公开(公告)号：US20080078933A1

公开(公告)日：2008-04-03

申请号：US11925142

申请日：2007-10-26

申请人： Masahiro WATANABE ,  Takashi Hiroi ,  Maki Tanaka ,  Hiroyuki Shinada ,  Yasutsugu Usami

发明人： Masahiro WATANABE ,  Takashi Hiroi ,  Maki Tanaka ,  Hiroyuki Shinada ,  Yasutsugu Usami

IPC分类号： G21K5/04

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/216 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2482 ,  H01J2237/2487 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/304 ,  H01J2237/3175

摘要： A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.

摘要翻译： 用于评价试样的高度的方法和装置包括：电子束单元，具有电子束源，透镜，用于设置样本的台面并可在高度方向上控制;以及检测器，以及用于检测高度的高度检测系统 样本被放置在桌子上，而样品被电子束照射。 高度检测系统还包括照明系统，收集系统，第一和第二检测器，被配置为在样本被电子束照射的同时从第一和第二检测器接收输出信号并从输出产生比较信号的装置 信号，其中比较信号响应于样本的高度。

公开(公告)号：US20080067381A1

公开(公告)日：2008-03-20

申请号：US11808247

申请日：2007-06-07

申请人： Takashi Hiroi ,  Kenji Tanimoto ,  Yuko Sasaki ,  Hiroshi Makino

发明人： Takashi Hiroi ,  Kenji Tanimoto ,  Yuko Sasaki ,  Hiroshi Makino

IPC分类号： G21K7/00

CPC分类号： H01J37/20 ,  G01R31/307 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2008 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/221 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/28

摘要： A semiconductor wafer inspection tool and a semiconductor wafer inspection method capable of conducting an inspection under appropriate conditions in any one of an NVC (Negative Voltage Contrast) mode and a PVC (Positive Voltage Contrast) mode is provided. Primary electrons 2 are irradiated onto a wafer to be inspected 6 and the irradiation position thereof is scanned in an XY direction. Secondary electrons (or reflected electrons) 10 from the wafer to be inspected 6 are controlled by a charge control electrode 5 and detected by a sensor 11. An image processor converts a detection signal from the sensor 11 to a detected image, compares the detected image with a predetermined reference image, judges defects, an overall control section 14 selects inspection conditions from recipe information for each wafer to be inspected 6 and sets a voltage to be applied to the charge control electrode 5. A Z stage 8 sets the distance between the wafer to be inspected 6 and the charge control electrode 5 according to this voltage.

摘要翻译： 提供能够在适当条件下进行NVC（负电压对比度）模式和PVC（正电压对比度）模式中的任一种的半导体晶片检查工具和半导体晶片检查方法。 将一次电子2照射到要检查的晶片6上，并且其XY照射位置被扫描。 来自待检查晶片的二次电子（或反射电子）10由电荷控制电极5控制，并由传感器11检测。 图像处理器将来自传感器11的检测信号转换为检测图像，将检测到的图像与预定参考图像进行比较，判断缺陷，总体控制部14从每个被检查晶片的配方信息中选择检查条件6， 施加到充电控制电极5的电压。 Z级8根据该电压设定待检查晶片6与充电控制电极5之间的距离。

公开(公告)号：US20080056559A1

公开(公告)日：2008-03-06

申请号：US11931856

申请日：2007-10-31

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

摘要： An apparatus for processing a defect candidate image, including: a scanning electron microscope for taking an enlarged image of a specimen by irradiating and scanning a converged electron beam onto the specimen and detecting charged particles emanated from the specimen by the irradiation; an image processor for processing the image taken by the scanning electron microscope to detect defect candidates on the specimen and classify the detected defect candidates into one of plural classes; a memory for storing output from the image processor including images of the detected defect candidates; and a display unit which displays information stored in the memory and an indicator, wherein the display unit displays a distribution of the detected and classified defect candidates in a map format by distinguishing by the classified class, and the display unit also displays an image of a defect candidate stored in the memory together with the map which is indicated on the map by the indicator.

摘要翻译： 一种用于处理缺陷候选图像的装置，包括：扫描电子显微镜，用于通过照射和扫描聚集的电子束到样品上并通过照射检测从样品发出的带电粒子，从而获取样本的放大图像; 用于处理由扫描电子显微镜拍摄的图像以检测样本上的缺陷候选的图像处理器，并将检测到的缺陷候选分类为多个等级之一; 用于存储来自图像处理器的输出的存储器，包括检测到的缺陷候选的图像; 以及显示单元，其显示存储在存储器中的信息和指示器，其中，所述显示单元通过由所述分类的类区分来以地图格式显示所检测和分类的缺陷候选的分布，并且所述显示单元还显示图像 存储在存储器中的缺陷候选者以及由指示符在地图上指示的地图。

