公开(公告)号：US20160189933A1

公开(公告)日：2016-06-30

申请号：US15063849

申请日：2016-03-08

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Soonam Park ,  Dmitry Lubomirsky ,  Hideo Sugai

IPC: H01J37/32 ,  H01J37/244

CPC classification number: H01J37/32229 ,  H01J7/24 ,  H01J19/80 ,  H01J37/244 ,  H01J37/32201 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32935 ,  H01J37/3299 ,  H05B41/16

Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

公开(公告)号：US20160172163A1

公开(公告)日：2016-06-16

申请号：US15051816

申请日：2016-02-24

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Toshihiko IWAO ,  Satoru KAWAKAMI

IPC: H01J37/32 ,  H01J37/244

CPC classification number: H01J37/32311 ,  H01J37/244 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32211 ,  H01J37/3222 ,  H01J37/32229 ,  H01J37/32238 ,  H01J37/32266 ,  H01J37/32935 ,  H01J37/3299

Abstract: Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space; a microwave generator configured to generate microwaves; a distributor configured to distribute the microwaves to a plurality of waveguides; an antenna installed in the processing container and to radiate the microwaves distributed to the plurality of waveguides to the processing space; a monitor unit configured to monitor a voltage of each of the plurality of waveguides; a storage unit configured to store a difference between a monitor value of the voltage monitored by the monitor unit and a predetermined reference value of the voltage and a control value of a distribution ratio of the distributor corresponding to the difference; and a control unit configured to acquire the control value of the distribution ratio of the distributor from the storage unit and to control the distribution ratio of the distributor.

Abstract translation: 公开了一种微波等离子体处理装置，包括：处理容器，其构造成限定处理空间; 构造成产生微波的微波发生器; 配置成将微波分布到多个波导的分配器; 安装在处理容器中并将分布在多个波导上的微波辐射到处理空间的天线; 监视器单元，被配置为监视所述多个波导中的每一个的电压; 存储单元，其被配置为存储由所述监视单元监视的电压的监视值与所述电压的预定参考值和所述分配器对应于所述差异的分配比率的控制值之间的差; 以及控制单元，被配置为从所述存储单元获取所述分配器的分配比率的控制值，并且控制所述分配器的分配比。

公开(公告)号：US09305751B2

公开(公告)日：2016-04-05

申请号：US14326649

申请日：2014-07-09

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi Kaneko ,  Toshihiko Iwao ,  Satoru Kawakami

IPC: H01J37/32

CPC classification number: H01J37/32311 ,  H01J37/244 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32211 ,  H01J37/3222 ,  H01J37/32229 ,  H01J37/32238 ,  H01J37/32266 ,  H01J37/32935 ,  H01J37/3299

Abstract: A microwave plasma processing apparatus includes a processing space; a microwave generator which generates microwaves for generating a plasma; a distributor which distributes the microwaves to a plurality of waveguides; an antenna installed in a processing container to seal the processing space and to radiate microwaves distributed by the distributor, to the processing space; and a monitor unit configured to monitor a voltage of each of the plurality of waveguides. A control unit acquires a control value of a distribution ratio of the distributor, which corresponds to a difference between a voltage monitor value of the monitor unit and a predetermined voltage reference value, from a storage unit that stores the difference and the control value corresponding to each other. The control unit is also configured to control the distribution ratio of the distributor, based on the acquired control value.

Abstract translation: 微波等离子体处理装置包括处理空间; 产生产生等离子体的微波的微波发生器; 将微波分配到多个波导的分配器; 安装在处理容器中以密封处理空间并辐射由分配器分布的微波的天线到处理空间; 以及监视器单元，被配置为监视所述多个波导中的每一个的电压。 控制单元从存储该差异的存储单元和对应于该监视单元的控制值获取对应于监视单元的电压监视值和预定电压基准值之间的差异的分配器的分配比率的控制值 彼此。 控制单元还被配置为基于所获取的控制值来控制分配器的分配比。

公开(公告)号：US20140361684A1

公开(公告)日：2014-12-11

申请号：US14373589

申请日：2012-12-14

Applicant: TOKYO ELECTRON LIMITED

Inventor： Taro Ikeda ,  Hiroyuki Miyashita ,  Yuki Osada ,  Yutaka Fujino ,  Tomohito Komatsu

IPC: H01J37/32

CPC classification number: H01J37/32266 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3222 ,  H01J37/32229 ,  H05H1/46 ,  H05H2001/4615 ,  H05H2001/4622 ,  H05H2001/463

Abstract: A microwave emission mechanism includes: a transmission path through which a microwave is transmitted; and an antenna section that emits into a chamber the microwave transmitted through the transmission path. The antenna section includes an antenna having a slot through which the microwave is emitted, a dielectric member through which the microwave emitted from the antenna is transmitted and a closed circuit in which a surface current and a displacement current flow. A surface wave is formed in a surface of the dielectric member. The closed circuit has at least: an inner wall of the slot; and the surface and an inner portion of the dielectric member. When a wavelength of the microwave is λ0, a length of the closed circuit is nλ0±δ, where n is a positive integer and δ is a fine-tuning component including 0.

