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    Lithographic apparatus and device manufacturing method
    101.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US08848165B2

    公开(公告)日：2014-09-30

    申请号：US13369982

    申请日：2012-02-09

    申请人： Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk ,  Martinus Hendrikus Antonius Leenders

    发明人： Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk ,  Martinus Hendrikus Antonius Leenders

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341

    摘要： An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

    摘要翻译： 公开了一种浸没式光刻设备，其中液体被供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔，其中具有通孔以减小板的存在的阻尼效果，并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    110.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20110241259A1

    公开(公告)日：2011-10-06

    申请号：US13160042

    申请日：2011-06-14

    申请人： Joost Jeroen OTTENS ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

    发明人： Joost Jeroen OTTENS ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

    IPC分类号： B29C35/08 ,  B29C51/46 ,  B29C51/42

    CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

    摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

    摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。