公开(公告)号：US5385867A

公开(公告)日：1995-01-31

申请号：US216968

申请日：1994-03-24

申请人： Tetsuya Ueda ,  Kousaku Yano ,  Tomoyasu Murakami ,  Michinari Yamanaka ,  Shuji Hirao ,  Noboru Nomura

发明人： Tetsuya Ueda ,  Kousaku Yano ,  Tomoyasu Murakami ,  Michinari Yamanaka ,  Shuji Hirao ,  Noboru Nomura

IPC分类号： H01L21/3205 ,  H01L21/768 ,  H01L23/522 ,  H01L21/283 ,  H01L21/31

CPC分类号： H01L21/76847 ,  H01L21/76844 ,  H01L21/76877 ,  H01L21/76885 ,  H01L23/5226 ,  H01L2924/0002 ,  Y10S438/948

摘要： After accumulating a BPSG film layer on a silicon substrate, a first Al--Si--Cu film layer, a W film layer and a second Al--Si--Cu film layer are successively accumulated on this BPSG film layer. A resist pattern with wide-width and narrow-width pattern portions is formed on the second Al--Si--Cu film layer. The wide-width pattern portion is provided at a position corresponding to a contact for connecting a first-layer metallic wiring and a second-layer metallic wiring, while the narrow-width pattern portion is provided at a position corresponding to a wiring portion for the first-layer metallic wiring. After applying first etching on the second Al--Si--Cu film layer with a mask of the resist patter, second etching is applied on the W film layer. Thereafter, by applying third etching, the resist pattern remaining on the first-layer metallic wiring is removed and the first Al--Si--Cu film layer is transfigured into a tall metallic film portion and a short metallic film portion. After accumulating an inter-layer insulating film layer on the first Al--Si--Cu film layer, etchback is applied on this inter-layer insulating film layer until the top of the tall metallic film portion is bared. Then, the second-layer metallic wiring is formed on the inter-layer insulating film layer so that the second-layer metallic wiring is connected with the tall metallic film portion.

摘要翻译： 在硅衬底上积累BPSG膜层之后，第一Al-Si-Cu膜层，W膜层和第二Al-Si-Cu膜层依次堆积在该BPSG膜层上。 在第二Al-Si-Cu膜层上形成具有宽幅和窄宽图案部分的抗蚀剂图案。 宽幅图形部分设置在与用于连接第一层金属布线和第二层金属布线的接触件相对应的位置处，而窄宽图案部分设置在与布线部分相对应的位置处 第一层金属布线。 在具有抗蚀剂图案的掩模的第二Al-Si-Cu膜层上施加第一蚀刻之后，在W膜层上施加第二蚀刻。 此后，通过施加第三蚀刻，去除残留在第一层金属布线上的抗蚀剂图案，并将第一Al-Si-Cu膜层变形为高金属膜部分和短金属膜部分。 在第一Al-Si-Cu膜层上积累层间绝缘膜层之后，在该层间绝缘膜层上施加回蚀，直到高金属膜部分的顶部露出。 然后，在层间绝缘膜层上形成第二层金属布线，使得第二层金属布线与高金属膜部分连接。

公开(公告)号：US5345145A

公开(公告)日：1994-09-06

申请号：US39911

申请日：1993-03-30

申请人： Kenji Harafuji ,  Mitsuhiro Ohkuni ,  Tokuhiko Tamaki ,  Masafumi Kubota ,  Noboru Nomura

发明人： Kenji Harafuji ,  Mitsuhiro Ohkuni ,  Tokuhiko Tamaki ,  Masafumi Kubota ,  Noboru Nomura

IPC分类号： H01J37/32 ,  H05H1/46 ,  H01J7/24

CPC分类号： H01J37/32623 ,  H01J37/32165 ,  H01J37/3266 ,  H05H1/46

摘要： A plasma generating method comprises: a first step of disposing a plurality of lateral electrodes at lateral sides of a plasma generating part in a vacuum chamber; a second step of respectively applying, to the lateral electrodes, high frequency electric powers of which frequencies are the same as one another and of which phases are different from one another, thereby to excite, in the plasma generating part, a high frequency rotating electric field to cause electrons under translational motions in the plasma generating part to present oscillating or rotating motions; and a third step of applying, to the plasma generating part, a magnetic field substantially at a right angle to the working plane of the high frequency rotating electric field, thereby to convert the translational movement of the electrons in the plasma generating part into revolving motions under oscillating or rotating motions by which the electrons revolve in the plasma generating part. The high frequency rotating electric field and the magnetic field cause the electrons in the plasma generating part to be confined therein.

