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公开(公告)号：US06567168B2
公开(公告)日：2003-05-20
申请号：US09832218
申请日：2001-04-11
申请人： Yasuhiko Nara , Takashi Hiroi
发明人： Yasuhiko Nara , Takashi Hiroi
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
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公开(公告)号：US06504609B2
公开(公告)日：2003-01-07
申请号：US10115079
申请日：2002-04-04
申请人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译： 设置电路图案的检查方法，装置和系统，其中当通过使用通过照射白光，激光束或带电粒子束形成的图像检查精细电路图案所需的各种条件被设置时，其 可以提高运行效率。 显示检查对象基板的检查对象区域，并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示，从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示，输入或指示检查条件内容的画面被整合，这些内容与图像平面重叠，层叠显示，并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时，切换画面并显示与点击的项目名称对应的内容。
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公开(公告)号：US06476913B1
公开(公告)日：2002-11-05
申请号：US09450856
申请日：1999-11-29
申请人： Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Maki Ito
发明人： Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Maki Ito
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
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104.发明授权公开(公告)号：US06335532B1
公开(公告)日：2002-01-01
申请号：US09258461
申请日：1999-02-26
IPC分类号： H01J37244
CPC分类号： H01J37/21 , G01N2001/2893 , H01J2237/2817 , H01J2237/304
摘要： A method and apparatus to enable observation of an electron beam image of a specimen surface with an electron beam being always in focus in a convergent charged particle beam apparatus. Using an optical height detection system which does not cause interference with the electron beam, a specimen surface height in the vicinity of an electron beam irradiating point on the specimen surface is detected, and the specimen surface height is adjusted while the electron beam image of the specimen surface is being observed. The optical height detection system is calibrated using a calibration specimen having known step pattern features, and a surface height of an object under inspection is calculated accordingly. In the optical height detection system, a light beam is projected onto a surface of the object under inspection at an angle of at least 60 degrees with respect to a normal line on the surface of the object and a reflected light beam therefrom is detected for attaining surface height data of the object under inspection.
摘要翻译： 一种能够以会聚的带电粒子束装置中始终聚焦的电子束来观察样品表面的电子束图像的方法和装置。 使用不会对电子束造成干扰的光学高度检测系统，检测在试样表面上的电子束照射点附近的试样表面高度，并且在 正在观察样品表面。 使用具有已知步骤图案特征的校准样本校准光学高度检测系统，并且相应地计算检查对象的表面高度。 在光学高度检测系统中，将光束相对于物体表面上的法线以至少60度的角度投影到被检查物体的表面上，并且检测其中的反射光束以获得 检查对象的表面高度数据。
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105.发明授权Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权电子束曝光或系统检查或测量装置及其方法和高度检测装置
公开(公告)号：US6107637A
公开(公告)日：2000-08-22
申请号：US132220
申请日：1998-08-11
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electronic beam type exposure or inspection or measurement apparatus and method including an electron optical system, an electron beam image detection optical system for detecting a secondary electron beam image generated from an inspected object by electron beams irradiated from the electron optical system, and an optical height detection apparatus for optically detecting a height of a surface in an area on the inspected object. A focus controller is provided for calculating a focus control current or a focus control voltage based on a correction parameter between a height of a surface on the inspected object and a focus control current or a focus control voltage and supplying the same to an objective lens of the electron optical system in such a manner that an electron beam is focused on the inspected object in a properly- focused state. A deflection controller is provided for correcting an image distortion containing a magnification error of an electron beam image caused on the basis of the focus control, and an image processor is provided for inspecting or measuring a pattern formed on the inspected object based on a secondary electron beam image.
