Abstract:
A metal suboxide having a specific surface area of greater than or equal to about 1.5 m2/g is prepared by preparing a metal suboxide precursor, and heat-treating the metal suboxide precursor.
Abstract:
A method for manufacturing a semiconductor device, the method including forming a fin type pattern including a lower pattern and an upper pattern on a substrate, the upper pattern including a plurality of sacrificial layers and a plurality of sheet patterns alternately stacked on the lower pattern; forming a field insulating film on the substrate and the fin type pattern such that the field insulation film covers side walls of the lower pattern; forming a passivation film on the field insulating film such that the passivation film extends along an upper surface of the field insulating film; and removing the plurality of sacrificial layers after forming the passivation film.
Abstract:
An electronic device is provided. The electronic device includes an image capture device configured to capture at least a portion of a user's body based on a light source device, a first camera, and a second camera, a memory configured to store a capture image by the image capture device, a display configured to emit light in a specified color at least one region based on driving at least one pixel, and at least one processor configured to be electrically connected with the image capture device, the memory, and the display. The at least one processor being configured to control to drive the image capture device in a state where the at least one region of the display emits light in the specified color to obtain a first capture image and a second capture image and perform registration of the first capture image and the second capture image to generate a third image.
Abstract:
The image reconstruction method includes performing a forward projection of a first image of an object using a line integral-based value and a point spread function (PSF)-based value to acquire a forward projection value, and performing a back projection of raw image data using the forward projection value to acquire a second image of the object.
Abstract:
A fluid analysis cartridge having an improved structure in order to increase test reliability, and a fluid analysis apparatus including the same are disclosed. The fluid analysis apparatus comprises: a housing having a fluid supply part for supplying a fluid sample, and a filter member arranged such that the fluid sample supplied to the fluid supply part passes therethrough; a fluid analysis cartridge having a test unit that is connected to the housing so that the fluid sample that has passed through the filter member can be introduced and a test can be performed; and a pressure member that is arranged to pressurize the fluid analysis cartridge in order to move the fluid sample supplied to the fluid supply part to the test unit, wherein the test unit includes a first panel that has a first inflow part facing the filter member, and a second panel that is arranged to face the first panel and that has a second inflow part corresponding to the first inflow part, and the first inflow part may have a smaller width than the second inflow part.
Abstract:
An etching composition and a method of manufacturing a semiconductor device, the composition including 5 wt % to 30 wt % of an oxidizing agent, based on a total weight of the etching composition; a salt including an anion including a carboxylate moiety having 1 to 5 carbon atoms, and an ammonium cation; and a chelating agent including a phosphonic acid having 1 to 8 carbon atoms.
Abstract:
A fluid analysis cartridge includes a reference well including a macromolecular coloring reagent having an optical characteristic that varies according to a thickness of the reference well, and a test well including a test reagent having an optical characteristic that varies according to a concentration of a component of a fluid sample that reacts with the test reagent and a thickness of the test well.