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315 条记录 (耗时 0.034 秒)

    Onium salts, photoacid generators, resist compositions, and patterning process
    92.
    发明授权
    Onium salts, photoacid generators, resist compositions, and patterning process 有权
    鎓盐，光酸产生剂，抗蚀剂组合物和图案化方法

    公开(公告)号：US06692893B2

    公开(公告)日：2004-02-17

    申请号：US09983155

    申请日：2001-10-23

    申请人： Youichi Ohsawa ,  Jun Watanabe ,  Takeshi Nagata ,  Jun Hatakeyama

    发明人： Youichi Ohsawa ,  Jun Watanabe ,  Takeshi Nagata ,  Jun Hatakeyama

    IPC分类号： G03C173

    CPC分类号： G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/126

    摘要： Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.

    摘要翻译： 芳基磺酰氧基萘磺酸盐与碘鎓或锍阳离子的鎓盐是新颖的。 包含作为光致酸发生剂的鎓盐的化学放大抗蚀剂组合物特别适用于微细加工，特别是通过深紫外光刻技术，因为许多优点，包括改进的分辨率，改善的焦点纬度，最小化的线宽变化或甚至在长期PED下的形状退化 涂层，显影和剥离后的碎屑，以及显影后改进的图案轮廓。

    Chemical amplification, positive resist compositions
    93.
    发明授权
    Chemical amplification, positive resist compositions 有权
    化学放大，正光刻胶组合物

    公开(公告)号：US06682869B2

    公开(公告)日：2004-01-27

    申请号：US09799052

    申请日：2001-03-06

    申请人： Youichi Ohsawa ,  Jun Watanabe ,  Takanobu Takeda ,  Akihiro Seki

    发明人： Youichi Ohsawa ,  Jun Watanabe ,  Takanobu Takeda ,  Akihiro Seki

    IPC分类号： G03F7004

    CPC分类号： G03F7/0397 ,  G03F7/0392 ,  G03F7/0758 ,  Y10S430/106

    摘要： A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: Ph—(CH2)nOCH(CH2CH3)— wherein Ph is phenyl and n=1 or 2. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.

    摘要翻译： 提供化学放大正性抗蚀剂组合物，其包含（A）光酸产生剂和（B）在酸的作用下改变其在碱显影剂中的溶解度并具有下式的取代基的树脂：Ph-（CH 2）n OCH（CH 2 CH 3 ） - 其中Ph是苯基并且n = 1或2.组合物具有许多优点，包括改进的焦点纬度，改进的分辨率，最小化的线宽变化或形状退化，即使在长期PED上，涂覆后剩余的最小化缺陷，显影和剥离， 并且在显影后改进的图案轮廓，并且适用于通过任何光刻，特别是深UV光刻的微细加工。

    Correlation operation method and matched filter
    96.
    发明授权
    Correlation operation method and matched filter 失效
    相关运算法和匹配滤波器

    公开(公告)号：US06594324B1

    公开(公告)日：2003-07-15

    申请号：US09478215

    申请日：2000-01-05

    申请人： Jun Watanabe ,  Tetsuhiko Miyatani

    发明人： Jun Watanabe ,  Tetsuhiko Miyatani

    IPC分类号： H04L2706

    CPC分类号： H04B1/7093

    摘要： There is disclosed a correlating operation method and a matched filter in which sensitivities in received code sequence selection and path detection are held to some degrees while circuit scale can be reduced. In the correlating operation method and the matched filter, code data obtained by adding or subtracting an in-phase component and a quadrature component of a received code sequence in a code mapping unit, and an in-phase component and a quadrature component of a received complex signal are subjected to correlating operation, and a correlating operation result is subjected to power adding operation to obtain a correlating operation output.

    摘要翻译： 公开了一种相关操作方法和匹配滤波器，其中接收的码序列选择和路径检测中的灵敏度被保持一定程度，同时可以减小电路规模。 在相关操作方法和匹配滤波器中，通过在代码映射单元中对接收到的代码序列的同相分量和正交分量进行相加或减法而获得的代码数据，以及接收的同相分量和正交分量 对复信号进行相关运算，对相关运算结果进行加法运算，得到相关运算输出。

    Piezoelectric resonator and a filter
    97.
    发明授权
    Piezoelectric resonator and a filter 失效
    压电谐振器和滤波器

    公开(公告)号：US06492759B1

    公开(公告)日：2002-12-10

    申请号：US09665476

    申请日：2000-09-20

    申请人： Jun Watanabe

    发明人： Jun Watanabe

    IPC分类号： H02L4104

    CPC分类号： H03H9/177 ,  H03H9/02086 ,  H03H9/02228 ,  H03H9/564

    摘要： A piezoelectric resonator has a piezoelectric substrate on obverse and reverse surfaces of which electrodes are disposed. Comb-shaped electrodes consisting of electrode fingers and spaces are disposed around the electrode situated at least on one surface of the piezoelectric substrate and at prescribed space intervals between this electrode and each of those comb-shaped electrodes. This arrangement enables obtaining means for suppressing the occurrence of spurious waves due to an inharmonic mode in the 200-MHz band high-frequency resonator or two-pole monolithic filter.

    摘要翻译： 压电谐振器在其正面和反面上具有压电基片，电极被设置在其上。 由电极指和空间构成的梳状电极设置在位于压电基板的至少一个表面上的电极周围，并且在该电极和每个这些梳状电极之间以规定的间隔设置。 这种布置使得能够获得用于抑制在200MHz频带高频谐振器或两极单片滤波器中由于非谐波模式引起的寄生波的发生的装置。