Abstract:
A method including providing a present wafer to be processed by a photolithography tool, selecting a processed wafer having a past chip design from a plurality of processed wafers, the processed wafer being previously processed by the photolithography tool, selecting a plurality of critical dimension (CD) data points extracted from a plurality of fields on the processed wafer, modeling the plurality of CD data points with a function relating CD to position on the processed wafer, creating a field layout on the present wafer for a new chip design, creating an initial exposure dose map for the new chip design using the function and the field layout, and controlling the exposure of the photolithography tool according to the initial exposure dose map to form the new chip design on the present wafer.
Abstract:
A solar cell includes a substrate, a lower conductor layer, an anti-reflection coating (ARC) layer and an upper conductor layer. The substrate has a front side, a back side and a doped region adjacent to the front side. The lower conductor layer has a first portion embedded into the doped region and a second portion other than the first portion. The ARC layer is disposed on the front side of the substrate and covers the lower conductor layer such that the second portion of the lower conductor layer is disposed in the ARC layer. The upper conductor layer has a first portion embedded into the ARC layer and a second portion other than the first portion of the upper conductor layer. The second portion of the upper conductor layer is exposed out of the ARC layer, and the upper conductor layer is electrically connected to the lower conductor layer.
Abstract:
A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.
Abstract:
A hard water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hard coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the hard water-repellent structure includes the hard coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the hard water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the disclosure adopts the APPD technique to form the hard water-repellent structure, the cost of production is reduced dramatically. Thus, the disclosure can solve drawbacks of prior art.
Abstract:
A wafer treating method for making adhesive dies is provided. A liquid adhesive with two-stage property is coated on a surface of a wafer. Then, the wafer is pre-cured to make the liquid adhesive transform a thermo-bonding adhesive film having B-stage property which has a glass transition temperature not less than 40° C. for handling without adhesive under room temperature. After positioning the wafer, the wafer is singulated to form a plurality of dies with adhesive for die-to-die stacking, die-to-substrate or die-to-leadframe attaching.
Abstract:
Atmospheric plasma inkjet printing apparatus and methods for fabricating color filters using the same. The atmosphere plasma inkjet printing apparatus includes a nozzle plate having a first column of nozzles and a second column of nozzles. An inkjet printhead module corresponds to the first column of nozzles. An atmospheric plasma module is corresponds to the second column of nozzles.
Abstract:
A method and system for adaptive motion estimation, which sets a search range in a previous frame in order to find a corresponding macroblock in the adaptive search range according to each macroblock of a current frame and to accordingly determine a corresponding motion vector. A motion vector is first determined by referring to a target macroblock of a current frame and reference macroblocks in a search range of a previous frame. Then, a compression mode is determined according to the target macroblock, the reference macroblocks and the motion vector, and a mode data is outputted corresponding to the compression mode. Finally, a search range is determined according to the mode data and the motion vector. Thus, the required computational amount and bandwidth can be saved and also the high-efficiency image compression is obtained.
Abstract:
A bicycle frame includes a front part and a rear part. The front part includes head tube, a seat tube and a down tube connected between the head tube and the seat tube. A first connection portion is connected to the conjunction portion of the seat tube and the down tube. The rear part includes a second connection portion, a connection plate extending from a top end of the second connection portion, and two chain stays and two seat stays extending from the connection plate. The connection plate is fixed to the seat tube by at least one bolt, and the first and second connection portions are connected to each other by at least two bolts. The first connection portion includes a ridge which is engaged with the groove defined in the second connection portion.
Abstract:
A flat display device includes a flat display panel, an upper polarizing plate disposed on a light exit plane of the flat display panel, and a lower polarizing plate disposed on a light entrance plane of the flat display panel. The upper polarizing plate includes a wide view film, and its absorption axis and a horizontal view direction of the flat display panel have an included angle of about 15 degrees. The absorption axis of the lower polarizing plate and the horizontal view direction of the flat display panel have an included angle of about 105 degrees.