摘要翻译： 一种电子束式曝光或检查或测量装置和方法，包括电子光学系统，用于通过从电子光学系统照射的电子束检测从检查对象产生的二次电子束图像的电子束图像检测光学系统和光学 高度检测装置，用于光学检测被检查物体上的区域中的表面的高度。 提供了一种聚焦控制器，用于基于检测对象上的表面的高度与聚焦控制电流或聚焦控制电压之间的校正参数来计算聚焦控制电流或聚焦控制电压，并将其提供给 电子光学系统以使得电子束以适当聚焦的状态聚焦在被检查物体上。 提供一种偏转控制器，用于校正基于焦点控制引起的包含电子束图像的放大误差的图像失真，并且提供图像处理器，用于基于二次电子来检查或测量形成在被检查物体上的图案 光束图像。
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公开(公告)号：US5649022A
公开(公告)日：1997-07-15
申请号：US888494
申请日：1992-05-27
申请人： Shunji Maeda , Hitoshi Kubota , Hiroshi Makihira , Takashi Hiroi
发明人： Shunji Maeda , Hitoshi Kubota , Hiroshi Makihira , Takashi Hiroi
CPC分类号： G06T7/0044 , G06T7/001 , G06T2207/30148
摘要： A pattern checking method wherein an image of a certain position of one pattern is detected; the detected image is positioned with respect to an image of a position corresponding to the certain position, in a reference pattern image; and the positioned images are compared with each other, whereby a discrepant place among these positioned images is judged as a defect the positioning operations of the images of the detected patterns are controlled based upon either pattern information such as density of the images of the detected patterns, or information obtained from the positioning operations for images of other positions in the patterns. An image sensor unit for detecting images of patterns is constructed which has such a structure that a plurality of one-dimensional image sensors functioning as a pattern detector are arranged in a two-dimensional form, and an output of a certain one-dimensional image sensor for imaging a certain position of one pattern is delayed for a predetermined time period, and also both of an output of an one-dimensional image sensor adjoining the first-mentioned one-dimensional image sensor, which images the same position of the same pattern, and the delayed output of the certain one-dimensional image sensor are sequentially added to derive a summation output. The image sensor unit is inclined at a predetermined angle with respect to a plane perpendicular to the reflection light from the patterns, and the reflection light from the patterns is focused via a confocal focusing optical system onto this image sensor unit.
摘要翻译： 一种图案检查方法，其中检测到一个图案的某个位置的图像; 检测图像相对于与特定位置对应的位置的图像在参考图案图像中定位; 并且定位的图像彼此进行比较，由此将这些定位的图像中的不一致的位置判断为检测图案的图像的定位操作的缺陷，基于诸如检测图案的图像的密度的图案信息 或者从图案中的其他位置的图像的定位操作获得的信息。 用于检测图案的图像的图像传感器单元被构造成具有以二维形式配置作为图案检测器的多个一维图像传感器的结构，以及某一个一维图像传感器的输出 对于一个图案的某个位置的成像被延迟预定的时间段，并且与相同图案的相同位置成像的第一个提到的一维图像传感器邻接的一维图像传感器的输出， 并且依次添加特定一维图像传感器的延迟输出以导出求和输出。 图像传感器单元相对于与图案的反射光垂直的平面以预定角度倾斜，并且来自图案的反射光经由共聚焦聚焦光学系统聚焦到该图像传感器单元上。
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公开(公告)号：US5430548A
公开(公告)日：1995-07-04
申请号：US12468
申请日：1993-02-02
IPC分类号： G01B11/24 , G01B11/245 , G01N21/88 , G01N21/956 , G03F1/84 , G06K9/64 , G06T1/00 , H01L21/027 , H01L21/30 , G01N21/01 , G01N21/15
CPC分类号： G01N21/95607
摘要： The inventive pattern detection method and apparatus produce, from an optical image of a pattern in attention and an optical image of a pattern which should be identical to the pattern in attention, an optical image by merging the images, with a relative phase shift being imposed, and pattern information is detected or observed in the merged optical image or a signal produced from the optical image through the conversion with an opto-electric transducer means.
摘要翻译： 本发明的图案检测方法和装置从注意图案的光学图像和应注意的图案的图案的光学图像产生通过合并图像的光学图像，并施加相对相移 ，并且通过使用光电换能器装置的转换，在合并的光学图像中检测或观察图案信息或从光学图像产生的信号。
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公开(公告)号：US5153444A
公开(公告)日：1992-10-06
申请号：US641001
申请日：1991-01-14
申请人： Shunji Maeda , Takashi Hiroi , Hitoshi Kubota , Hiroshi Makihira , Fumiaki Endo
发明人： Shunji Maeda , Takashi Hiroi , Hitoshi Kubota , Hiroshi Makihira , Fumiaki Endo
IPC分类号： G01N21/956 , G06T7/00
CPC分类号： G06T7/001 , G01N21/95607 , G01N2021/8896 , G01N2021/95615 , G06T2207/30148
摘要： A method and apparatus for detecting a defect in a circuit pattern by detecting a gray image signal from each of a plurality of circuit patterns as objects of inspection, which circuit patterns have been fabricated so as to be identical with one another, and detecting a defect as a difference of edge position between two circuit patterns by comparing the detected gray image signal of one circuit pattern with the detected gray image signal of another circuit pattern.
摘要翻译： 通过检测作为检查对象的多个电路图案中的每一个的灰度图像信号来检测电路图案中的缺陷的方法和装置，其中已经制造出彼此相同的电路图案，并且检测缺陷 作为两个电路图案之间的边缘位置的差异，通过将检测到的一个电路图案的灰度图像信号与另一个电路图案的检测到的灰度图像信号进行比较。
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