公开(公告)号：US07329889B2

公开(公告)日：2008-02-12

申请号：US11180672

申请日：2005-07-14

申请人： Masahiro Watanabe ,  Takashi Hiroi ,  Maki Tanaka ,  Hiroyuki Shinada ,  Yasutsugu Usami

发明人： Masahiro Watanabe ,  Takashi Hiroi ,  Maki Tanaka ,  Hiroyuki Shinada ,  Yasutsugu Usami

IPC分类号： G01N21/86

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/216 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2482 ,  H01J2237/2487 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/304 ,  H01J2237/3175

摘要： An electron beam apparatus including a table which mounts a specimen and is movable in three dimensional directions, an electron beam optical system irradiating an electron beam onto a specimen and for detecting a secondary electron emanated from the specimen by the irradiation of the electron beam, and a surface height detection system for detecting height of the surface of the specimen mounted on the table. A focus control system controls a relative position between a focus position of the electron optical system and the table in accordance with information of the height, and an image processing system obtains an image from the detected secondary electron and processes the obtained image to detect a defect on the surface of the specimen.

摘要翻译： 一种电子束装置，包括安装试件并可在三维方向上移动的工作台，将电子束照射到试样上并通过照射电子束来检测从试样发出的二次电子的电子束光学系统;以及 表面高度检测系统，用于检测安装在桌子上的样本的表面的高度。 焦点控制系统根据高度信息来控制电子光学系统的焦点位置与桌子之间的相对位置，并且图像处理系统从检测到的二次电子中获取图像并处理所获得的图像以检测缺陷 在样品的表面。

公开(公告)号：US20080002876A1

公开(公告)日：2008-01-03

申请号：US11853500

申请日：2007-09-11

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

摘要翻译： 在图案检查装置中，将可以预期相同图案的位置的图像彼此进行比较。 然而，通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题，在高灵敏度条件下检测到的缺陷被认为是缺陷候选，并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外，将如此获得的临界阈值与多个阈值进行比较，从而允许在单次检查中获得多个检查结果。

公开(公告)号：US07269280B2

公开(公告)日：2007-09-11

申请号：US10062632

申请日：2002-02-05

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

摘要翻译： 在图案检查装置中，将可以预期相同图案的位置的图像彼此进行比较。 然而，通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题，在高灵敏度条件下检测到的缺陷被认为是缺陷候选，并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外，将如此获得的临界阈值与多个阈值进行比较，从而允许在单次检查中获得多个检查结果。

公开(公告)号：US07260256B2

公开(公告)日：2007-08-21

申请号：US09571938

申请日：2000-05-16

申请人： Takashi Hiroi ,  Maki Tanaka ,  Masahiro Watanabe ,  Asahiro Kuni ,  Hiroyuki Shinada ,  Mari Nozoe ,  Aritoshi Sugimoto ,  Chie Shishido

发明人： Takashi Hiroi ,  Maki Tanaka ,  Masahiro Watanabe ,  Asahiro Kuni ,  Hiroyuki Shinada ,  Mari Nozoe ,  Aritoshi Sugimoto ,  Chie Shishido

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148

摘要： The present invention relates to detection of defects with simple specification of the coordinates, in the inspection of an object having a plurality of patterns in which a portion having the two-dimensional repetition and portions having the repetition only in the X direction and in the Y direction are mixedly present. The cross comparison between a notice point and comparison points, for example which are repetitive pitches away from the notice point, is carried out, and only the portion having the difference which can be found out with any of the comparison points is extracted as a defect candidate, which results in that the portion having the two-dimensional repetition as well as the portion having the repetition only in the X direction or in the Y direction can be inspected. As a result, while the portion, such as an isolated point, having no repetition both in the X direction and in the Y direction is extracted as the defect candidate, the defect candidate is not treated as the defect in the case where the defect candidate of interest occurs regularly in a plurality of objects to be inspected, so that such a defect candidate is excluded to extract only a true defect.

摘要翻译： 本发明涉及通过简单的坐标指定来检测缺陷，在检查具有多个图案的物体时，其中具有二维重复的部分和仅在X方向上重复的部分和Y 方向混合存在。 执行通知点和比较点之间的交叉比较，例如，距离通知点的重复间距是比较点，并且只有具有任何比较点可以找出的具有差异的部分被提取为缺陷 候选，这导致可以检查具有二维重复的部分以及仅在X方向或Y方向上具有重复的部分。 结果，虽然提取了在X方向和Y方向上都没有重复的诸如孤立点的部分作为缺陷候选，但是在缺陷候选者的情况下，缺陷候选不被视为缺陷 感兴趣的事件定期发生在要检查的多个对象中，因此排除这样的缺陷候选者仅提取真实的缺陷。

公开(公告)号：US07133550B2

公开(公告)日：2006-11-07

申请号：US09986299

申请日：2001-11-08

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

摘要： A pattern inspection method in which an image can be detected without an image detection error caused by an adverse effect to be given by such factors as ions implanted in a wafer, pattern connection/non-connection, and pattern edge formation. A digital image of an object substrate is attained through microscopic observation thereof, the attained digital image is examined to detect defects, while masking a region pre-registered in terms of coordinates, or while masking a pattern meeting a pre-registered pattern, and an image of each of the defects thus detected is displayed. Further, each of the defects detected using the digital image attained through microscopic observation is checked to determine whether its feature meets a pre-registered feature or not. Defects having a feature that meets the pre-registered feature are so displayed that they can be turned on/off, or they are so displayed as to be distinguishable from the other defects.

