公开(公告)号：US06841086B2

公开(公告)日：2005-01-11

申请号：US10105388

申请日：2002-03-26

申请人： Hajimu Minami ,  Jun Watanabe ,  Yoshishige Nakamura

发明人： Hajimu Minami ,  Jun Watanabe ,  Yoshishige Nakamura

IPC分类号： C07F9/02 ,  C07F9/11 ,  C07H3/04 ,  D06M13/148 ,  D06M13/292 ,  D06M10/00 ,  C07C31/18 ,  C07F9/09 ,  C07H3/02

CPC分类号： D06M13/148 ,  C07F9/025 ,  C07F9/11 ,  C07H3/04 ,  D06M13/292

摘要： Stabilizing an aqueous solution of an alkali metal salt of partial alkyl esters of phosphoric acid by adding 1 to 10 weight percent of C3-12 polyhydric alcohol having three or more of hydroxyl groups to an alkali metal salt of partial alkyl esters of phosphoric acid having linear of branched-chain alkyl groups of 16 to 22 average carbon number, 0.6 to 1.0 degree of phosphorylation and 60 to 100% of neutralization degree, and providing a fiber finish containing the stabilized aqueous solution as a major component.

摘要翻译： 通过向具有线性的磷酸的部分烷基酯的碱金属盐中加入1至10重量％的具有3个或更多个羟基的C3-12多元醇，使磷酸的部分烷基酯的碱金属盐的水溶液稳定化 的支链烷基的平均碳数为16〜22，磷酸化为0.6〜1.0，中和度为60〜100％，提供含有稳定的水溶液作为主要成分的纤维整理剂。

公开(公告)号：US06730451B2

公开(公告)日：2004-05-04

申请号：US09735521

申请日：2000-12-14

申请人： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada

发明人： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada

IPC分类号： G03F7038

CPC分类号： G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is an acid labile group. Using such polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.

摘要翻译： 包含由式（1）表示的氟化主链的丙烯酸衍生物的重复单元的聚合物是新颖的.R 1，R 2和R 3独立地是H，F，C 1-20烷基或氟化C 1-20烷基 ，R 1，R 2和R 3中的至少一个含有氟，R 4是酸不稳定基团。 使用这种聚合物，获得具有F2准分子激光的低吸收性的抗蚀剂组合物。

公开(公告)号：US06710148B2

公开(公告)日：2004-03-23

申请号：US10068298

申请日：2002-02-08

申请人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

发明人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： C08F11800

CPC分类号： G03F7/0395 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0397

摘要： A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

摘要翻译： 在α-位含氟的丙烯酸酯单体与降冰片烯衍生物的共聚物对VUV辐射是高度透明的并且耐干蚀刻。 使用树脂作为基础聚合物的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，并且适用于光刻微处理。

公开(公告)号：US06692893B2

公开(公告)日：2004-02-17

申请号：US09983155

申请日：2001-10-23

申请人： Youichi Ohsawa ,  Jun Watanabe ,  Takeshi Nagata ,  Jun Hatakeyama

发明人： Youichi Ohsawa ,  Jun Watanabe ,  Takeshi Nagata ,  Jun Hatakeyama

IPC分类号： G03C173

CPC分类号： G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/126

摘要： Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.

摘要翻译： 芳基磺酰氧基萘磺酸盐与碘鎓或锍阳离子的鎓盐是新颖的。 包含作为光致酸发生剂的鎓盐的化学放大抗蚀剂组合物特别适用于微细加工，特别是通过深紫外光刻技术，因为许多优点，包括改进的分辨率，改善的焦点纬度，最小化的线宽变化或甚至在长期PED下的形状退化 涂层，显影和剥离后的碎屑，以及显影后改进的图案轮廓。

公开(公告)号：US06682869B2

公开(公告)日：2004-01-27

申请号：US09799052

申请日：2001-03-06

申请人： Youichi Ohsawa ,  Jun Watanabe ,  Takanobu Takeda ,  Akihiro Seki

发明人： Youichi Ohsawa ,  Jun Watanabe ,  Takanobu Takeda ,  Akihiro Seki

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  G03F7/0392 ,  G03F7/0758 ,  Y10S430/106

摘要： A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: Ph—(CH2)nOCH(CH2CH3)— wherein Ph is phenyl and n=1 or 2. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.

摘要翻译： 提供化学放大正性抗蚀剂组合物，其包含（A）光酸产生剂和（B）在酸的作用下改变其在碱显影剂中的溶解度并具有下式的取代基的树脂：Ph-（CH 2）n OCH（CH 2 CH 3 ） - 其中Ph是苯基并且n = 1或2.组合物具有许多优点，包括改进的焦点纬度，改进的分辨率，最小化的线宽变化或形状退化，即使在长期PED上，涂覆后剩余的最小化缺陷，显影和剥离， 并且在显影后改进的图案轮廓，并且适用于通过任何光刻，特别是深UV光刻的微细加工。

公开(公告)号：US06667415B1

公开(公告)日：2003-12-23

申请号：US08300245

申请日：1994-09-02

申请人： Fujio Yagihashi ,  Jun Watanabe ,  Minoru Takamizawa ,  Akinobu Tanaka ,  Yoshio Kawai ,  Tadahito Matsuda

