公开(公告)号：US08007128B2

公开(公告)日：2011-08-30

申请号：US12206652

申请日：2008-09-08

Applicant: Ting-Feng Wu ,  Chun-Hung Lin ,  Chih-Hung Tseng

Inventor： Ting-Feng Wu ,  Chun-Hung Lin ,  Chih-Hung Tseng

IPC: F21S4/00 ,  F21V21/00

CPC classification number: F21S8/086 ,  F21K9/20 ,  F21V15/01 ,  F21V21/116 ,  F21V21/30 ,  F21V23/04 ,  F21V29/767 ,  F21V29/83 ,  F21W2131/103 ,  F21Y2103/10 ,  F21Y2115/10 ,  G02B6/001 ,  H05B33/0803 ,  Y10S362/80

Abstract: A lighting device has a light-bar mount and multiple light bars. The light-bar mount is integrally formed from a board. The light bars are mounted on the light-bar mount and each light bar has a heat sink, a circuit board and multiple high-power LED modules. The heat sink is detachably mounted in the light-bar mount. The circuit board is mounted in the heat sink. The high-power LED modules are mounted on the heat sink and electrically connected to the circuit board for providing outward illumination.

Abstract translation: 照明装置具有灯条安装件和多个灯条。 灯条安装座由板一体形成。 灯条安装在灯杆安装座上，每个灯条都有散热器，电路板和多个大功率LED模块。 散热器可拆卸地安装在灯条安装座中。 电路板安装在散热器中。 大功率LED模块安装在散热器上并电连接到电路板以提供向外照明。

公开(公告)号：US07998764B2

公开(公告)日：2011-08-16

申请号：US12175597

申请日：2008-07-18

Applicant: Chia-Hung Hung ,  Chia-Chiang Chang ,  Chun-Hung Lin

Inventor： Chia-Hung Hung ,  Chia-Chiang Chang ,  Chun-Hung Lin

IPC: H01L21/00

CPC classification number: G09F9/30 ,  G09F9/33

Abstract: A solid-state light emitting display and a fabrication method thereof are proposed. The light emitting display includes a metallic board formed with conductive circuits, and a plurality of luminous microcrystals disposed on a surface of the metallic board and electrically connected to the conductive circuits. The metallic board provides the features of lightness and thinness, and flexibility, and the luminous microcrystals are in the form of light emitting components, so as to improve the luminous efficiency of display and attain the effect of environmental protection and energy saving, thereby providing display technology with performance satisfactory for various display requirements.

公开(公告)号：US20110146039A1

公开(公告)日：2011-06-23

申请号：US13008217

申请日：2011-01-18

Applicant: Jia-Peng Lin ,  Pui-Leng Lai ,  Wan-Ling Lu ,  Ding-Han Huang ,  Chao-Huei Liu ,  Chun-Hung Lin

Inventor： Jia-Peng Lin ,  Pui-Leng Lai ,  Wan-Ling Lu ,  Ding-Han Huang ,  Chao-Huei Liu ,  Chun-Hung Lin

IPC: D04H3/02 ,  B32B15/02 ,  C08F2/22 ,  C08F257/02 ,  B29C47/00 ,  D03D15/00 ,  B82Y99/00

CPC classification number: C08L33/26 ,  C08F212/08 ,  C08F285/00 ,  C08F2438/03 ,  C08L33/02 ,  C08L35/06 ,  C08L51/003 ,  C08L67/02 ,  C08L2203/02 ,  D01F1/10 ,  D01F1/103 ,  Y10T428/249938 ,  Y10T428/2998 ,  Y10T442/68 ,  Y10T442/681 ,  Y10T442/696 ,  Y10T442/698 ,  Y10T442/699 ,  C08F220/06 ,  C08L2666/02 ,  C08L2666/24 ,  C08F220/56

Abstract: Amphoteric polymer composite nanoparticles are added into the polymer grains of synthetic fibers. The synthetic fibers are woven to form a textile capable of adjusting pH value.