摘要翻译： 图案检查方法，其中可以检测图像，而不会由于植入在晶片中的离子，图案连接/非连接和图案边缘形成等因素所引起的不利影响而引起图像检测误差。 通过显微镜观察目标基板的数字图像，检查所获得的数字图像以检测缺陷，同时掩蔽预先登记的区域上的坐标，或者在掩蔽满足预先注册的图案的图案的同时， 显示由此检测到的每个缺陷的图像。 此外，检查使用通过显微镜观察获得的数字图像检测到的每个缺陷，以确定其特征是否满足预先注册的特征。 具有满足预注册特征的特征的缺陷被显示为可以打开/关闭，或者它们被显示为与其他缺陷区分开。

公开(公告)号：US07122796B2

公开(公告)日：2006-10-17

申请号：US11003506

申请日：2004-12-06

申请人： Takashi Hiroi ,  Maki Tanaka ,  Masahiro Watanabe ,  Asahiro Kuni ,  Yukio Matsuyama ,  Yuji Takagi ,  Hiroyuki Shinada ,  Mari Nozoe ,  Aritoshi Sugimoto

发明人： Takashi Hiroi ,  Maki Tanaka ,  Masahiro Watanabe ,  Asahiro Kuni ,  Yukio Matsuyama ,  Yuji Takagi ,  Hiroyuki Shinada ,  Mari Nozoe ,  Aritoshi Sugimoto

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： An inspection method and apparatus includes control of an acceleration voltage of an electron beam, irradiation of the electron beam to an object to be inspected mounted on a stage which is continuously moving at least in one direction, and detection of at least one of secondary electrons and reflected electrons emanated from the object in response to the irradiation. An image of the object is obtained from the detected electron by using positional information of the stage and inspection or measurement of the object is conducted using and obtained image. In the detection, an electric field in the vicinity of the object mounted on the stage is controlled so that at least one secondary electrons and the reflected electrons emanated from the object in response to the irradiation of the electron beam are decelerated.

摘要翻译： 检查方法和装置包括控制电子束的加速电压，将电子束照射到安装在至少在一个方向上连续移动的台上的被检查物体，以及二次电子中的至少一个的检测 以及响应于照射从物体发射的反射电子。 通过使用舞台的位置信息从被检测的电子获得对象的图像，并使用获得的图像进行对象的检查或测量。 在检测中，控制安装在平台上的物体附近的电场，使得响应于电子束的照射而从物体发出的至少一个二次电子和反射电子减速。

公开(公告)号：US06885012B2

公开(公告)日：2005-04-26

申请号：US10851322

申请日：2004-05-24

申请人： Maki Tanaka ,  Masahiro Watanabe ,  Takashi Hiroi ,  Hiroyuki Shinada ,  Taku Ninomiya

发明人： Maki Tanaka ,  Masahiro Watanabe ,  Takashi Hiroi ,  Hiroyuki Shinada ,  Taku Ninomiya

IPC分类号： G01N1/28 ,  G01Q30/16 ,  G01Q30/20 ,  G01Q40/00 ,  G01Q60/44 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01J37/21 ,  G01N2001/2893 ,  H01J2237/2817 ,  H01J2237/304

摘要： A convergent charged particle beam apparatus includes an electron beam system which emits a converged electron beam, a vacuum chamber which is connected to the electron beam system, and a stage which mounts a specimen and moves at least in one direction inside of the vacuum chamber. An electron beam image observation unit observes an electron beam image of a surface of the specimen. A height detector optically detects a height of the specimen mounted on the stage by illuminating the surface of said specimen with light and by detecting reflected light of the illumination reflected from the surface of the specimen, and a controller controls a focus position of the electron beam in accordance with an output from the height detector while the stage is moving at least in one direction.

摘要翻译： 收敛带电粒子束装置包括发射会聚电子束的电子束系统，连接到电子束系统的真空室和安装样本并至少沿真空室内的一个方向移动的台。 电子束图像观察单元观察样品表面的电子束图像。 高度检测器通过用光照射所述样本的表面并通过检测从样本表面反射的照明的反射光来光学地检测安装在舞台上的样本的高度，并且控制器控制电子束的聚焦位置 根据来自高度检测器的输出，而舞台至少在一个方向上移动。