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公开(公告)号：US11618970B2
公开(公告)日：2023-04-04
申请号：US17115238
申请日：2020-12-08
Applicant: SILCOTEK CORP.
Inventor： Min Yuan
Abstract: Nano-wire growth processes, nano-wires, and articles having nano-wires are disclosed. The nano-wire growth process includes trapping growth-inducing particles on a substrate, positioning the substrate within a chamber, closing the chamber, applying a vacuum to the chamber, introducing a precursor gas to the chamber, and thermally decomposing the precursor gas. The thermally decomposing of the precursor gas grows nano-wires from the growth-inducing particles. The nano-wires and the articles having the nano-wires are produced by the nano-wire growth process.
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公开(公告)号：US10087521B2
公开(公告)日：2018-10-02
申请号：US14970015
申请日：2015-12-15
Applicant: SILCOTEK CORP.
Inventor： Min Yuan , James B. Mattzela , David A. Smith
Abstract: Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
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公开(公告)号：US12036765B2
公开(公告)日：2024-07-16
申请号：US17487151
申请日：2021-09-28
Applicant: SILCOTEK CORP.
Inventor： Min Yuan
IPC: B32B15/01 , B32B15/18 , C22C19/05 , C22C21/00 , C22C21/02 , C22C38/00 , C22C38/02 , C22C38/04 , C22C38/40 , C22C38/44 , C23C16/40 , C23C16/44 , C23C28/04
CPC classification number: B32B15/013 , B32B15/01 , B32B15/012 , B32B15/18 , C22C19/05 , C22C19/055 , C22C19/056 , C22C21/00 , C22C21/02 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/40 , C22C38/44 , C23C16/401 , C23C16/406 , C23C16/44 , C23C28/04
Abstract: Corrosion-resistant coated articles and a thermal chemical vapor deposition coating processes are disclosed. The article includes a metallic material having a first composition including a first iron concentration and a first chromium concentration, the first iron concentration being greater than the first chromium concentration, a surface of the metallic material having a second composition including a second iron concentration and a second chromium concentration, the second chromium concentration being less than the first chromium concentration, an oxide layer on the surface of the metallic material having a third composition including an iron oxide concentration and a chromium oxide concentration, the chromium oxide concentration being greater than the iron oxide concentration and being devoid of precipitates, and a thermal chemical vapor deposition coating on the oxide layer. The process includes producing the article by treating to produce the surface, oxidizing to produce the oxide layer, and applying the coating.
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公开(公告)号：US10323321B1
公开(公告)日：2019-06-18
申请号：US14990889
申请日：2016-01-08
Applicant: SILCOTEK CORP.
Inventor： Min Yuan , Paul H. Silvis , James B. Mattzela
Abstract: Thermal chemical vapor deposition processes and coated articles are disclosed. The coated article includes a surface having a surface impurity and a coating on the surface formed by thermally reacting a gas. In comparison to a comparable coating without the surface impurity, the coating on the surface has substantially the same level of adhesion, corrosion resistance over 24 hours in 6M HCl, corrosion resistance over 72 hours in NaClO, and electrochemical impedance spectroscopy results. Additionally or alternatively, the surface impurity has properties that reduce or eliminate adhesion of a comparative coating produced by decomposition of silane on a comparative surface following exposure of the surface to a temperature.
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公开(公告)号：US10316408B2
公开(公告)日：2019-06-11
申请号：US14946115
申请日：2015-11-19
Applicant: SILCOTEK CORP. , AIXTRON SE
Inventor： David A. Smith , Min Yuan , James B. Mattzela , Olaf Martin Wurzinger , Dietmar Keiper , Anna Katharina Haab
Abstract: A delivery device, manufacturing system, and process of manufacturing are disclosed. The delivery device includes a feed tube and a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from decomposition of dimethylsilane. The manufacturing system includes the delivery device and a chamber in selective fluid communication with the delivery device. The process of manufacturing uses the manufacturing system to produce an article.
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Patent Agency Ranking
公开(公告)号：US11161324B2
公开(公告)日：2021-11-02
申请号：US16129989
申请日：2018-09-13
Applicant: SILCOTEK CORP.
Inventor： Min Yuan
IPC: B32B15/01 , C23C16/44 , C23C16/40 , B32B15/18 , C22C38/04 , C22C19/05 , C22C21/02 , C22C38/40 , C22C21/00 , C22C38/44 , C22C38/02 , C22C38/00 , C23C28/04
Abstract: Corrosion-resistant coated articles and a thermal chemical vapor deposition coating processes are disclosed. The article includes a metallic material having a first composition including a first iron concentration and a first chromium concentration, the first iron concentration being greater than the first chromium concentration, a surface of the metallic material having a second composition including a second iron concentration and a second chromium concentration, the second chromium concentration being less than the first chromium concentration, an oxide layer on the surface of the metallic material having a third composition including an iron oxide concentration and a chromium oxide concentration, the chromium oxide concentration being greater than the iron oxide concentration and being devoid of precipitates, and a thermal chemical vapor deposition coating on the oxide layer. The process includes producing the article by treating to produce the surface, oxidizing to produce the oxide layer, and applying the coating.
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公开(公告)号：US10881986B2
公开(公告)日：2021-01-05
申请号：US16282626
申请日：2019-02-22
Applicant: SILCOTEK CORP.
Inventor： Jesse Bischof , Lucas D. Patterson , Gary Barone , Min Yuan , David A. Smith
Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof.
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公开(公告)号：US11959894B2
公开(公告)日：2024-04-16
申请号：US16971216
申请日：2019-02-22
Applicant: SILCOTEK CORP.
Inventor： Jesse Bischof , Lucas D. Patterson , Gary Barone , Min Yuan , David A. Smith
IPC: G01N30/56 , B01D15/16 , B01D15/20 , B01D15/22 , B01D15/38 , G01N30/30 , G01N30/36 , B01J20/32 , G01N30/02 , G01N30/60
CPC classification number: G01N30/56 , B01D15/161 , B01D15/163 , B01D15/166 , B01D15/206 , B01D15/22 , B01D15/3828 , G01N30/30 , G01N30/36 , B01J20/3265 , G01N2030/027 , G01N2030/567 , G01N30/60
Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.
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公开(公告)号：US11292924B2
公开(公告)日：2022-04-05
申请号：US14680669
申请日：2015-04-07
Applicant: SILCOTEK CORP.
Inventor： David A. Smith , Min Yuan , James B. Mattzela , Paul H. Silvis
Abstract: A coated article is disclosed. The article includes a coating formed by thermal decomposition, oxidation then functionalization. The article is configured for a marine environment, the marine environment including fouling features. The coating is resistant to the fouling features. Additionally or alternatively, the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption features. The coating is resistant to the protein adsorption features.
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公开(公告)号：US10851455B2
公开(公告)日：2020-12-01
申请号：US16121994
申请日：2018-09-05
Applicant: SILCOTEK CORP.
Inventor： Min Yuan , James B. Mattzela , David A. Smith
Abstract: Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
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