公开(公告)号：US09053621B2

公开(公告)日：2015-06-09

申请号：US13958629

申请日：2013-08-05

Applicant: Chun-Hung Lin

Inventor： Chun-Hung Lin

IPC: G06K9/00 ,  G08B13/196

CPC classification number: G08B13/19602

Abstract: An image surveillance system and an image surveillance method are provided. The image surveillance method includes following steps. An image is captured, and at least one reference target is defined in the captured image. A monitored object in the image is identified. A distance between the monitored object and each of the at least one reference target is individually calculated. Whether to announce at least one warning is determined according to a relationship between at least one threshold and the distance.

Abstract translation: 提供图像监视系统和图像监视方法。 图像监视方法包括以下步骤。 拍摄图像，并且在捕获的图像中定义至少一个参考目标。 识别图像中的被监视对象。 分别计算被监视对象与至少一个参考目标中的每一个之间的距离。 根据至少一个阈值和距离之间的关系来确定是否宣布至少一个警告。

公开(公告)号：US20150010213A1

公开(公告)日：2015-01-08

申请号：US13958629

申请日：2013-08-05

Applicant: Chun-Hung Lin

Inventor： Chun-Hung Lin

IPC: G08B13/196

CPC classification number: G08B13/19602

Abstract: An image surveillance system and an image surveillance method are provided. The image surveillance method includes following steps. An image is captured, and at least one reference target is defined in the captured image. A monitored object in the image is identified. A distance between the monitored object and each of the at least one reference target is individually calculated. Whether to announce at least one warning is determined according to a relationship between at least one threshold and the distance.

Abstract translation: 提供图像监视系统和图像监视方法。 图像监视方法包括以下步骤。 拍摄图像，并且在捕获的图像中定义至少一个参考目标。 识别图像中的被监视对象。 分别计算被监视对象与至少一个参考目标中的每一个之间的距离。 根据至少一个阈值和距离之间的关系来确定是否宣布至少一个警告。

公开(公告)号：US20130175008A1

公开(公告)日：2013-07-11

申请号：US13347640

申请日：2012-01-10

Applicant: Chien-Chih Yeh ,  Wen-Shiang Chen ,  Chian Tao ,  Chun-Hung Lin

Inventor： Chien-Chih Yeh ,  Wen-Shiang Chen ,  Chian Tao ,  Chun-Hung Lin

IPC: F28D15/04

CPC classification number: F28D15/046 ,  F28D15/0233 ,  F28F13/187 ,  F28F2245/02 ,  F28F2245/04

Abstract: A thin heat pipe includes a thin hollow tube and a capillary structure. The capillary structure is formed in at least half of an inner wall of the thin hollow tube by a chemical etching process.

Abstract translation: 薄的热管包括薄的中空管和毛细结构。 毛细结构通过化学蚀刻工艺形成在薄中空管的内壁的至少一半中。

公开(公告)号：US08466291B2

公开(公告)日：2013-06-18

申请号：US12609392

申请日：2009-10-30

Applicant: Chun-Hung Lin ,  Ching-Wen Ho

Inventor： Chun-Hung Lin ,  Ching-Wen Ho

IPC: C07D211/00 ,  A61K31/445

CPC classification number: C07D211/40 ,  C07D211/58 ,  C07D401/10 ,  C07D405/10

Abstract: 1,5-Dideoxy-1,5-imino-D-glucitol compounds as shown in the specification. Also disclosed is a method of treating a hexosaminidase-associated disease.

Abstract translation: 1,5-二脱氧-1,5-亚氨基-D-葡萄糖醇化合物，如说明书所示。 还公开了一种治疗氨基糖苷酶相关疾病的方法。

公开(公告)号：US08429569B2

公开(公告)日：2013-04-23

申请号：US13086935

申请日：2011-04-14

Applicant: Chih-Jen Yu ,  Chun-Hung Lin ,  Juin-Hung Lin ,  Hsueh-Yi Chung ,  Li-Kong Turn ,  Keh-Wen Chang

Inventor： Chih-Jen Yu ,  Chun-Hung Lin ,  Juin-Hung Lin ,  Hsueh-Yi Chung ,  Li-Kong Turn ,  Keh-Wen Chang

IPC: G06F17/50

CPC classification number: G06F17/50 ,  G03F7/705 ,  G03F7/70558 ,  G03F7/70625

Abstract: A method including providing a present wafer to be processed by a photolithography tool, selecting a processed wafer having a past chip design from a plurality of processed wafers, the processed wafer being previously processed by the photolithography tool, selecting a plurality of critical dimension (CD) data points extracted from a plurality of fields on the processed wafer, modeling the plurality of CD data points with a function relating CD to position on the processed wafer, creating a field layout on the present wafer for a new chip design, creating an initial exposure dose map for the new chip design using the function and the field layout, and controlling the exposure of the photolithography tool according to the initial exposure dose map to form the new chip design on the present wafer.

