COMMUNICATION MEDIUM FOR DIABETES MANAGEMENT
    103.
    发明申请
    COMMUNICATION MEDIUM FOR DIABETES MANAGEMENT 审中-公开
    糖尿病管理通讯媒体

    公开(公告)号:US20080235053A1

    公开(公告)日:2008-09-25

    申请号:US11688768

    申请日:2007-03-20

    IPC分类号: A61B5/00 G01N33/48

    摘要: A diabetes management system or process is provided herein that may be used to analyze and recognize patterns for a large amount of blood glucose concentration measurements and other physiological parameters related to the glycemia of a patient. In particular, a communication medium is provided. The communication medium includes first, second, third, fourth and fifth display areas. The second through fifth display areas can be disposed in the first display area. The second display area has identification information of a patient. The third display area has a plurality of textual messages indicative of glycemic status of the patient. The fourth display area includes a chart indicative of a variability of the glucose concentration of the patient over a predetermined time period. Other messages can also be provided to ensure compliance of any prescribed diabetes regiments or to guide the patient in managing the patient's diabetes.

    摘要翻译: 本文提供的糖尿病管理系统或过程可用于分析和识别大量血糖浓度测量和与患者血糖相关的其它生理参数的模式。 特别地,提供通信介质。 通信介质包括第一,第二,第三,第四和第五显示区域。 第二至第五显示区域可以设置在第一显示区域中。 第二显示区域具有患者的识别信息。 第三显示区域具有指示患者血糖状态的多个文本消息。 第四显示区域包括指示在预定时间段内患者的葡萄糖浓度的变异性的图表。 还可以提供其他信息以确保任何规定的糖尿病团队的遵守或指导患者管理患者的糖尿病。

    SYSTEMS AND METHODS FOR PATTERN RECOGNITION IN DIABETES MANAGEMENT
    104.
    发明申请
    SYSTEMS AND METHODS FOR PATTERN RECOGNITION IN DIABETES MANAGEMENT 有权
    糖尿病管理模式识别系统与方法

    公开(公告)号:US20080234992A1

    公开(公告)日:2008-09-25

    申请号:US11688639

    申请日:2007-03-20

    IPC分类号: G06F17/11 G06G7/48

    摘要: A diabetes management system or process is provided herein that may be used to analyze and recognize patterns for a large number of blood glucose concentration measurements and other physiological parameters related to the glycemia of a patient. In particular, a method of monitoring glycemia in a patient may include storing a patient's data on a suitable device, such as, for example, a blood glucose meter. The patient's data may include blood glucose concentration measurements. The diabetes management system or process may be installed on, but is not limited to, a personal computer, an insulin pen, an insulin pump, or a glucose meter. The diabetes management system or process may identify a plurality of pattern types from the data including a testing/dosing pattern, a hypoglycemic pattern, a hyperglycemic pattern, a blood glucose variability pattern, and a comparative pattern. After identifying a particular pattern with the data management system or process, a warning message may be displayed on a screen of a personal computer or a glucose meter. Other messages can also be provided to ensure compliance of any prescribed diabetes regiments or to guide the patient in managing the patient's diabetes.

    摘要翻译: 本文提供了可用于分析和识别大量血糖浓度测量和与患者血糖相关的其它生理参数的模式的糖尿病管理系统或过程。 特别地,监测患者血糖的方法可包括将患者的数据存储在合适的装置上,例如血糖仪。 患者的数据可能包括血糖浓度测量。 糖尿病管理系统或过程可以安装在个人计算机,胰岛素笔,胰岛素泵或葡萄糖计量仪上,但不限于此。 糖尿病管理系统或过程可以从包括测试/给药模式,低血糖模式,高血糖模式,血糖变异性模式和比较模式的数据中识别多种模式类型。 在使用数据管理系统或处理识别特定模式之后,可以在个人计算机或葡萄糖计的屏幕上显示警告消息。 还可以提供其他信息以确保任何规定的糖尿病团队的遵守或指导患者管理患者的糖尿病。

    SPACER-LESS TRANSISTOR INTEGRATION SCHEME FOR HIGH-K GATE DIELECTRICS AND SMALL GATE-TO-GATE SPACES APPLICABLE TO SI, SIGE AND STRAINED SILICON SCHEMES
    105.
    发明申请
    SPACER-LESS TRANSISTOR INTEGRATION SCHEME FOR HIGH-K GATE DIELECTRICS AND SMALL GATE-TO-GATE SPACES APPLICABLE TO SI, SIGE AND STRAINED SILICON SCHEMES 有权
    适用于SI,信号和应变硅计划的高K栅介质和小门到门空间的间隔不足的晶体管集成方案

    公开(公告)号:US20080102583A1

    公开(公告)日:2008-05-01

    申请号:US11960554

    申请日:2007-12-19

    IPC分类号: H01L21/336

    摘要: A transistor integration process provides a damascene method for the formation of gate electrodes and gate dielectric layers. An interlayer-dielectric film is deposited prior to the gate electrode formation to avoid the demanding gap fill requirements presented by adjacent gates. A trench is formed in the interlayer-dielectric film followed by the deposition of the gate material in the trench. This process avoids the potential for damage to high-k gate dielectric layers caused by high thermal cycles and also reduces or eliminates the problematic formation of voids in the dielectric layers filling the gaps between adjacent gates.

    摘要翻译: 晶体管积分过程提供了用于形成栅极电极和栅极电介质层的镶嵌方法。 在栅电极形成之前沉积层间绝缘膜,以避免由相邻栅极呈现的苛刻的间隙填充要求。 在层间电介质膜中形成沟槽,随后在沟槽中沉积栅极材料。 该过程避免了由高热循环引起的对高k栅极电介质层的损坏的可能性,并且还减少或消除填充相邻栅极之间的间隙的电介质层中空隙的有问题的形成。

    Method for determining concentrations of additives in acid copper electrochemical deposition baths
    108.
    发明授权
    Method for determining concentrations of additives in acid copper electrochemical deposition baths 有权
    确定酸性铜电化学沉积池中添加剂浓度的方法

    公开(公告)号:US06709568B2

    公开(公告)日:2004-03-23

    申请号:US10064125

    申请日:2002-06-13

    IPC分类号: G01N2742

    CPC分类号: G01N27/4161 G01N27/42

    摘要: The present invention relates to a method for determining concentration of brightener and leveler contained in an aqueous acid metal electroplating solution, by firstly determining the concentration of the brightener at a first set of measurement conditions, and secondly determining the concentration of the leveler at a second set of measurement conditions, provided that the first set of measurement conditions differ from the second set of measurement conditions on the rotation speed of a rotating disc electrode used for measuring plating potential of said aqueous acid metal electroplating solution, and optionally, the electroplating duration at which the plating potential of said aqueous acid metal electroplating solution is measured, provided that the first rotation speed is lower than the second rotation speed, and that the first electroplating duration is shorter than the second electroplating duration.

    摘要翻译: 本发明涉及一种通过首先在第一组测量条件下确定增白剂的浓度来确定含酸的酸性金属电镀溶液中所含的增白剂和矫正剂的浓度的方法,其次在第二次测定矫光器的浓​​度 条件是第一组测量条件与第二组测量条件不同,所述第二组测量条件对于用于测量所述酸性金属电镀水溶液的电镀电位的旋转盘电极的旋转速度,以及可选地,电镀持续时间在 测量所述含水酸性金属电镀溶液的电镀电位,条件是所述第一转速低于所述第二转速,并且所述第一电镀持续时间短于所述第二电镀持续时间。