-
公开(公告)号：US07091505B2
公开(公告)日：2006-08-15
申请号：US10775037
申请日：2004-02-09
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。
-
公开(公告)号：US20060291062A1
公开(公告)日：2006-12-28
申请号：US11416447
申请日：2006-05-02
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： G02B27/10
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength 193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括：收集器，其接收波长为193nm的光并照射平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。
-
公开(公告)号：US20080042079A1
公开(公告)日：2008-02-21
申请号：US11974718
申请日：2007-10-16
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.
摘要翻译： 提供了一种包括包含在第一空间中的第一光学子系统和包含在第二空间中的第二光学子系统的系统。 第一和第二空间由选自隔膜和阀门的结构分开。
-
公开(公告)号：US07321126B2
公开(公告)日：2008-01-22
申请号：US11416447
申请日：2006-05-02
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： A61N5/00
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。
-
公开(公告)号：US07410265B2
公开(公告)日：2008-08-12
申请号：US10675471
申请日：2003-09-30
申请人： Martin Antoni , Frank Melzer , Andreas Seifert , Wolfgang Singer , Wilhelm Egle , Bernhard Gellrich , Bernhard Geuppert
发明人： Martin Antoni , Frank Melzer , Andreas Seifert , Wolfgang Singer , Wilhelm Egle , Bernhard Gellrich , Bernhard Geuppert
IPC分类号： G02B5/08
CPC分类号： G03F7/70825 , B82Y10/00 , G02B5/10 , G02B17/02 , G02B27/0025 , G02B27/30 , G03F7/70058 , G03F7/70166 , G03F7/70175
摘要： A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1′) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1′) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.
摘要翻译： 用于来自光源（2）的辐射的聚焦装置设置有集中器反射镜（1,1'），其被布置在安装件（24）中，并以虚拟或实际的方式从光源收集光 （2）在第二焦点（200）。 收集镜（1,1'）经由轴承可移动地连接到支座（24），使得即使在温度变化的情况下，它的光学特性保持至少近似相同。
-
公开(公告)号：US20090015812A1
公开(公告)日：2009-01-15
申请号：US12212926
申请日：2008-09-18
申请人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G03B27/54
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
摘要翻译： 提供了一种用于沿着扫描方向进行扫描器微光刻的照明系统，其中发射波长<= 193nm的光源。 照明系统包括多个光栅元件。 将多个光栅元件成像为照明系统的图像平面，以产生部分地叠加在图像平面中的场上的多个图像。 该场在扫描方向上定义非矩形强度分布。
-
公开(公告)号：US20060245540A1
公开(公告)日：2006-11-02
申请号：US11345880
申请日：2006-02-02
申请人： Jorg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Jorg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/00
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
-
公开(公告)号：US07443948B2
公开(公告)日：2008-10-28
申请号：US11345880
申请日：2006-02-02
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/04
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
摘要翻译： 提供照明系统。 所述照明系统包括（a）具有小于或等于193nm的波长的光源，以及（b）光的路径中的光学元件，具有第一光栅元件，第二光栅元件，第三光栅元件 栅格元素和位于其上的第四光栅元素。 第二光栅元素与第一光栅元素相邻，并且与第一光栅元素位于第一距离。 第四光栅元素与第三光栅元素相邻，并且与第三光栅元素相距第二距离。 第二距离与第一距离不同。
-
公开(公告)号：US07006595B2
公开(公告)日：2006-02-28
申请号：US10150650
申请日：2002-05-17
申请人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
-
公开(公告)号：US06927403B2
公开(公告)日：2005-08-09
申请号：US10216547
申请日：2002-08-09
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Wilhelm Egle , Vadim Yevgenyevich Banine , Erik Roelof Loopstra
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Wilhelm Egle , Vadim Yevgenyevich Banine , Erik Roelof Loopstra
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70275
摘要： There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.
摘要翻译： 提供了波长<= 193nm的照明系统。 照明系统包括物平面，与物平面共轭的平面，物平面和共轭平面之间的第一集电体，以及共轭平面之后的第二集电体。 第一个收集器将来自物平面的光束束聚焦在共轭平面中。 第一和第二收集器中的至少一个包括镜壳。 射线以相对于镜壳的表面切线小于20°的入射角撞击镜壳。
-
-
-
-
-
-
-
-
-
搜索结果
47 条记录 (耗时 0.05 秒)