Abstract translation: 一种方法，包括提供由光刻工具处理的当前晶片，从多个处理的晶片中选择具有过去晶片设计的经处理的晶片，处理的晶片由光刻工具预先处理，选择多个关键尺寸（CD ）数据点，其处理晶片上的多个场中提取的数据点，以与CD相关的功能对处理的晶片上的位置对多个CD数据点进行建模，在当前晶片上创建用于新芯片设计的场布局， 使用功能和现场布局的新芯片设计的曝光剂量图，并根据初始曝光剂量图控制光刻工具的曝光，以在当前晶片上形成新的芯片设计。

公开(公告)号：US08253014B2

公开(公告)日：2012-08-28

申请号：US12985847

申请日：2011-01-06

Applicant: Sheng Yung Liu ,  Chin-Tien Yang ,  Chun-Hung Lin

Inventor： Sheng Yung Liu ,  Chin-Tien Yang ,  Chun-Hung Lin

IPC: H01L31/00

CPC classification number: H01L31/022433 ,  H01L31/02168 ,  Y02E10/50 ,  Y02E10/52

Abstract: A solar cell includes a substrate, a lower conductor layer, an anti-reflection coating (ARC) layer and an upper conductor layer. The substrate has a front side, a back side and a doped region adjacent to the front side. The lower conductor layer has a first portion embedded into the doped region and a second portion other than the first portion. The ARC layer is disposed on the front side of the substrate and covers the lower conductor layer such that the second portion of the lower conductor layer is disposed in the ARC layer. The upper conductor layer has a first portion embedded into the ARC layer and a second portion other than the first portion of the upper conductor layer. The second portion of the upper conductor layer is exposed out of the ARC layer, and the upper conductor layer is electrically connected to the lower conductor layer.

Abstract translation: 太阳能电池包括基板，下导体层，抗反射涂层（ARC）层和上导体层。 衬底具有与前侧相邻的前侧，后侧和掺杂区。 下导体层具有嵌入掺杂区域中的第一部分和除第一部分之外的第二部分。 ARC层设置在基板的前侧，并覆盖下导体层，使得下导体层的第二部分设置在ARC层中。 上导体层具有嵌入到ARC层中的第一部分和除了上导体层的第一部分之外的第二部分。 上导体层的第二部分露出ARC层，并且上导体层电连接到下导体层。

公开(公告)号：US08075790B2

公开(公告)日：2011-12-13

申请号：US12078505

申请日：2008-04-01

Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC classification number: H01J37/32825 ,  G02F1/1303 ,  G02F2001/1316 ,  G03F7/427 ,  H01J37/32366 ,  H01J37/32623 ,  H05H2001/3463

Abstract: A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.

Abstract translation: 公开了一种从基板上去除膜的膜去除方法和装置。 该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上， 为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物 条件。

公开(公告)号：US20110171426A1

公开(公告)日：2011-07-14

申请号：US13032589

申请日：2011-02-22

Applicant: Chih-Wei Chen ,  Chun-Hung Lin ,  Tsung-Hui Cheng ,  Chih-Yuan Chen ,  Te-Hui Yang ,  Chen-Der Tsai ,  Chin-Jyi Wu ,  Yun-Chuan Tu ,  Chia-Chiang Chang

Inventor： Chih-Wei Chen ,  Chun-Hung Lin ,  Tsung-Hui Cheng ,  Chih-Yuan Chen ,  Te-Hui Yang ,  Chen-Der Tsai ,  Chin-Jyi Wu ,  Yun-Chuan Tu ,  Chia-Chiang Chang

IPC: B32B3/00 ,  B05D5/02 ,  B05D5/00 ,  C23C16/34 ,  C23C16/50 ,  C23C4/04 ,  C23C4/12 ,  B32B7/02 ,  B82Y30/00 ,  B82Y40/00

CPC classification number: B05D5/086 ,  B05D1/62 ,  Y10T428/24355 ,  Y10T428/24983

Abstract: A hard water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hard coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the hard water-repellent structure includes the hard coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the hard water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the disclosure adopts the APPD technique to form the hard water-repellent structure, the cost of production is reduced dramatically. Thus, the disclosure can solve drawbacks of prior art.