Abstract translation: 将两性聚合物复合纳米颗粒加入到合成纤维的聚合物颗粒中。 合成纤维被织造以形成能够调节pH值的织物。

公开(公告)号：US20110132578A1

公开(公告)日：2011-06-09

申请号：US12956241

申请日：2010-11-30

Applicant: CHUN-HUNG LIN ,  CHANG-YIN CHEN

Inventor： CHUN-HUNG LIN ,  CHANG-YIN CHEN

IPC: F28D15/04

CPC classification number: F28D15/046

Abstract: A heat-dissipating plate has a casing and a supporting structure, where the casing has surrounding walls to define a receiving compartment therein confined by an inner wall. The inner wall is integrated with a capillary structure. Disposed inside the receiving compartment, the supporting structure includes a meshed partition and a plurality of columns. The meshed partition has a plurality of holes and joined-openings. The columns are fixed in the joined-openings and abut against the inner surface of the walls. The associated manufacturing process for the heat-dissipating plate is easily to accomplish.

Abstract translation: 散热板具有壳体和支撑结构，其中壳体具有围壁，以限定由内壁限定的接收室。 内壁与毛细管结构集成。 所述支撑结构设置在所述接纳隔室内，包括网状隔板和多列。 网状分隔件具有多个孔和连接开口。 这些列固定在连接的开口中并且抵靠壁的内表面。 散热板的相关制造工艺很容易实现。

公开(公告)号：US20110120372A1

公开(公告)日：2011-05-26

申请号：US13019269

申请日：2011-02-01

Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

IPC: C23C16/455 ,  C23C16/50 ,  B05C11/00 ,  C23C16/458

CPC classification number: C23C16/402 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45595 ,  C23C16/513

Abstract: A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 larger than 0° and less than 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting pipe extends into the chamber and over the pedestal. The gas-extracting pipe provides a pumping path for particles and side-products having a pumping direction angle θ2 larger than 0° and less than 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe. The chamber is kept at an ambient atmospheric pressure.

Abstract translation: 提供了一种等离子体沉积装置。 等离子体沉积设备包括一个室。 底座放置在腔室中。 等离子体发生器放置在腔室中并在基座上方。 等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有放电方向角度θ;在基座的法线方向与等离子体射流的排出方向之间大于0°且小于90°的1。 气体提取管延伸到腔室中并且在基座上。 气体提取管为具有泵送方向角度的颗粒和副产物提供泵送路径; 2在基座的法线方向与气体提取管的泵送方向之间大于0°且小于90°。 室保持在环境大气压力。

公开(公告)号：USD629129S1

公开(公告)日：2010-12-14

申请号：US29354020

申请日：2010-01-19

Applicant: Chun-Hung Lin ,  Ting-Feng Wu

Designer： Chun-Hung Lin ,  Ting-Feng Wu

公开(公告)号：US07840082B2

公开(公告)日：2010-11-23

申请号：US11896962

申请日：2007-09-07

Applicant: Chun-Hung Lin ,  Tung-Hai Wu

Inventor： Chun-Hung Lin ,  Tung-Hai Wu

IPC: G06K9/36

CPC classification number: H04N19/184 ,  H04N19/109 ,  H04N19/11 ,  H04N19/12 ,  H04N19/152 ,  H04N19/16 ,  H04N19/196 ,  H04N19/463 ,  H04N19/91

Abstract: A coding method and system with an adaptive bitplane coding mode is provided to code multiple bitplanes of a frame consisting of multiple macroblocks. Each bitplane consists of macroblock modes used by the macroblocks of the frame. The method includes the steps of: (A) initializing a bitplane coding mode of the frame as a compress mode; (B) coding the frame and the bitplanes to thereby obtain coded bitplanes, and calculating the bit number of coded bitplanes; (C) calculating the bit number of uncoded bitplanes; (D) executing step (A) when the bit number of coded bitplanes is smaller than the bit number of uncoded bitplanes; (E) initializing the bitplane coding mode of the frame as a raw mode when the bit number of coded bitplanes is not smaller than the bit number of uncoded bitplanes.

