公开(公告)号：US20130029022A1

公开(公告)日：2013-01-31

申请号：US13513146

申请日：2012-02-10

申请人： Norio Endo ,  Shinobu Ueno ,  Daiju Mizumoto ,  Takafumi Asakura ,  Hiroshi Shibata

发明人： Norio Endo ,  Shinobu Ueno ,  Daiju Mizumoto ,  Takafumi Asakura ,  Hiroshi Shibata

IPC分类号： C12C12/00 ,  A47J31/40 ,  A23L2/38

CPC分类号： A23G9/281 ,  A23G9/045 ,  A23G9/20 ,  A23L2/40 ,  A23P30/40 ,  C12C11/11

摘要： An effervescent beverage containing a grain degradation product which contains creamy and tasty foam having a refreshing texture and a new texture of a prolonged creamy-foam retention is formed on the effervescent beverage upon drinking, a method for dispensing and a dispenser of such effervescent beverage are disclosed. According to the present invention, there is provided a method for dispensing the effervescent beverage containing a grain degradation product by cooling the effervescent beverage and pouring it into a vessel to serve, wherein foam having a snow-like refreshing texture and a new texture of a prolonged creamy-foam retention is formed on the effervescent beverage, said method comprising: forming a slurry containing the extract-frozen microparticles by cooling and stirring the effervescent beverage, preparing the frozen foam of the effervescent beverage containing the extract-frozen microparticles and fine bubbles by cooling and stirring the slurry and incorporating the outside gas into the slurry, and supplying the prepared frozen foam of the effervescent beverage to the effervescent beverage poured into a vessel as a foam component.

摘要翻译： 包含谷物降解产物的泡腾饮料在饮用时在泡腾饮料上形成具有清爽质感的清爽质地和新颖质感的乳状和美味泡沫，这种泡腾饮料的分配方法和分配器 披露 根据本发明，提供了一种通过冷却泡腾饮料并将其倒入容器中来分配含有谷物降解产物的泡腾饮料的方法，其中具有积雪状清新质地的泡沫和新的织构 所述方法包括：通过冷却和搅拌泡腾饮料形成含有提取物冷冻微粒的浆料，制备含有提取物冷冻微粒和泡沫的泡腾饮料的冷冻泡沫 通过冷却和搅拌浆料并将外部气体并入浆料中，并将制备的泡腾饮料的冷冻泡沫供应到作为泡沫组分倒入容器中的泡腾饮料中。

公开(公告)号：US20120322915A1

公开(公告)日：2012-12-20

申请号：US13581923

申请日：2011-02-23

申请人： Takafumi Sumiyoshi ,  Hiroshi Shibata

发明人： Takafumi Sumiyoshi ,  Hiroshi Shibata

IPC分类号： B05B1/02 ,  C08L63/00 ,  B05D7/00

CPC分类号： C01B33/18 ,  B01J2/006 ,  C01P2004/61 ,  H01L21/565 ,  H01L23/295 ,  H01L2924/0002 ,  H01L2924/00

摘要： A particle production apparatus 1 includes a processing section 3 in which a processing liquid is allowed to adhere to a surface of each of inorganic particles contained in a powder material, a chamber 4 connected to the processing section 3 at a downstream side thereof in which the powder material is separated from gas carrying the powder material, a powder material supply device 50 having a supply portion 5 and a supply unit 6 for supplying the powder material and the like into the processing section 3, and a processing liquid spraying device 70 having a nozzle 7, a pump 8, a supply unit 9 for supplying the processing liquid, a high-pressure gas (air) generating unit 11 and the like. The processing liquid spraying device 70 is configured to spray the processing liquid as droplets onto the powder material just after the powder material being supplied into the processing section 3. Preferably, a volume of the processing section 3 is smaller than a volume of the chamber 4.

摘要翻译： 颗粒生产设备1包括处理部分3，其中处理液体被粘附到包含在粉末材料中的每个无机颗粒的表面上，在下游侧连接到处理部分3的室4， 粉末材料与携带粉末材料的气体分离，粉末材料供给装置50具有供应部分5和用于将粉末材料等供应到处理部分3中的供应单元6以及具有 喷嘴7，泵8，用于供给处理液的供给单元9，高压气体（空气）生成单元11等。 处理液喷射装置70被配置为在粉末材料被供给到处理部分3之后将作为液滴的处理液体喷射到粉末材料上。优选地，处理部分3的体积小于室4的体积 。