发明人： Fujio Yagihashi ,  Jun Watanabe ,  Minoru Takamizawa ,  Akinobu Tanaka ,  Yoshio Kawai ,  Tadahito Matsuda

IPC分类号： C07C6976

CPC分类号： C07C69/734 ,  C07D309/12 ,  C07F7/1804 ,  G03F7/0045 ,  Y02P20/55

摘要： Disclosed are novel tert-butyl 4,4-bis(4′-hydroxyphenyl)pentanoate derivatives represented by the following general formula (I); wherein R1 represents a protective group which can be readily eliminated under an acidic condition, and R2 represents a hydrogen atom, a lower alkyl group or a lower alkoxy group: and high energy radiation-responsive positive resist materials using said novel derivatives as dissolution inhibitors.

摘要翻译： 公开了由以下通式（I）表示的新颖的4,4-双（4'-羟基苯基）戊酸叔丁酯衍生物：其中R 1表示在酸性条件下易于除去的保护基，R 代表氢原子，低级烷基或低级烷氧基;以及使用所述新衍生物作为溶解抑制剂的高能辐射响应正抗蚀材料。

公开(公告)号：US06605361B2

公开(公告)日：2003-08-12

申请号：US09965867

申请日：2001-10-01

申请人： Jun Watanabe ,  Takanobu Itoh

发明人： Jun Watanabe ,  Takanobu Itoh

IPC分类号： B32B904

CPC分类号： G02B1/14 ,  C09D183/04 ,  C09D183/14 ,  G02B1/105 ,  G02B1/111 ,  Y10T428/31663 ,  C08L2666/52 ,  C08L2666/54

摘要： A coating composition that can be applied to a lens, a method of making the coating composition, and a coated lens comprising a cured coating composition of the invention are disclosed. The coating composition is produced by providing a mixture comprising metal oxide colloid particles and an organosilicon compound, and adding an acetylacetonate metal salt and an aliphatic amine to the mixture.

公开(公告)号：US06594324B1

公开(公告)日：2003-07-15

申请号：US09478215

申请日：2000-01-05

申请人： Jun Watanabe ,  Tetsuhiko Miyatani

发明人： Jun Watanabe ,  Tetsuhiko Miyatani

IPC分类号： H04L2706

CPC分类号： H04B1/7093

摘要： There is disclosed a correlating operation method and a matched filter in which sensitivities in received code sequence selection and path detection are held to some degrees while circuit scale can be reduced. In the correlating operation method and the matched filter, code data obtained by adding or subtracting an in-phase component and a quadrature component of a received code sequence in a code mapping unit, and an in-phase component and a quadrature component of a received complex signal are subjected to correlating operation, and a correlating operation result is subjected to power adding operation to obtain a correlating operation output.

摘要翻译： 公开了一种相关操作方法和匹配滤波器，其中接收的码序列选择和路径检测中的灵敏度被保持一定程度，同时可以减小电路规模。 在相关操作方法和匹配滤波器中，通过在代码映射单元中对接收到的代码序列的同相分量和正交分量进行相加或减法而获得的代码数据，以及接收的同相分量和正交分量 对复信号进行相关运算，对相关运算结果进行加法运算，得到相关运算输出。

公开(公告)号：US06492759B1

公开(公告)日：2002-12-10

申请号：US09665476

申请日：2000-09-20

申请人： Jun Watanabe

发明人： Jun Watanabe

IPC分类号： H02L4104

CPC分类号： H03H9/177 ,  H03H9/02086 ,  H03H9/02228 ,  H03H9/564

摘要： A piezoelectric resonator has a piezoelectric substrate on obverse and reverse surfaces of which electrodes are disposed. Comb-shaped electrodes consisting of electrode fingers and spaces are disposed around the electrode situated at least on one surface of the piezoelectric substrate and at prescribed space intervals between this electrode and each of those comb-shaped electrodes. This arrangement enables obtaining means for suppressing the occurrence of spurious waves due to an inharmonic mode in the 200-MHz band high-frequency resonator or two-pole monolithic filter.

摘要翻译： 压电谐振器在其正面和反面上具有压电基片，电极被设置在其上。 由电极指和空间构成的梳状电极设置在位于压电基板的至少一个表面上的电极周围，并且在该电极和每个这些梳状电极之间以规定的间隔设置。 这种布置使得能够获得用于抑制在200MHz频带高频谐振器或两极单片滤波器中由于非谐波模式引起的寄生波的发生的装置。

公开(公告)号：US06461790B1

公开(公告)日：2002-10-08

申请号：US09658604

申请日：2000-09-08

申请人： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada ,  Mutsuo Nakashima ,  Masaru Sasago ,  Shinji Kishimura

发明人： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada ,  Mutsuo Nakashima ,  Masaru Sasago ,  Shinji Kishimura

IPC分类号： G03F7039

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106

摘要： Polymers comprising fluorinated vinyl phenol units and having acid labile groups partially introduced are novel. Using such polymers, resist compositions featuring transparency to excimer laser and alkali solubility are obtained.

摘要翻译： 包含氟化乙烯基苯酚单元和部分引入酸不稳定基团的聚合物是新颖的。 使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。