy creosol novolak may be added from an effective amount up to about 80 pph.

    摘要翻译： 根据本发明，通过将阳离子聚合的环氧基涂层与用固化剂固化的常规环氧玻璃基底组合来提供阳离子聚合的环氧基涂层（例如焊料掩模或电介质或抗蚀剂）的良好图像分辨率， 不产生碱性反应产物。 优选地，涂层是可光成像的。 还提供了制造它们的方法。 涂料包括环氧树脂体系，其包含约10％至约90％，优选约28％至约57％重量的多元醇环氧树脂，以及约10％至约90％，优选约43％至 72重量％的溴化环氧树脂。 任选地，在树脂体系中加入聚环氧树脂或环氧酚醛清漆树脂。 聚环氧树脂可以从有效量添加到树脂体系的90％以下; 可以从高达约80pph的有效量加入环氧裂解酚醛清漆。