公开(公告)号：US20200368691A1

公开(公告)日：2020-11-26

申请号：US16991158

申请日：2020-08-12

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Satomi TAKAHASHI ,  Tadashi OMATSU ,  Tetsuya SHIMIZU

IPC: B01D61/58 ,  B01D71/26 ,  B01D69/02 ,  B01D65/02 ,  B01D71/56 ,  B01D71/28 ,  B01D71/68 ,  B01D71/32 ,  B01D3/14 ,  H01L21/67

Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.

公开(公告)号：US20200171434A1

公开(公告)日：2020-06-04

申请号：US16784976

申请日：2020-02-07

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Masahiro YOSHIDOME ,  Yukihisa KAWADA

IPC: B01D61/02 ,  B01D65/10 ,  B01D71/32

Abstract: An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by filtering a substance to be purified containing an organic solvent by using two or more kinds of filters having different pore sizes, in which a supply pressure P1 of the substance to be purified supplied to a filter Fmax having a maximum pore size X1 among the two or more kinds of filters and a supply pressure P2 of the substance to be purified supplied to a filter Fmin having a minimum pore size X2 among the two or more kinds of filters satisfy P1>P2.

公开(公告)号：US20200147528A1

公开(公告)日：2020-05-14

申请号：US16745493

申请日：2020-01-17

Applicant: FUJIFILM Corporation

Inventor： Tetsuya SHIMIZU ,  Tetsuya KAMIMURA

IPC: B01D29/58 ,  B01D29/00 ,  B01D29/23 ,  B01D39/16 ,  B01D63/06 ,  B01D61/02 ,  B01D69/02 ,  B01D69/04

Abstract: An object of the present invention is to provide a filtering device which makes it possible to obtain a chemical liquid having excellent performance and enables filter media to have sufficiently long pot life. Another object of the present invention is to provide a purification device, a chemical liquid manufacturing device, a filtered substance to be purified, a chemical liquid, and an actinic ray-sensitive or radiation-sensitive resin composition. A filtering device according to an embodiment of the present invention has a first filter unit including a first filter, which satisfies at least one condition selected from the group consisting of following conditions 1 to 3, and a housing accommodating the first filter and a second filter unit including a second filter different from the first filter and a housing accommodating the second filter, in which the first filter unit and the second filter unit are independently disposed in a pipe line through which a substance to be purified is supplied.Condition 1: the filter has a filter medium including two or more layers containing materials different from each other.Condition 2: the filter has a filter medium including two or more layers having different pore structures.Condition 3: the filter has a filter medium including one layer in which different materials are mixed together.

公开(公告)号：US20200096864A1

公开(公告)日：2020-03-26

申请号：US16687914

申请日：2019-11-19

Applicant: FUJIFILM Corporation

Inventor： Hirotaka TAKISHITA ,  Tetsuya KAMIMURA ,  Takuya TSURUTA ,  Kyouhei ARAYAMA ,  Kazuto SHIMADA ,  Masahiro MORI

IPC: G03F7/00 ,  H04N5/33 ,  G03F7/26 ,  G03F7/20 ,  G03F7/16 ,  G03F7/038 ,  G03F7/033 ,  G03F7/032 ,  G03F7/031 ,  G03F7/004 ,  G02B5/20 ,  C09B67/46 ,  G02B5/22 ,  C09B57/00 ,  G03F7/105 ,  C09B23/01 ,  H01L27/146 ,  C09B23/04 ,  G03F7/027

Abstract: A film in which a light transmittance when light is transmitted from one surface of the film to the other surface has a maximum value of 10% or lower in a wavelength range of 400 to 830 nm and has a minimum value of 70% or higher in a wavelength range of 1000 to 1300 nm.

公开(公告)号：US20200087501A1

公开(公告)日：2020-03-19

申请号：US16690353

申请日：2019-11-21

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA

IPC: C08L27/14 ,  C08L27/16 ,  C08L27/18 ,  C08K5/00 ,  B65D90/02 ,  B65D85/00

Abstract: A member contains a fluorine-containing polymer and a fluorine-containing surfactant, in which provided that a mass-based content of the fluorine-containing surfactant in at least a surface of a portion of the member is M1, and a mass-based content of the surfactant in a position 10 nm below the surface in a thickness direction of the member is M2, M1/M2 is 0.50 to 0.90, and an atom number ratio X1 of the number of fluorine atoms contained in the surface to the number of carbon atoms contained in the surface is 0.50 to 3.0.

公开(公告)号：US20190339619A1

公开(公告)日：2019-11-07

申请号：US16510986

申请日：2019-07-15

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA

IPC: G03F7/32 ,  B01D29/62 ,  B01D15/36 ,  B01D36/00 ,  G03F7/004 ,  H01L21/027

Abstract: An object of the present invention is to provide a chemical liquid manufacturing method which makes it possible to manufacture a chemical liquid having an excellent defect inhibition performance. The chemical liquid manufacturing method of an embodiment of the present invention is a method for manufacturing a chemical liquid containing an organic solvent by using a manufacturing device. The chemical liquid manufacturing method has a setup step including a step A of washing the manufacturing device by using a washing solution and a step B of extracting the washing solution from the manufacturing device and a preparation step of preparing the chemical liquid in the manufacturing device, in which in the setup step, the step A and the step B are repeatedly performed until the washing solution extracted from the manufacturing device satisfies the following condition 1 after the step A and the step B.Condition 1: in a case where a substrate is coated with the washing solution, a change in density of particles, which have a particle diameter equal to or smaller than 20 nm, on the substrate before and after the coating with the washing solution is equal to or smaller than 0.5 particles/cm2.

