公开(公告)号：US08663780B2

公开(公告)日：2014-03-04

申请号：US13342750

申请日：2012-01-03

Applicant: Oliver Harnack ,  Jurina Wessels ,  Akio Yasuda ,  James Clarke ,  Terry Reid

Inventor： Oliver Harnack ,  Jurina Wessels ,  Akio Yasuda ,  James Clarke ,  Terry Reid

IPC: B32B3/24

CPC classification number: B01D69/10 ,  B01D69/105 ,  B01D69/144 ,  B81B2201/058 ,  B81B2203/0127 ,  B81C1/00087 ,  B81C2201/112 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/249961

Abstract: A method of fabricating a membrane having a tampered pore, a polymeric membrane having a tapered pore, and uses of such polymeric membrane are disclosed. The membrane includes apertures of increasing diameter which are aligned with each other to form the tapered pore.

Abstract translation: 公开了一种制造具有篡改孔的膜的方法，具有锥形孔的聚合物膜和这种聚合物膜的用途。 膜包括直径增加的孔，其彼此对准以形成锥形孔。

公开(公告)号：US08300299B2

公开(公告)日：2012-10-30

申请号：US13098292

申请日：2011-04-29

Applicant: Ming-Hau Tung ,  Lior Kogut

Inventor： Ming-Hau Tung ,  Lior Kogut

IPC: G02B26/00 ,  H01L21/311

CPC classification number: B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

Abstract: Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

Abstract translation: 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。

公开(公告)号：US08270062B2

公开(公告)日：2012-09-18

申请号：US12562093

申请日：2009-09-17

Applicant: Manish Kothari ,  Sauri Gudlavalleti ,  Stephen Zee

Inventor： Manish Kothari ,  Sauri Gudlavalleti ,  Stephen Zee

IPC: G02B26/00

CPC classification number: B81B3/0008 ,  B81B2201/042 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  G02B26/0841

Abstract: In certain embodiments, a device is provided including a substrate and a plurality of supports over the substrate. The device may further include a mechanical layer having a movable portion and a stationary portion. The stationary portion may disposed over the supports. In certain embodiments, the device further includes a reflective surface positioned over the substrate and mechanically coupled to the movable portion. The device of certain embodiments further includes at least one movable stop element displaced from and mechanically coupled to the movable portion. In certain embodiments, the at least a portion of the stop element may be positioned over the stationary portion.

Abstract translation: 在某些实施例中，提供了一种包括衬底和在衬底上的多个支撑体的装置。 该装置还可以包括具有可移动部分和固定部分的机械层。 固定部分可以设置在支撑件上方。 在某些实施例中，所述装置还包括位于所述基板上并且机械地联接到所述可移动部分的反射表面。 某些实施例的装置还包括至少一个可动止动元件，该可移动止动元件从可移动部分移动并机械联接到可动部 在某些实施例中，止动元件的至少一部分可以定位在固定部分上方。

公开(公告)号：US20120161573A1

公开(公告)日：2012-06-28

申请号：US12979160

申请日：2010-12-27

Applicant: Ming Fang

Inventor： Ming Fang

IPC: H02N1/00 ,  B05D5/12

CPC classification number: B81C1/00666 ,  B81B7/0029 ,  B81B2203/0181 ,  B81C1/0019 ,  B81C2201/0169 ,  B81C2201/112

Abstract: A method of manufacturing microstructures, such as MEMS or NEMS devices, including forming a protective layer on a surface of a moveable component of the microstructure. For example, a silicide layer may be formed on one or more surfaces of a poly-silicon mass that is moveable with respect to a substrate of the microstructure. The process may be self-aligning.

Abstract translation: 一种制造微结构的方法，例如MEMS或NEMS器件，包括在微结构的可移动部件的表面上形成保护层。 例如，可以在可相对于微结构的基板移动的多晶硅块的一个或多个表面上形成硅化物层。 该过程可以是自对准的。

公开(公告)号：US07728395B2

公开(公告)日：2010-06-01

申请号：US11596343

申请日：2004-12-20

Applicant: Woo Seok Yang ,  Sung Weon Kang ,  Youn Tae Kim

Inventor： Woo Seok Yang ,  Sung Weon Kang ,  Youn Tae Kim

IPC: H01L29/84

CPC classification number: B81C1/00952 ,  B81C2201/112

Abstract: Provided is a micro-mechanical structure and method for manufacturing the same, including a hydrophilic surface on at least a part of a surface of the micro-mechanical structure, so as to prevent generation of an adhesion phenomenon in the process of removing a sacrificial layer to release the micro-mechanical, wherein the sacrificial layer comes into contact with the surface of the micro-mechanical structure.