Abstract translation: 提供了一种坚硬的拒水结构及其制造方法。 该方法采用大气压等离子体沉积（APPD）技术，在基体上形成具有粗糙表面的硬涂层，并在粗糙表面上形成防水涂层。 由于硬斥水结构包括硬涂层和防水涂层，因此改善了硬拒水结构的硬度，耐磨性，透明性和疏水性。 坚硬的防水结构保护基材免受摩擦。 此外，由于本公开采用APPD技术形成了防水结构，生产成本显着降低。 因此，本公开可以解决现有技术的缺点。

公开(公告)号：USRE42349E1

公开(公告)日：2011-05-10

申请号：US11371307

申请日：2006-03-07

Applicant: Chun-Hung Lin ,  Jesse Huang ,  Kuang-Hui Chen ,  Shih-Wen Chou

Inventor： Chun-Hung Lin ,  Jesse Huang ,  Kuang-Hui Chen ,  Shih-Wen Chou

IPC: B05D5/10 ,  B05D3/12 ,  H01L21/00

CPC classification number: H01L24/27 ,  H01L21/6836 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/4951 ,  H01L23/49513 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/83 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2224/05599 ,  H01L2224/06135 ,  H01L2224/06136 ,  H01L2224/274 ,  H01L2224/29101 ,  H01L2224/32014 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/48225 ,  H01L2224/48227 ,  H01L2224/4824 ,  H01L2224/48247 ,  H01L2224/4826 ,  H01L2224/484 ,  H01L2224/73215 ,  H01L2224/73265 ,  H01L2224/83191 ,  H01L2224/83855 ,  H01L2224/83856 ,  H01L2224/85399 ,  H01L2224/92147 ,  H01L2225/0651 ,  H01L2225/06575 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01047 ,  H01L2924/014 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/45099

Abstract: A wafer treating method for making adhesive dies is provided. A liquid adhesive with two-stage property is coated on a surface of a wafer. Then, the wafer is pre-cured to make the liquid adhesive transform a thermo-bonding adhesive film having B-stage property which has a glass transition temperature not less than 40° C. for handling without adhesive under room temperature. After positioning the wafer, the wafer is singulated to form a plurality of dies with adhesive for die-to-die stacking, die-to-substrate or die-to-leadframe attaching.

Abstract translation: 提供了一种用于制造粘合剂模具的晶片处理方法。 具有两级特性的液体粘合剂涂覆在晶片的表面上。 然后，将晶片预固化，使液体粘合剂转变具有玻璃化转变温度不低于40℃的B阶特性的热粘合粘合剂膜，以在室温下无粘合剂进行处理。 在定位晶片之后，将晶片单片化以形成具有用于管芯到管芯堆叠，管芯到衬底或管芯到引线框架附接的粘合剂的多个管芯。

公开(公告)号：US07883181B2

公开(公告)日：2011-02-08

申请号：US11871582

申请日：2007-10-12

Applicant: Chun-Hung Lin ,  Chia-Chiang Chang ,  Chao-Kai Cheng ,  Chieh-Yi Huang ,  Wan-Wen Chiu

Inventor： Chun-Hung Lin ,  Chia-Chiang Chang ,  Chao-Kai Cheng ,  Chieh-Yi Huang ,  Wan-Wen Chiu

IPC: B41J2/14 ,  B41J2/16

CPC classification number: G02B5/201

Abstract: Atmospheric plasma inkjet printing apparatus and methods for fabricating color filters using the same. The atmosphere plasma inkjet printing apparatus includes a nozzle plate having a first column of nozzles and a second column of nozzles. An inkjet printhead module corresponds to the first column of nozzles. An atmospheric plasma module is corresponds to the second column of nozzles.

Abstract translation: 大气等离子体喷墨印刷装置及其制造方法。 气氛等离子体喷墨打印设备包括具有第一列喷嘴和第二喷嘴列的喷嘴板。 喷墨打印头模块对应于第一列喷嘴。 大气等离子体模块对应于第二列喷嘴。