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    Composition for photo imaging
    7.
    发明授权
    Composition for photo imaging 失效
    摄影成像的组成

    公开(公告)号：US5264325A

    公开(公告)日：1993-11-23

    申请号：US918304

    申请日：1992-07-21

    申请人： Robert D. Allen ,  Richard A. Day ,  Donald H. Glatzel ,  William D. Hinsberg ,  John R. Mertz ,  David J. Russell ,  Gregory M. Wallraff

    发明人： Robert D. Allen ,  Richard A. Day ,  Donald H. Glatzel ,  William D. Hinsberg ,  John R. Mertz ,  David J. Russell ,  Gregory M. Wallraff

    IPC分类号： G03F7/038 ,  G03F7/20 ,  H05K3/00 ,  H05K3/28 ,  D04H1/08

    CPC分类号： G03F7/2053 ,  G03F7/0385 ,  H05K3/0082 ,  H05K3/287

    摘要： An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which preferably is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60.degree. C. and about 110.degree. C. and a molecular weight of between about 600 and 2,500. A third resin, either an epoxy cresol novolak or a polyepoxy resin, is also added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.

    摘要翻译： 提供了一种改进的可光成像的可阳离子聚合的环氧基涂料，其适用于各种基材。 该材料包括基本上由约10重量％至约80重量％的多元醇树脂组成的环氧树脂体系，多元醇树脂优选为分子量为约40,000至130,000的表氯醇和双酚A的缩合产物; 和约35重量％至72重量％的软化点为约60℃至约110℃，分子量为约600至2,500的溴化双酚A的环氧化缩水甘油醚。 树脂体系中还加入第三树脂，环氧甲酚酚醛清漆或聚环氧树脂。 向该树脂体系中添加约0.1〜约15重量份/ 100份阳离子光引发剂的树脂，其能够在暴露于光化辐射下引发所述环氧化树脂体系的聚合; 该系统的特征还在于，对于2.0密耳厚的膜，在330至700nm区域中的光的吸光度小于0.1。 任选地，可加入光敏剂如苝及其衍生物或蒽及其衍生物。

    Bleachable materials for lithography
    8.
    发明授权
    Bleachable materials for lithography 有权
    用于光刻的可漂洗材料

    公开(公告)号：US07875408B2

    公开(公告)日：2011-01-25

    申请号：US11698182

    申请日：2007-01-25

    申请人： John A. Hoffnagle ,  David R. Medeiros ,  Robert D. Miller ,  Libor Vycklicky ,  Gregory M. Wallraff

    发明人： John A. Hoffnagle ,  David R. Medeiros ,  Robert D. Miller ,  Libor Vycklicky ,  Gregory M. Wallraff

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/031 ,  G03F7/075

    CPC分类号： G03F7/091 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/146

    摘要： Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organo-silicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals “R” and “Y” represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.

    摘要翻译： 包含可光漂白有机材料的组合物可以用193nm的光漂白，并且在曝光后通过刺激使其恢复到其初始状态。 （可逆光漂白）。 我们将这些组合物用于本领域已知的对比增强层和作为光致抗蚀剂的一部分，特别是在用于半导体制造的光刻工艺中。 它们可以包括聚合物，例如有机硅聚合物，包含芳族羟基化合物如苯酚和萘酚的聚合物的聚合物，例如苯酚甲醛聚合物和萘酚甲醛聚合物苯乙烯聚合物和酚醛丙烯酸酯聚合物或环状材料，其包括：其中基团“R”和 “Y”表示有机或取代的有机部分，结构I，II和III表示碱性有机骨架，并且可以在任何可用位置被未取代或被任何一个或多个取代基的组合取代。