公开(公告)号：US20190324373A1

公开(公告)日：2019-10-24

申请号：US16502032

申请日：2019-07-03

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA

IPC: G03F7/20 ,  G01N21/31 ,  G01N24/08 ,  G01N30/72 ,  G01N30/06 ,  G01N33/2028 ,  G01N33/44

Abstract: An object of the present invention is to provide a quality inspection method for a chemical liquid that makes it possible to simply evaluate defect performance.The quality inspection method according to an embodiment of the present invention is a quality inspection method for a chemical liquid used for manufacturing a semiconductor substrate, including a step W of preparing a first container and washing at least a portion of a liquid contact portion by using a portion of the chemical liquid, a step A of performing concentration of a portion of the chemical liquid by using the washed first container so as to obtain c liquid, a step B of performing measurement of a content of a specific component in c liquid, and a step C of comparing the content of the specific component with a preset standard value. The step W, the step A, the step B, and the step C are performed in this order, at least the step W and the step A are performed in a clean room having cleanliness equal to or higher than class 4 specified in ISO14644-1:2015, the concentration is performed in at least one kind of inert gas selected from the group consisting of an Ar gas, a He gas, and a N2 gas or under reduced pressure, and the measurement is performed by a predetermined measurement method.

公开(公告)号：US20190258168A1

公开(公告)日：2019-08-22

申请号：US16396786

申请日：2019-04-29

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Michihiro SHIRAKAWA ,  Tadashi OOMATSU

IPC: G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  C08F220/16 ,  C08F212/14 ,  C08F220/28 ,  C08F220/36 ,  G03F7/039 ,  G03F7/038 ,  G03F7/30

Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can accomplish suppression of generation of defects on a pattern and reduction in bridge defects of the pattern at the same time. The pattern forming method of an embodiment of the present invention is a pattern forming method by forming a resist film on a substrate using a resist composition including at least a resin whose polarity increases by the action of an acid, a photoacid generator, and a solvent, exposing the resist film, and then treating the exposed resist film with a treatment liquid to form a pattern, in which the treatment liquid includes two or more organic solvents, a boiling point of at least one organic solvent of the two or more organic solvents is 120° C. to 155° C., a content of the organic solvent having a boiling point of 120° C. to 155° C. is 45% by mass or more with respect to the total mass of the treatment liquid, and a difference between the boiling point of the organic solvent having the highest boiling point and the boiling point of the organic solvent having the lowest boiling point among the two or more organic solvents is less than 49° C.

公开(公告)号：US20190219924A1

公开(公告)日：2019-07-18

申请号：US16366621

申请日：2019-03-27

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA

IPC: G03F7/32 ,  G03F7/20 ,  B01D61/18 ,  B01D61/20 ,  B01D71/64

CPC classification number: G03F7/325 ,  B01D61/18 ,  B01D61/20 ,  B01D71/64 ,  B01D2311/22 ,  B01D2313/50 ,  B01D2325/16 ,  B01D2325/30 ,  B01D2325/42 ,  C11C3/00 ,  C11D7/04 ,  C11D7/50 ,  C11D17/08 ,  G03F7/16 ,  G03F7/7095 ,  G03F7/70991 ,  H01L21/304

Abstract: An object of the present invention is to provide a chemical liquid which has excellent defect inhibition performance and hardly breaks a transfer pipe line that a device for manufacturing the chemical liquid includes at the time of manufacturing the chemical liquid. Another object of the present invention is to provide a chemical liquid storage body, a manufacturing method of a chemical liquid, and a manufacturing method of a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent and an ion of at least one kind of atom selected from the group consisting of an Fe atom, a Cr atom, a Ni atom, and a Pb atom, in which in a case where the chemical liquid contains one kind of the ion, a content of the metal ion is 0.1 to 100 mass ppt, in a case where the chemical liquid contains two or more kinds of the ions, a content of each of the metal ions is 0.1 to 100 mass ppt, and a charge potential is equal to or lower than 100 mV.

公开(公告)号：US20190219923A1

公开(公告)日：2019-07-18

申请号：US16365016

申请日：2019-03-26

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Satomi TAKAHASHI

IPC: G03F7/32 ,  C08F14/26 ,  C08F10/06 ,  B65D88/08

CPC classification number: G03F7/325 ,  B65D88/06 ,  B65D88/08 ,  C08F10/06 ,  C08F14/26 ,  C11D7/50 ,  C11D17/08 ,  G03F7/16 ,  G03F7/32 ,  H01L21/027 ,  H01L21/0274

Abstract: An object of the present invention is to provide a chemical liquid having excellent developability and excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid storage body, a chemical liquid filling method, and a chemical liquid storage method. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent, a metal impurity, and an organic impurity, in which the metal impurity contains metal atoms, a total content of the metal atoms in the chemical liquid with respect to a total mass of the chemical liquid is equal to or smaller than 50 mass ppt, a total content of the organic impurity in the chemical liquid with respect to the total mass of the chemical liquid is 0.1 to 10,000 mass ppm, the organic impurity contains an alcohol impurity, and a mass ratio of a content of the alcohol impurity to the total content of the organic impurity is 0.0001 to 0.5.