Abstract translation: 提供具有自适应位平面编码模式的编码方法和系统来对由多个宏块组成的帧的多个位平面进行编码。 每个位平面由帧的宏块使用的宏块模式组成。 该方法包括以下步骤：（A）将帧的位平面编码模式初始化为压缩模式; （B）对帧和位平面进行编码，从而获得编码位平面，并计算编码位面的比特数; （C）计算未编码位面的位数; （D）执行步骤（A），当编码位平面的位数小于未编码位板的位数时; （E）当编码位平面的位数不小于未编码位板的位数时，初始化帧的位平面编码模式为原始模式。

公开(公告)号：US07787977B2

公开(公告)日：2010-08-31

申请号：US11563947

申请日：2006-11-28

Applicant: Chien-Hsun Lin ,  An-Kuo Yang ,  Yao-Wen Guo ,  Chun-Hung Lin

Inventor： Chien-Hsun Lin ,  An-Kuo Yang ,  Yao-Wen Guo ,  Chun-Hung Lin

IPC: G06F19/00

CPC classification number: H01L22/20

Abstract: A method for processing substrates to manufacture semiconductor structures thereon includes analyzing at least one first processing parameter of a first apparatus for processing a substrate, thereby yielding at least one first throughput rate of the first apparatus. At least one second processing parameter of a second apparatus is analyzed for processing the substrate, thereby yielding at least one second throughput rate of the second apparatus. The first throughput rate and the second throughput rate are compared, thereby yielding at least one comparison result for processing the substrate.

Abstract translation: 一种用于处理衬底以在其上制造半导体结构的方法，包括分析用于处理衬底的第一装置的至少一个第一处理参数，从而产生第一装置的至少一个第一吞吐率。 分析第二装置的至少一个第二处理参数以处理基板，从而产生第二装置的至少一个第二吞吐率。 比较第一吞吐率和第二吞吐率，从而产生用于处理基板的至少一个比较结果。

公开(公告)号：US07750785B2

公开(公告)日：2010-07-06

申请号：US11695060

申请日：2007-04-02

Applicant: Wen-Sheng Chen ,  Chun-Hung Lin

Inventor： Wen-Sheng Chen ,  Chun-Hung Lin

IPC: H01F27/28 ,  H01F27/30

CPC classification number: H01F27/326 ,  H01F3/10 ,  H01F27/303 ,  H01F27/325 ,  H01F30/10 ,  H01F2005/022

Abstract: Coil frames and transformers are provided. A coil frame includes a sub-coil-frame and an extended frame. The sub-coil-frame is utilized for winding a metal coil thereon. The extended frame is attached to the sub-coil-frame. The extended frame has a hole and a protrusion. The hole of the coil frame can be connected with the protrusion of another coil frame.

Abstract translation: 提供线圈框架和变压器。 线圈框架包括子线圈框架和延伸框架。 子线圈框架用于在其上缠绕金属线圈。 延伸框架连接到子线圈框架。 延伸框架具有孔和突起。 线圈框架的孔可以与另一个线圈框架的突起连接。

公开(公告)号：US20100099252A1

公开(公告)日：2010-04-22

申请号：US12653440

申请日：2009-12-14

Applicant: Chun-Hung Lin ,  Huang-Yi Huang ,  Yuh-Da Fan

Inventor： Chun-Hung Lin ,  Huang-Yi Huang ,  Yuh-Da Fan

IPC: H01L21/768

CPC classification number: H01L21/76843 ,  H01L21/76861 ,  H01L21/76862 ,  H01L21/76864 ,  H01L21/76865 ,  H01L21/76873

Abstract: A method for the improved electroplating of copper onto a copper seed layer provides burnishing the surface of the copper seed layer. The burnishing treatment is used to enhance the platability of the copper seed layer. The burnishing may be a reverse electroplating or a sputter etching process. Following the burnishing of the seed layer, the copper layer that is electroplated onto the seed layer exhibits improved quality.

Abstract translation: 用于改进铜在铜种子层上的电镀的方法提供抛光铜籽晶层的表面。 抛光处理用于提高铜种子层的可镀性。 抛光可以是反向电镀或溅射蚀刻工艺。 在晶种层的抛光之后，电镀在籽晶层上的铜层表现出提高的质量。