摘要翻译： 一种等离子体产生方法包括：第一步骤，在真空室中的等离子体产生部分的侧面设置多个横向电极; 分别向横向电极施加频率彼此相同并且相位彼此不同的高频电力的第二步骤，从而在等离子体产生部分中激发高频旋转电力 场引起电子在等离子体产生部分中的平移运动以呈现振荡或旋转运动; 以及向所述等离子体产生部施加与所述高频旋转电场的工作面大致成直角的磁场的第3工序，将所述等离子体产生部中的电子的平移运动转换为旋转运动 电子在等离子体产生部分中旋转的摆动或旋转运动。 高频旋转电场和磁场使得等离子体产生部分中的电子被限制在其中。

公开(公告)号：US5186788A

公开(公告)日：1993-02-16

申请号：US655237

申请日：1991-02-12

申请人： Kazuhiko Hashimoto ,  Kazuhiro Yamashita ,  Noboru Nomura

发明人： Kazuhiko Hashimoto ,  Kazuhiro Yamashita ,  Noboru Nomura

IPC分类号： G03F7/039 ,  G03F7/095 ,  G03F7/20

CPC分类号： G03F7/039 ,  G03F7/095 ,  G03F7/2022 ,  Y10S438/949

摘要： Disclosed is a fine pattern forming method which is capable of forming a high positive-to-negative reversal pattern high in dry-etch resistance, at high density, by irradiating an entire surface of a resist with ion shower at low doses before or after electron beam or focus ion beam exposure, and then developing it.

摘要翻译： 公开了一种精细图案形成方法，其能够通过在电子之前或之后以低剂量用离子淋浴器照射抗蚀剂的整个表面，从而以高密度形成高耐干蚀刻电阻的高正负反转图案 光束或聚焦离子束曝光，然后显影。

公开(公告)号：US4861148A

公开(公告)日：1989-08-29

申请号：US24134

申请日：1987-03-11

申请人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atushi Ueno ,  Shotaro Yoshida

发明人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atushi Ueno ,  Shotaro Yoshida

IPC分类号： G02B17/08 ,  G03F7/20

CPC分类号： G02B17/0888 ,  G02B17/084 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70308

摘要： A projection optical system for use in a precise copy which uses a pair of catadioptric optical systems consisting of convex mirrors, concave mirrors, and phase correction members is shown. Two catadioptric optical systems commonly use an entrance pupil on a coaxis and are coupled so as to respectively face the phase correction members. Each of the concave mirrors has an opening at the center. Each of the convex mirrors has no opening in one embodiment but has an opening portion at the center in another embodiment.

摘要翻译： 示出了使用由凸面镜，凹面镜和相位校正构件组成的一对反射折射光学系统的精确复制用的投影光学系统。 两个反折射光学系统通常在同轴线上使用入射光瞳，并且被耦合以分别面对相位校正构件。 每个凹面镜在中心有开口。 在另一实施例中，每个凸面镜在一个实施例中不具有开口，而在中心处具有开口部分。

公开(公告)号：US4828392A

公开(公告)日：1989-05-09

申请号：US837766

申请日：1986-03-10

申请人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

发明人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

IPC分类号： G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7076

摘要： A reduction projection type alignment and exposure apparatus which comprises a light source, a reticle having a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a substrate having a second grating, and a plurality of photo-detectors for detecting light intensities of a plurality of spectrums appearing on the spatial filter.The light beam generated from the light source is applied to the reticle at which it is divided into a plurality of diffracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, the spatial filter and the second lens system onto the substrate so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams appear as a plurality of spectrums on the spatial filter. These spectrums are detected by photo-detectors and used for alignment of the reticle and the substrate.

