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1.发明授权Structure for use in a projection exposure system for manufacturing semiconductors 有权用于制造半导体的投影曝光系统的结构公开(公告)号：US07692881B2
公开(公告)日：2010-04-06
申请号：US10597872
申请日：2005-02-22
IPC分类号： G02B7/02
CPC分类号： G02B7/02 , G03F7/70833
摘要： A structure for mounting an assembly of optical elements disposed within a housing, in particular of a projection lens assembly of a projection exposure system for manufacturing semiconductor elements includes a plurality of supporting elements, each respective one of which forms part of a respective one of a plurality of connections though which the housing of the assembly is connected to said supporting structure through which the weight of the assembly is transferred to the supporting structure in such a way that supporting forces generated by said supporting structure are taken up by pressure forces and shear forces which act on at least one of the supporting elements.
摘要翻译： 用于安装设置在壳体内的光学元件的组件的结构，特别是用于制造半导体元件的投影曝光系统的投影透镜组件包括多个支撑元件，每个支撑元件各自形成一个 多个连接件，其中组件的壳体连接到所述支撑结构，组件的重量通过所述支撑结构传递到支撑结构，使得由所述支撑结构产生的支撑力被压力和剪切力所吸收 其作用于至少一个支撑元件。
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公开(公告)号：US20120154774A1
公开(公告)日：2012-06-21
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria VAN DER WIJST , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria VAN DER WIJST , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03B27/42
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译： 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。
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公开(公告)号：US09134632B2
公开(公告)日：2015-09-15
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译： 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。
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公开(公告)号：US07760327B2
公开(公告)日：2010-07-20
申请号：US11395719
申请日：2006-03-31
申请人： Hans-Jürgen Scherle , Yim-Bun Patrick Kwan , Stefan Xalter , Johannes Lippert , Ulrich Weber , Bernhard Geuppert , Bernhard Gellrich , Jens Kugler , Franz Sorg , Willi Heintel , Harald Kirchner , Wolfgang Keller , Andreas Frommeyer , Fraser G. Morrison
发明人： Hans-Jürgen Scherle , Yim-Bun Patrick Kwan , Stefan Xalter , Johannes Lippert , Ulrich Weber , Bernhard Geuppert , Bernhard Gellrich , Jens Kugler , Franz Sorg , Willi Heintel , Harald Kirchner , Wolfgang Keller , Andreas Frommeyer , Fraser G. Morrison
CPC分类号： G03F7/70225 , G02B17/0812
摘要： There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.
摘要翻译： 提供了一种包括光学元件主体，反射区域和光学通道的光学元件。 光学元件主体限定旋转对称轴。 反射区域设置在光学元件主体上并且适于在曝光过程中被光学地使用。 光学通道布置在光学元件主体内并允许光通过光学元件主体，光学通道相对于旋转对称轴线偏心地布置。
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公开(公告)号：US20070165311A1
公开(公告)日：2007-07-19
申请号：US10597872
申请日：2005-02-22
申请人： Yim-Bun Kwan , Bernhard Geuppert , Nico Kemper
发明人： Yim-Bun Kwan , Bernhard Geuppert , Nico Kemper
IPC分类号： G02B7/02
CPC分类号： G02B7/02 , G03F7/70833
摘要： In a housing structure for mounting optical elements, in particular of a projection lens housing in a projection exposure system for manufacturing semiconductor elements, attachment locations, which have connecting parts, for connection to a supporting structure are provided on structural elements. Supporting elements, which are provided with mounting flanges for connection to the supporting structure, act on the structural elements in such a way that weight forces are taken up essentially by pressure forces and shear forces.
摘要翻译： 在用于安装光学元件的壳体结构中，特别是用于制造半导体元件的投影曝光系统中的投影透镜壳体，具有用于连接到支撑结构的连接部件的附接位置设置在结构元件上。 具有用于连接到支撑结构的安装凸缘的支撑元件以这样的方式作用于结构元件，使得重力基本上被压力和剪切力占据。
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6.发明授权Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations 有权光学系统，具有可更换的可操作的校正装置，用于减少图像像差公开(公告)号：US08542346B2
公开(公告)日：2013-09-24
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/52
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译： 本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。 在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。 操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。 操纵器可以与致动器一起以可变的方式形成。
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公开(公告)号：US08330935B2
公开(公告)日：2012-12-11
申请号：US12703068
申请日：2010-02-09
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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8.发明申请MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 审中-公开投影镜头的微观投影曝光装置和测量装置公开(公告)号：US20080309894A1
公开(公告)日：2008-12-18
申请号：US12195566
申请日：2008-08-21
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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9.发明申请Lithographic apparatus, device manufacturing method and exchangeable optical element 有权光刻设备，器件制造方法和可交换光学元件公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
发明人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。
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公开(公告)号：US08705185B2
公开(公告)日：2014-04-22
申请号：US13431378
申请日：2012-03-27
CPC分类号： G02B7/001 , F16F7/01 , F16F7/108 , G02B7/02 , G02B27/646 , G03F7/70825 , G03F7/709
摘要： An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.
摘要翻译： 光学元件具有安装在其上的至少一个附加元件，其通过摩擦消散光学元件的振动能。
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