Abstract translation: 提供了一种微机械结构及其制造方法，其包括在微机械结构的表面的至少一部分上的亲水表面，以防止在去除牺牲层的过程中产生粘附现象 以释放微机械，其中牺牲层与微机械结构的表面接触。

公开(公告)号：US20100068489A1

公开(公告)日：2010-03-18

申请号：US12150249

申请日：2008-04-24

Applicant: Boris Kobrin ,  Romuald Nowak ,  Jeffrey D. Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Jeffrey D. Chinn

IPC: B32B5/00 ,  B32B9/00 ,  B05D5/12 ,  B28B7/38

CPC classification number: C23C16/403 ,  B81B3/0075 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/112 ,  C23C16/405 ,  C23C16/45525

Abstract: The carbon-doped metal oxide films described provide a low coefficient of friction, typically ranging from about 0.05 to about 0.4. Applied over a silicon substrate, for example, the carbon-doped metal oxide films provide anti-stiction properties, where the measured work of adhesion for a coated MEMS cantilever beam is less than 10 μJ/m2. The films provide unexpectedly low water vapor transmission. In addition, the carbon-doped metal oxide films are excellent when used as a surface release coating for nanoimprint lithography. The carbon content in the carbon-doped metal oxide films ranges from about 5 atomic % to about 20 atomic %.

Abstract translation: 所述的碳掺杂的金属氧化物膜提供低摩擦系数，通常为约0.05至约0.4。 施加在硅衬底上，例如，碳掺杂的金属氧化物膜提供抗静电性质，其中测量的涂覆的MEMS悬臂梁的粘附力小于10μJ/ m 2。 这些膜提供了意想不到的低水蒸汽传输。 此外，当用作纳米压印光刻的表面剥离涂层时，碳掺杂的金属氧化物膜是优异的。 碳掺杂的金属氧化物膜中的碳含量为约5原子％至约20原子％。

公开(公告)号：US20090274870A1

公开(公告)日：2009-11-05

申请号：US12409007

申请日：2009-03-23

Applicant: Oliver HARNACK ,  Jurina WESSELS ,  Akio YASUDA ,  James CLARKE ,  Terry REID

Inventor： Oliver HARNACK ,  Jurina WESSELS ,  Akio YASUDA ,  James CLARKE ,  Terry REID

IPC: B32B3/10 ,  B05D3/00 ,  C23C16/44 ,  C23C14/34 ,  B44C1/22 ,  B32B38/10 ,  C23C14/02

CPC classification number: B01D69/10 ,  B01D69/105 ,  B01D69/144 ,  B81B2201/058 ,  B81B2203/0127 ,  B81C1/00087 ,  B81C2201/112 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/249961

Abstract: The present invention relates to a method of fabricating a membrane having a tapered pore, to a polymeric membrane having a tapered pore and to uses of such polymeric membrane.

Abstract translation: 本发明涉及一种制造具有锥形孔的膜，具有锥形孔的聚合物膜和这种聚合物膜的用途的方法。

公开(公告)号：US07535621B2

公开(公告)日：2009-05-19

申请号：US11646059

申请日：2006-12-27

Applicant: Chih-Wei Chiang

Inventor： Chih-Wei Chiang

IPC: G02B26/00 ,  H01L29/00 ,  H01L21/00

CPC classification number: G02B26/001 ,  B81B2201/047 ,  B81C1/00801 ,  B81C2201/014 ,  B81C2201/112

Abstract: A microelectromechanical systems (MEMS) device utilizing an aluminum fluoride layer as an etch stop is disclosed. In one embodiment, a MEMS device includes a first electrode having a first surface; and a second electrode having a second surface facing the first surface and defining a gap therebetween. The second electrode is movable in the gap between a first position and a second position. At least one of the electrodes includes an aluminum fluoride layer facing the other of the electrodes. During fabrication of the MEMS device, a sacrificial layer is formed between the first and second electrodes and is released to define the gap. The aluminum fluoride layer serves as an etch stop to protect the first or second electrode during the release of the sacrificial layer.

