公开(公告)号：US20250043046A1

公开(公告)日：2025-02-06

申请号：US18405175

申请日：2024-01-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Jeongho MUN ,  Seonghyeon AHN ,  Chanjae AHN ,  Jaejun LEE ,  Kyuhyun IM ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F120/28 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 and having a glass transition temperature of 50° C. or less, a polymer-containing composition including the polymer, and a method of forming a pattern by using the polymer-containing composition: wherein, in Formula 1, descriptions of L11 to L13, a11 to a13, An, R11, R12, b12, and p1 are provided in the present specification.

公开(公告)号：US20250021003A1

公开(公告)日：2025-01-16

申请号：US18537601

申请日：2023-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK ,  Chanjae AHN ,  Jaejun LEE ,  Sungwon CHOI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

公开(公告)号：US20240255847A1

公开(公告)日：2024-08-01

申请号：US18404865

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Sunyoung LEE ,  Minyoung HA

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/039

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:






For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.

公开(公告)号：US20240231222A1

公开(公告)日：2024-07-11

申请号：US18212913

申请日：2023-06-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyungoh KIM ,  Sunghyun HAN ,  SukKoo HONG ,  Moo Hyun KOH ,  Haeng Deog KOH ,  Yoonhyun KWAK ,  Jaemyoung KIM

IPC: G03F7/004 ,  C07F7/22 ,  H01L21/027

CPC classification number: G03F7/0042 ,  C07F7/2224 ,  H01L21/0275 ,  H01L21/0276

Abstract: Provided is a photoresist composition including an organometallic compound including: a central metal; a first ligand compound; and a second ligand compound, wherein the first ligand compound bonds with the central metal, the second ligand compound does not bond with the central metal, and the first or second ligand compound includes a halogen element. The photoresist composition may improve photosensitivity while securing stability.

公开(公告)号：US20240201588A1

公开(公告)日：2024-06-20

申请号：US18192316

申请日：2023-03-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Beomseok KIM ,  Kyuhyun IM ,  Yoonhyun KWAK ,  Hyeran KIM

IPC: G03F7/004 ,  C07C65/10 ,  C07C309/12 ,  C07C311/09 ,  C07C391/02 ,  C07C395/00 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C65/10 ,  C07C309/12 ,  C07C311/09 ,  C07C391/02 ,  C07C395/00 ,  G03F7/0382 ,  G03F7/0397 ,  C07C2603/74

Abstract: Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:




wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.

公开(公告)号：US20240199540A1

公开(公告)日：2024-06-20

申请号：US18312825

申请日：2023-05-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Hana KIM ,  Kyuhyun IM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Hyeran KIM ,  Changheon LEE

IPC: C07C323/09 ,  G03F7/004 ,  G03F7/20

CPC classification number: C07C323/09 ,  G03F7/0042 ,  G03F7/2004 ,  G03F7/2059 ,  C07C2601/16

Abstract: Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same:






wherein A11, L11, L12, a11, a12, R11 to R13, b13, n11, n12, and M+ in Formula 1 are defined as described in the specification.

公开(公告)号：US20230324791A1

公开(公告)日：2023-10-12

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:





wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20230161245A1

公开(公告)日：2023-05-25

申请号：US18047030

申请日：2022-10-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Eunkyung LEE ,  Aram JEON

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  C08F220/1807

Abstract: Provided are a photoacid generator, a photoresist composition including the same, and a method of forming a pattern by using the photoacid generator. The photoacid generator includes a copolymer of a monomer that generates an acid upon exposure to light and an acid-labile monomer of which solubility with respect to a developing solvent is changed by decomposition by an acid, wherein the copolymer is represented by Formula 1:






wherein, in Formula 1, x, y, L, A−, B+, R1, R2, and R3 are each the same as described in the detailed description.

公开(公告)号：US20230038197A1

公开(公告)日：2023-02-09

申请号：US17896231

申请日：2022-08-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyuyoung HWANG ,  Seungyeon KWAK ,  Soyeon KIM ,  Sunyoung LEE ,  Jungin LEE ,  Hyeonho CHOI ,  Whail CHOI ,  Yoonhyun KWAK ,  Byoungki CHOI

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

Abstract: An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20210288268A1

公开(公告)日：2021-09-16

申请号：US17060677

申请日：2020-10-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeoungin Yi ,  Seungyeon KWAK ,  Juhyun KIM ,  Sangho PARK ,  Sunyoung LEE ,  Jiyoun LEE ,  Yoonhyun KWAK ,  Hyun KOO ,  Sunghun LEE ,  Hyeonho CHOI

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

Abstract: Provided is an organometallic compound represented by Formula 1, an organic light-emitting device including the same, and an electronic apparatus including the organic light-emitting device. M(L1)n1(L2)n2   M, L1, L2, n1, and n2 in Formula 1 are the same as described in the present specification.