公开(公告)号：US08253140B2

公开(公告)日：2012-08-28

申请号：US13012448

申请日：2011-01-24

申请人： Hiroshi Shibata ,  Atsuo Isobe

发明人： Hiroshi Shibata ,  Atsuo Isobe

IPC分类号： H01L29/04 ,  H01L27/01

CPC分类号： H01L27/1255 ,  G02F1/133345 ,  G02F1/13454 ,  G02F1/136209 ,  G02F1/136213 ,  G02F1/136227 ,  G02F1/136277 ,  G02F1/136286 ,  G02F1/1368 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/3244 ,  H01L27/3248 ,  H01L27/3262 ,  H01L27/3265 ,  H01L27/3276 ,  H01L29/4908 ,  H01L29/786 ,  H01L29/78633

摘要： To provide a liquid crystal display device having high quality display by obtaining a high aperture ratio while securing a sufficient storage capacitor (Cs), and at the same time, by dispersing a load (a pixel writing-in electric current) of a capacitor wiring in a timely manner to effectively reduce the load. A scanning line is formed on a different layer from a gate electrode and the capacitor wiring is arranged so as to be parallel with a signal line. Each pixel is connected to the individually independent capacitor wiring via a dielectric. Therefore, variations in the electric potential of the capacitor wiring caused by a writing-in electric current of a neighboring pixel can be avoided, whereby obtaining satisfactory display images.

摘要翻译： 为了提供一种通过在确保足够的存储电容器（Cs）的同时获得高开口率而具有高质量显示的液晶显示装置，并且同时通过分散电容器布线的负载（像素写入电流） 及时有效减轻负荷。 扫描线形成在与栅电极不同的层上，电容布线与信号线平行。 每个像素通过电介质连接到单独独立的电容器布线。 因此，可以避免由相邻像素的写入电流引起的电容器布线的电位变化，从而获得令人满意的显示图像。

公开(公告)号：US08240823B2

公开(公告)日：2012-08-14

申请号：US12725608

申请日：2010-03-17

申请人： Atsushi Murakami ,  Masaki Kataoka ,  Tetsuzo Kadomatsu ,  Hiroshi Shibata

发明人： Atsushi Murakami ,  Masaki Kataoka ,  Tetsuzo Kadomatsu ,  Hiroshi Shibata

IPC分类号： B41J2/175

CPC分类号： B41J2/1707 ,  B41J2/18

摘要： A liquid droplet ejecting apparatus including: plural liquid droplet ejecting portions; supply-side individual flow paths; discharge-side individual flow paths; a supply-side common flow path; a discharge-side common flow path; first opening/closing mechanisms; second opening/closing mechanisms; a first pressure applying portion; a second pressure applying portion; a first circulating path; a third opening/closing mechanism; a second circulating path including an upstream end portion being connected to the supply-side common flow path further downstream than a connecting portion of a supply-side individual flow path connected to the supply-side common flow path at a furthest upstream side in a liquid circulating direction and a downstream end portion being connected to the discharge-side common flow path, and circulating the liquid between the supply-side common flow path and the discharge-side common flow path; and a fourth opening/closing mechanism, is provided.

摘要翻译： 一种液滴喷射装置，包括：多个液滴喷射部; 供给侧单独流路; 排放侧单独流路; 供给侧公共流路; 排出侧公共流路; 第一次开闭机制; 第二次开闭机制; 第一压力施加部分; 第二压力施加部分; 第一循环路径; 第三个开闭机构; 第二循环路径，其包括上游端部，其与供给侧公共流路连接，与供给侧单独流路的连接部分连接，所述供给侧单独流路与液体中最远的上游侧的供给侧公共流路连接 循环方向和下游端部连接到排出侧公共流路，并且在供给侧公共流路和排出侧公共流路之间循环液体; 和第四打开/关闭机构。

公开(公告)号：US08132902B2

公开(公告)日：2012-03-13

申请号：US12470211

申请日：2009-05-21

申请人： Hiroshi Shibata ,  Masahito Katada ,  Yuko Katada, legal representative ,  Atsushi Murakami

发明人： Hiroshi Shibata ,  Masahito Katada ,  Atsushi Murakami

IPC分类号： B41J2/18

CPC分类号： B41J2/17509 ,  B41J2/17556

摘要： An inkjet recording apparatus includes: a recording head including an introduction section, a discharge section and nozzles; a first liquid chamber connected to the introduction section; a second liquid chamber connected to the discharge section; a first buffer tank which is connected to the first liquid chamber and an interior of which is open to air; a second buffer tank which is connected to the second liquid chamber and an interior of which is open to air; and a pressure control device which sets target pressures of the first liquid chamber and the second liquid chamber in such a manner that a prescribed back pressure is applied to the liquid inside the nozzles of the recording head while a prescribed pressure differential is provided between the first liquid chamber and the second liquid chamber, and controls driving of the first pump and the second pump in accordance with determination results of the pressure determination device in such a manner that the internal pressures of the first liquid chamber and the second liquid chamber remain constant at the target pressures, wherein the first buffer tank and the second buffer tank are connected via a flow channel, and at least one of a filter and a deaeration device is provided in the flow channel.