摘要翻译： 一种还原投影型取向曝光装置，包括光源，具有第一光栅的掩模版，第一透镜系统，设置在第一透镜系统的傅立叶光谱平面附近的空间滤光器，第二透镜系统，具有第二光栅的基板 以及用于检测出现在空间滤波器上的多个光谱的光强度的多个光检测器。 从光源产生的光束被施加到光掩模，在该掩模版处，由第一光栅将其分成多个衍射光束，衍射光束通过第一透镜系统，空间滤光器和第二透镜 系统到基板上，使得衍射光束被第二光栅重衍射，并且再衍射光束在空间滤光器上表现为多个光谱。 这些光谱由光电检测器检测并用于对准标线片和基板。

公开(公告)号：US4757354A

公开(公告)日：1988-07-12

申请号：US43620

申请日：1987-04-28

申请人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atsushi Ueno ,  Shotaro Yoshida

发明人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atsushi Ueno ,  Shotaro Yoshida

IPC分类号： G02B17/08 ,  G03F7/20 ,  G03B27/42 ,  G02B17/00

CPC分类号： G02B17/0852 ,  G02B17/0808 ,  G02B17/0892 ,  G03F7/70225

摘要： A projection optical system for photolithography includes a refraction sub-system and a cata-dioptric sub-system optically connected to each other. The refraction sub-system extends at an object side. The cata-dioptric sub-system extends at an image side. The refraction sub-system is generally composed of refracting members. The cata-dioptric sub-system is generally composed of a phase compensating member, a concave mirror, and a convex mirror. The phase compensating member adjoins the refraction sub-system. At least the concave mirror has a central opening through which light passes. The light forms an image at a rear of the concave mirror.

摘要翻译： 用于光刻的投影光学系统包括彼此光学连接的折射子系统和cata度数子系统。 折射子系统在物体侧延伸。 cata-indiopt子系统在图像侧延伸。 折射子系统通常由折射构件组成。 数位子系统通常由相位补偿构件，凹面镜和凸面镜组成。 相位补偿构件邻接折射子系统。 至少凹面镜具有光通过的中心开口。 光在凹面镜的后部形成图像。

公开(公告)号：US4685198A

公开(公告)日：1987-08-11

申请号：US758962

申请日：1985-07-25

申请人： Kenji Kawakita ,  Noboru Nomura ,  Toyoki Takemoto

发明人： Kenji Kawakita ,  Noboru Nomura ,  Toyoki Takemoto

IPC分类号： H01L21/762 ,  H01L21/763 ,  H01L29/06

CPC分类号： H01L21/76264 ,  H01L21/762 ,  H01L21/763 ,  H01L21/76281 ,  H01L21/76283 ,  Y10S148/05 ,  Y10S148/115 ,  Y10S438/973

摘要： Disclosed is a method of isolating a transistor perfectly by employing a selective oxidation technology (LOCOS technology). More particularly, vertical openings are formed in the surface of {100} silicon substrate, and oxidation resistant films are formed of this surface and in part of the side walls of these openings. In succession, by etching with an etchant having an orientation anisotropy, dents are formed at high precision in the side walls of the openings. By oxidizing using the oxidation resistant film as the mask, an oxide film growing out from a dent in the opening side wall is connected with another oxide film growing out from an adjacent dent. The transistor thus formed in the active region of the silicon electrically isolated from the substrate is small in parasitic capacitance and may be formed into a small size, so that it possesses the features suited to VLSI, that is, high speed, low power consumption, and processability to high density integration.

摘要翻译： 公开了通过采用选择氧化技术（LOCOS技术）将晶体管完全隔离的方法。 更具体地，在{100}硅衬底的表面中形成垂直开口，并且由该表面和这些开口的一部分侧壁形成抗氧化膜。 相继地，通过用具有取向各向异性的蚀刻剂进行蚀刻，在开口的侧壁中以高精度形成凹痕。 通过使用抗氧化膜作为掩模进行氧化，从开口侧壁中的凹陷生长的氧化膜与从相邻凹坑生长的另一氧化膜连接。 因此，在与衬底电隔离的硅的有源区中形成的晶体管的寄生电容小，并且可以形成为小尺寸，使得其具有适合于VLSI的特征，即高速度，低功耗， 和可加工性的高密度集成。

公开(公告)号：US4660113A

公开(公告)日：1987-04-21

申请号：US448058

申请日：1982-12-09

申请人： Noboru Nomura ,  Yasuharu Shimeki

发明人： Noboru Nomura ,  Yasuharu Shimeki

IPC分类号： G11B5/39 ,  G11B5/30

CPC分类号： G11B5/3964 ,  G11B5/399

摘要： A magnetoresistive type thin film magnetic head is completely unaffected by external noise and produces only low interference with a recording medium. A magnetoresistive element which constitutes the thin film magnetic head has three terminals constituted by two end terminals and an intermediate terminal. Constant currents which flow in opposite directions are respectively supplied to the two end terminals. A magnetic field of a signal recorded on and reproduced from a single track of the recording medium is applied to the magnetoresistive element, and reproduction outputs of opposite phases appear at the two end terminals. These outputs are differentially amplified by a differential amplifier. Furthermore, the magnetoresistive element is biased by an induced magnetic anisotropy means in a predetermined direction.

