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公开(公告)号：US20230127070A1
公开(公告)日：2023-04-27
申请号：US18087320
申请日：2022-12-22
发明人： Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Joost Jeroen OTTENS , Edwin Cornelis KADIJK , Sergei SHULEPOV
摘要： Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
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公开(公告)号：US11537038B2
公开(公告)日：2022-12-27
申请号：US17119331
申请日：2020-12-11
发明人： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
摘要： Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
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公开(公告)号：US11371093B2
公开(公告)日：2022-06-28
申请号：US16246990
申请日：2019-01-14
发明人： Dennis Lehto , Steven J. Boege
摘要： A device for performing biological sample reactions may include a plurality of flow cells configured to be mounted to a common microscope translation stage, wherein each flow cell is configured to receive at least one sample holder containing biological sample. Each flow cell also may be configured to be selectively placed in an open position for positioning the at least one sample holder into the flow cell and a closed position for reacting biological sample contained in the at least one sample holder. The plurality of flow cells may be configured to be selectively placed in the open position and the closed position independently of each other.
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公开(公告)号：US20210386399A1
公开(公告)日：2021-12-16
申请号：US17209126
申请日：2021-03-22
发明人： Jonathan M. Rothberg , Keith G. Fife , Nevada J. Sanchez , Tyler S. Ralston , Gregory L. Charvat , Gregory Corteville
IPC分类号： A61B8/00 , A61B8/13 , A61B8/08 , G03B27/42 , G03B27/52 , B06B1/02 , G01S7/00 , G01S7/52 , G01S15/89 , A61B8/14 , A61N7/02
摘要： Ultrasound devices and methods are described, including a repeatable ultrasound transducer probe having ultrasonic transducers and corresponding circuitry. The repeatable ultrasound transducer probe may be used individually or coupled with other instances of the repeatable ultrasound transducer probe to create a desired ultrasound device. The ultrasound devices may optionally be connected to various types of external devices to provide additional processing and image rendering functionality.
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公开(公告)号：US11039812B2
公开(公告)日：2021-06-22
申请号：US15606131
申请日：2017-05-26
发明人： Jonathan M. Rothberg , Keith G. Fife , Nevada J. Sanchez , Tyler S. Ralston , Gregory L. Charvat , Gregory Corteville
IPC分类号： A61B8/13 , A61B8/00 , A61B8/08 , G03B27/42 , G03B27/52 , B06B1/02 , G01S7/00 , G01S7/52 , G01S15/89 , A61B8/14 , A61N7/02 , A61N7/00
摘要： Ultrasound devices and methods are described, including a repeatable ultrasound transducer probe having ultrasonic transducers and corresponding circuitry. The repeatable ultrasound transducer probe may be used individually or coupled with other instances of the repeatable ultrasound transducer probe to create a desired ultrasound device. The ultrasound devices may optionally be connected to various types of external devices to provide additional processing and image rendering functionality.
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公开(公告)号：US10884339B2
公开(公告)日：2021-01-05
申请号：US16435630
申请日：2019-06-10
发明人： Wouter Joep Engelen , Otger Jan Luiten , Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Erik Roelof Loopstra
IPC分类号： G03B27/42 , H01J31/48 , G03F7/20 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H01S3/09 , H05H7/04 , H01S3/00
摘要： A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：US10747116B2
公开(公告)日：2020-08-18
申请号：US16292953
申请日：2019-03-05
发明人： Hironobu Fujishima
摘要： There is provided a pattern forming apparatus including a holding unit configured to suction and hold a substrate, and an optical system configured to detect, from a suction surface side of the substrate, an alignment mark formed on the substrate held by the holding unit. The pattern forming apparatus is provided with a wavelength separation element for performing wavelength separation between pattern forming light for forming a pattern on the substrate and alignment mark detection light for detecting the alignment mark.
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公开(公告)号：US10732507B2
公开(公告)日：2020-08-04
申请号：US15926616
申请日：2018-03-20
发明人： Jörg Wolterink , Thomas Hänsel , Wolfgang Sievers
摘要： A method and apparatus to expose photosensitive printing plates with a predetermined radiation density from the main side (top) and a predetermined radiation density from the back side (bottom). The method comprises executing the main exposure with a time delay after the back exposure. The time delay between back exposure and main exposure is optimized to create smaller stable single dot elements on the photosensitive printing plate after processing and smaller single element dot sizes printed on the print substrate. The plate floor may be adjusted by performing a back-side-only exposure prior to executing the combined back and main exposure with the time delay.
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公开(公告)号：US10539770B2
公开(公告)日：2020-01-21
申请号：US16011564
申请日：2018-06-18
发明人： Yanrong Yuan , John Bjorkman , Paul Ferrari , Jeff Hansen
IPC分类号： G02B17/08 , G02B7/09 , G02B17/00 , G03F7/20 , G02B7/10 , H01L21/68 , G03B27/42 , G02B15/177 , G02B13/26
摘要： Techniques are disclosed for magnification compensation and/or beam steering in optical systems. An optical system may include a lens system to receive first radiation associated with an object and direct second radiation associated with an image of the object toward an image plane. The lens system may include a set of lenses, and an actuator system to selectively adjust the set of lenses to adjust a magnification associated with the image symmetrically along a first and a second direction. The lens system may also include a beam steering lens to direct the first radiation to provide the second radiation. In some examples, the lens system may also include a second set of lenses, where the actuator system may also selectively adjust the second set of lenses to adjust the magnification along the first or the second direction. Related methods are also disclosed.
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公开(公告)号：US10444624B1
公开(公告)日：2019-10-15
申请号：US16206642
申请日：2018-11-30
发明人： Xiaoming Lu , Byung-Jin Choi , Steven Hartmann
摘要： A thermal frame of an imprinting apparatus has an motor and a cooling element. A metrology frame of the imprinting apparatus is coupled to an output end of the motor and receives an imprinting mold. Thermal isolation is provided between the motor and the metrology frame. Thermal sensors are disposed at locations of the frames. A digital controller applies a control signal for controlling a driving signal of the cooling element to maintain a thermal balance, such as thermal equilibrium, of heat flow between the frames. The digital controller uses output of the thermal sensors to identify transfer functions of heat flow used to calculate the control signal. The feedforward design avoids the very low control bandwidth that limits the performance of typical feedback designs.
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