摘要翻译： 喷墨记录装置包括：记录头，包括导入部，排出部和喷嘴; 与引入部连接的第一液体室; 与排出部连接的第二液体室; 第一缓冲罐，其连接到第一液体室并且其内部对空气敞开; 第二缓冲罐，其连接到第二液体室并且其内部对空气敞开; 以及压力控制装置，其以规定的背压施加到记录头的喷嘴内的液体的方式设定第一液体室和第二液体室的目标压力，同时在第一 液体室和第二液体室，并且根据压力确定装置的确定结果控制第一泵和第二泵的驱动，使得第一液体室和第二液体室的内部压力保持恒定 所述目标压力，其中所述第一缓冲罐和所述第二缓冲罐经由流路连接，并且所述流路中设置有过滤器和脱气装置中的至少一个。

公开(公告)号：US08042898B2

公开(公告)日：2011-10-25

申请号：US12414271

申请日：2009-03-30

申请人： Hiroshi Shibata

发明人： Hiroshi Shibata

IPC分类号： B41J29/38

CPC分类号： B41J2/17556 ,  B41J2/14233 ,  B41J2/175 ,  B41J2/17596 ,  B41J2/2114 ,  B41J2202/12

摘要： The inkjet recording apparatus includes: an inkjet recording head which includes a nozzle through which liquid is ejected; a pressure regulating unit which includes a liquid chamber that communicates with the nozzle and a gas chamber that is partitioned from the liquid chamber by a flexible film; and a liquid chamber pressure controlling device which controls a pressure of the liquid chamber to a predetermined negative pressure when carrying out back pressure control in which back pressure is applied to the liquid inside the nozzle, wherein: the flexible film causes change in the pressure of the liquid chamber when the liquid is supplied for at least a predetermined supply amount to the liquid chamber in a state where the gas chamber is open to air; and the liquid chamber pressure controlling device carries out the back pressure control after controlling the pressure of the liquid chamber to a predetermined value of positive pressure by supplying the liquid of at least the predetermined supply amount to the liquid chamber.

摘要翻译： 喷墨记录装置包括：喷墨记录头，其包括喷射液体的喷嘴; 压力调节单元，包括与喷嘴连通的液体室和通过柔性膜与液体室分隔开的气体室; 以及液体室压力控制装置，其在进行向喷嘴内部的液体施加背压的背压控制时将液体室的压力控制在规定的负压，其中：柔性膜引起压力的变化 在气体室对空气开放的状态下向液体供给液体至少规定的供给量的液体室; 并且液体室压力控制装置通过将至少预定的供给量的液体供应到液体室，在将液体室的压力控制到预定的正压值之后进行背压控制。

公开(公告)号：US07846974B2

公开(公告)日：2010-12-07

申请号：US11923064

申请日：2007-10-24

申请人： Yuzuru Kubohara ,  Hiroshi Shibata

发明人： Yuzuru Kubohara ,  Hiroshi Shibata

IPC分类号： A61K31/05 ,  A61K31/045

CPC分类号： A61K31/12 ,  Y10S514/866 ,  Y10S514/909

摘要： The compound represented by the general formula (I) is administered to a subject suffering from diabetes or obesity. In the formula (I), R1 and R2 independently represent an aliphatic hydrocarbon group having 1 to 10 carbon atoms or phenyl group, and arbitrary hydrogen atoms on the aliphatic hydrocarbon group and the phenyl group may be replaced by halogen, X1 represents halogen, and X2 represents hydrogen or halogen.

摘要翻译： 将由通式（I）表示的化合物给予患有糖尿病或肥胖症的受试者。 式（I）中，R 1和R 2独立地表示碳原子数1〜10的脂肪族烃基或苯基，脂肪族烃基和苯基的任意的氢原子可被卤素取代，X 1表示卤素， X2表示氢或卤素。

公开(公告)号：US07557412B2

公开(公告)日：2009-07-07

申请号：US11788322

申请日：2007-04-18

申请人： Kenji Kasahara ,  Shinji Maekawa ,  Hiroshi Shibata ,  Hidekazu Miyairi

发明人： Kenji Kasahara ,  Shinji Maekawa ,  Hiroshi Shibata ,  Hidekazu Miyairi

IPC分类号： H01L21/84

CPC分类号： H01L27/12 ,  H01L27/1277 ,  H01L29/04 ,  H01L29/66757 ,  H01L29/66765 ,  H01L29/78621 ,  H01L29/78645 ,  H01L29/78675 ,  H01L29/78678