摘要翻译： 磁阻型薄膜磁头完全不受外部噪声的影响，并且仅对记录介质产生低干扰。 构成薄膜磁头的磁阻元件具有由两个端子和中间端子构成的三个端子。 沿相反方向流动的恒定电流分别提供给两个端子。 记录在记录介质的单个轨道上并从其再现的信号的磁场被施加到磁阻元件，并且在两个端子端出现相反相位的再现输出。 这些输出由差分放大器差分放大。 此外，磁阻元件被感应磁各向异性装置沿预定方向偏置。

公开(公告)号：US4504540A

公开(公告)日：1985-03-12

申请号：US582866

申请日：1984-02-27

申请人： Nobuyuki Kaminaka ,  Kenji Kanai ,  Noboru Nomura ,  Yuji Omata

发明人： Nobuyuki Kaminaka ,  Kenji Kanai ,  Noboru Nomura ,  Yuji Omata

IPC分类号： G11B5/255 ,  G11B5/31 ,  H01F10/32 ,  H01L21/31 ,  B32B3/00 ,  B32B9/04

CPC分类号： B82Y25/00 ,  G11B5/3106 ,  H01F10/324 ,  H01F10/3254 ,  Y10S428/90 ,  Y10S428/901 ,  Y10T428/1193 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24917

摘要： The invention provides a thin film element which includes a thin film of an organic material, which has a multilayered structure of thin films, and which has a protective film of multilayered structure having films of at least two nonmagnetic materials, or of a thin film of a mixture of at least two nonmagnetic insulating materials. The protective film has a low internal stress, and the step coverage and adhesion strength thereof at edges of the high step portion is excellent.

摘要翻译： 本发明提供一种薄膜元件，其包括具有薄膜多层结构的有机材料薄膜，并且具有具有至少两个非磁性材料的膜的多层结构的保护膜或薄膜的薄膜 至少两种非磁性绝缘材料的混合物。 保护膜的内部应力低，高台阶部的边缘的台阶覆盖率和粘合强度优异。

公开(公告)号：US4490760A

公开(公告)日：1984-12-25

申请号：US340367

申请日：1982-01-18

申请人： Nobuyuki Kaminaka ,  Kenji Kanai ,  Noboru Nomura

发明人： Nobuyuki Kaminaka ,  Kenji Kanai ,  Noboru Nomura

IPC分类号： G11B5/187 ,  G11B5/31 ,  H01F10/28 ,  G11B5/16 ,  G11B5/20 ,  G11B5/25

CPC分类号： G11B5/31

摘要： A thin-film magnetic head having a magnetic substrate made from ferrite, iron-aluminum-silicon alloy or like material, and an upper magnetic layer formed on the magnetic substrate with a lower magnetic layer and a conductive layer interposed therebetween. A portion of the upper magnetic layer is jointed to the magnetic substrate while another portion of the upper magnetic layer is jointed to the lower magnetic layer through a non-magnetic layer of SiO.sub.2 or like material constituting a magnetic gap. The lower magnetic layer, magnetic substrate, upper magnetic layer and the non-magnetic layer in combination form a closed magnetic circuit. A groove is defined between the lower magnetic layer and the magnetic substrate, and formed in the side surface of the magnetic substrate adapted to face a magnetic recording medium. The recess is filled with a non-magnetic material such as glass. Accordingly, it is possible to realize a definite pole piece length to permit an improvement in short-wavelength reproduction characteristics.

摘要翻译： 具有由铁氧体，铁 - 铝 - 硅合金等材料制成的磁性基板的薄膜磁头和在磁性基板上形成有较低磁性层和介于其间的导电层的上部磁性层。 上部磁性层的一部分与磁性基板接合，另一部分上部磁性层通过构成磁隙的SiO 2或类似材料的非磁性层与下部磁性层接合。 下磁层，磁性基板，上磁层和非磁性层组合形成闭合磁路。 在下磁性层和磁性基板之间形成凹槽，并且形成在适于面向磁记录介质的磁性基板的侧表面中。 该凹部填充有诸如玻璃之类的非磁性材料。 因此，可以实现确定的极片长度以允许改善短波长再现特性。