Abstract translation: 公开了一种利用氟化铝层作为蚀刻阻挡层的微机电系统（MEMS）装置。 在一个实施例中，MEMS器件包括具有第一表面的第一电极; 以及第二电极，其具有面向所述第一表面的第二表面并且在其间限定间隙。 第二电极可以在第一位置和第二位置之间的间隙中移动。 至少一个电极包括面对另一个电极的氟化铝层。 在MEMS器件的制造期间，在第一和第二电极之间形成牺牲层并被释放以限定间隙。 氟化铝层用作蚀刻停止件，以在释放牺牲层期间保护第一或第二电极。

公开(公告)号：US20090004388A1

公开(公告)日：2009-01-01

申请号：US11659563

申请日：2005-06-21

Applicant: Franz Larmer ,  Ralf Reichenbach

Inventor： Franz Larmer ,  Ralf Reichenbach

IPC: B05D3/00

CPC classification number: B81C1/0096 ,  B81B3/0005 ,  B81C2201/112 ,  B81C2201/117

Abstract: A method for depositing an anti-adhesion layer onto a surface of micromechanical structures on a substrate. The material or precursor material to be deposited being delivered to the structures in a dissolution and transport medium. A supercritical CO2 fluid is present as the dissolution and transport medium. Deposition of the material or precursor material is brought about by a change in the physical state of the CO2 fluid or by a surface reaction between the surface and the precursor material. The method makes possible subsequent coating of the micromechanical structures in a cavity after encapsulation thereof, the material to be deposited being delivered via access channels or perforation holes.

Abstract translation: 一种在衬底上的微机械结构的表面上沉积抗粘附层的方法。 要沉积的材料或前体材料被输送到溶解和运输介质中的结构。 存在超临界CO2流体作为溶解和运输介质。 材料或前体材料的沉积是通过CO 2流体的物理状态的变化或表面与前体材料之间的表面反应引起的。 该方法使得随后在其封装之后在空腔中涂覆微机械结构，待沉积的材料经由接入通道或穿孔而被输送。

公开(公告)号：US07471439B2

公开(公告)日：2008-12-30

申请号：US11315920

申请日：2005-12-22

Applicant: Dongmin Chen ,  Fulin Xiong

Inventor： Dongmin Chen ,  Fulin Xiong

IPC: G02B26/00 ,  G02B26/08 ,  G02B26/02 ,  G02F1/29 ,  G02F1/00

CPC classification number: G02B1/14 ,  B81B3/0005 ,  B81B2201/042 ,  B81C1/0096 ,  B81C2201/112 ,  B82Y30/00 ,  G02B21/32 ,  G02B27/0006

Abstract: Embodiments of the present invention generally relate to a process of forming a device that has an improved usable lifetime due to the addition of a gas-phase lubricant that reduces the likelihood of stiction occurring between the various moving parts in an electromechanical device. One advantage of the disclosed device is that a gas-phase lubricant has a high diffusion rate and, therefore, is self-replenishing, meaning that it can quickly move back into a contact region after being physically displaced from the region by the contacting surfaces of the device during operation. Consequently, the gas-phase lubricant is more reliable than conventional solid or liquid lubricants in preventing stiction-related device failures.

Abstract translation: 本发明的实施方案一般涉及一种形成装置的方法，该装置由于添加气相润滑剂而具有改善的使用寿命，所述气相润滑剂降低了在机电装置中各种运动部件之间出现静电的可能性。 所公开的装置的一个优点是气相润滑剂具有高扩散速率，因此是自补充的，这意味着它可以在通过接触区域的接触表面物理移位之后迅速地移回接触区域 该设备在运行期间。 因此，气相润滑剂比传统的固体或液体润滑剂在防止与静脉相关的装置故障方面更可靠。