摘要： The sizes of crystal masses are made to be a uniform in a crystalline silicon film obtained by a thermal crystallization method in which a metal element is used. An amorphous silicon film to be crystallized is doped with a metal element that accelerates crystallization, and then irradiated with laser light (with an energy which is not large enough to melt the film and which is large enough to allow the metal element to diffuse in the solid silicon film) from the back side of a light-transmissive substrate. Thereafter, heat treatment is performed to obtain a crystalline silicon film. Thus crystal masses in the crystalline silicon film can have a uniform size and the problem of fluctuation between TFTs can be solved.

公开(公告)号：US07538350B2

公开(公告)日：2009-05-26

申请号：US11698864

申请日：2007-01-29

申请人： Atsuo Isobe ,  Koji Dairiki ,  Hiroshi Shibata ,  Chiho Kokubo ,  Tatsuya Arao ,  Masahiko Hayakawa ,  Hidekazu Miyairi ,  Akihisa Shimomura ,  Koichiro Tanaka ,  Shunpei Yamazaki ,  Mai Akiba

发明人： Atsuo Isobe ,  Koji Dairiki ,  Hiroshi Shibata ,  Chiho Kokubo ,  Tatsuya Arao ,  Masahiko Hayakawa ,  Hidekazu Miyairi ,  Akihisa Shimomura ,  Koichiro Tanaka ,  Shunpei Yamazaki ,  Mai Akiba

IPC分类号： H01L29/786

CPC分类号： H01L21/02683 ,  H01L21/2022 ,  H01L27/1281 ,  H01L27/1296 ,  H01L29/66757 ,  H01L29/78603 ,  H01L29/78675 ,  H01L29/78696

摘要： It is a problem to provide a semiconductor device production system using a laser crystallization method capable of preventing grain boundaries from forming in a TFT channel region and further preventing conspicuous lowering in TFT mobility due to grain boundaries, on-current decrease or off-current increase. An insulation film is formed on a substrate, and a semiconductor film is formed on the insulation film. Due to this, preferentially formed is a region in the semiconductor film to be concentratedly applied by stress during crystallization with laser light. Specifically, a stripe-formed or rectangular concavo-convex is formed on the semiconductor film. Continuous-oscillation laser light is irradiated along the striped concavo-convex or along a direction of a longer or shorter axis of rectangle.

摘要翻译： 提供一种使用能够防止在TFT沟道区域中形成晶界的激光晶体化方法的半导体器件制造系统的问题，并且进一步防止由于晶界引起的TFT迁移率的明显降低，导通电流降低或截止电流增加 。 在基板上形成绝缘膜，在绝缘膜上形成半导体膜。 由此，优选形成半导体膜中通过激光在结晶期间通过应力集中施加的区域。 具体地，在半导体膜上形成条状或矩形凹凸。 连续振荡激光沿着条纹凹凸或长轴或短轴方向照射。

公开(公告)号：US07476577B2

公开(公告)日：2009-01-13

申请号：US11582471

申请日：2006-10-17

申请人： Shunpei Yamazaki ,  Taketomi Asami ,  Toru Takayama ,  Ritsuko Kawasaki ,  Hiroki Adachi ,  Naoya Sakamoto ,  Masahiko Hayakawa ,  Hiroshi Shibata ,  Yasuyuki Arai

发明人： Shunpei Yamazaki ,  Taketomi Asami ,  Toru Takayama ,  Ritsuko Kawasaki ,  Hiroki Adachi ,  Naoya Sakamoto ,  Masahiko Hayakawa ,  Hiroshi Shibata ,  Yasuyuki Arai

IPC分类号： H01L21/66 ,  H01L21/00 ,  H01L21/20

CPC分类号： H01L29/7842 ,  H01L27/12 ,  H01L27/1248 ,  H01L27/1277 ,  H01L29/66757 ,  H01L29/66765 ,  H01L29/78603 ,  H01L29/78621 ,  H01L29/78627 ,  H01L29/78636 ,  H01L29/78645 ,  H01L2029/7863

摘要： In a semiconductor device including a laminate of a first insulating layer, a crystalline semiconductor layer, and a second insulating layer, characteristics of the device are improved by determining its structure in view of stress balance. In the semiconductor device including an active layer of the crystalline semiconductor layer having tensile stress on a substrate, tensile stress is given to the first insulating layer formed to be in close contact with a surface of the semiconductor layer at a substrate side, and compressive stress is given to the second insulating layer formed to be in close contact with a surface of the semiconductor layer at a side opposite to the substrate side.