Abstract translation: 微波发射机构包括：传输微波的传输路径; 以及天线部分，其将通过传输路径传输的微波发射到室中。 天线部分包括具有微波发射的狭缝的天线，从天线发出的微波穿过的电介质构件和表面电流和位移电流的闭合电路。 表面波形成在电介质构件的表面中。 闭路至少具有：槽的内壁; 以及电介质构件的表面和内部。 当微波的波长为λ0时，闭路电路的长度为nλ0±δ，其中n为正整数，δ为包括0的微调组件。

公开(公告)号：US20140197761A1

公开(公告)日：2014-07-17

申请号：US14114422

申请日：2012-04-25

Applicant: Adrien Grandemenge ,  Jean-Marie Jacomino ,  Marilena Radoiu ,  Louis Latrasse

Inventor： Adrien Grandemenge ,  Jean-Marie Jacomino ,  Marilena Radoiu ,  Louis Latrasse

IPC: H01J37/32 ,  H05B6/74 ,  H05B6/66 ,  H05B6/64

CPC classification number: H05B6/6447 ,  H01J37/32009 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32229 ,  H01J37/32266 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32678 ,  H05B6/664 ,  H05B6/74

Abstract: The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected PR(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power PR(i) and/or to adjust the transmitted power PT(i).

Abstract translation: 本发明涉及一种用于微波处理负载的设备（1），包括：至少一个施加装置（30）; 在微波领域中的至少一个固态发生器（4），通过用于引导（5）电磁波的装置连接到至少一个施加装置; 至少一个频率调节系统（40），被设计用于调整由相应的发电机（4）产生的波的频率; 用于所述或每个应用设备（30）的测量系统（31），被设计用于测量由所述应用设备（30）反映的功率（i）的功率; 连接到每个频率调节系统（40）和每个测量系统（31）的自动控制装置（6），以便根据反射功率来控制电磁波的频率f（i）的调整，以便 调整反射功率PR（i）和/或调整发射功率PT（i）。

公开(公告)号：US08212428B2

公开(公告)日：2012-07-03

申请号：US12472425

申请日：2009-05-27

Applicant: Jun Choi ,  Jae Koo Lee ,  Jae Yoon Sim

Inventor： Jun Choi ,  Jae Koo Lee ,  Jae Yoon Sim

IPC: H02J7/00

CPC classification number: H01J37/32825 ,  H01J37/32192 ,  H01J37/32201 ,  H05H1/46

Abstract: Provided is a portable power supply apparatus for generating microwave plasma, capable of minimizing a power reflected from a plasma generation apparatus and improving power consumption of the plasma generation apparatus by generating the plasma by using a microwave having a specific frequency, monitoring the power reflected from the plasma generation apparatus after the generation of the plasma, detecting a changed impedance matching condition, and correcting the frequency.

Abstract translation: 提供了一种用于产生微波等离子体的便携式电源装置，其能够使从等离子体发生装置反射的功率最小化，并且通过使用具有特定频率的微波产生等离子体来改善等离子体产生装置的功率消耗，监测从 在产生等离子体之后的等离子体产生装置，检测改变的阻抗匹配条件和校正频率。

公开(公告)号：US20100207528A1

公开(公告)日：2010-08-19

申请号：US12472425

申请日：2009-05-27

Applicant: Jun CHOI ,  Jae-Koo LEE ,  Jae-Yoon SIM

Inventor： Jun CHOI ,  Jae-Koo LEE ,  Jae-Yoon SIM

IPC: H05H1/46

CPC classification number: H01J37/32825 ,  H01J37/32192 ,  H01J37/32201 ,  H05H1/46

Abstract: Provided is a portable power supply apparatus for generating microwave plasma, capable of minimizing a power reflected from a plasma generation apparatus and improving power consumption of the plasma generation apparatus by generating the plasma by using a microwave having a specific frequency, monitoring the power reflected from the plasma generation apparatus after the generation of the plasma, detecting a changed impedance matching condition, and correcting the frequency.

Abstract translation: 提供了一种用于产生微波等离子体的便携式电源装置，其能够使从等离子体发生装置反射的功率最小化，并且通过使用具有特定频率的微波产生等离子体来改善等离子体产生装置的功率消耗，监测从 在产生等离子体之后的等离子体产生装置，检测改变的阻抗匹配条件和校正频率。

公开(公告)号：US07545226B2

公开(公告)日：2009-06-09

申请号：US10572532

申请日：2005-09-15

Applicant: Kibatsu Shinohara

Inventor： Kibatsu Shinohara

IPC: H03B9/10 ,  H03L7/24

CPC classification number: H03B9/10 ,  H01J23/34 ,  H01J37/32192 ,  H01J37/32201 ,  H05H1/46

Abstract: A magnetron (2), a launcher (4) which extracts the output power of the magnetron (2), an impedance generator (5) having one terminal connected to the output terminal of the launcher (4), and a reference signal supplier (6) connected to the other terminal of the impedance generator (5) are included. The reference signal supplier (6) supplies, to the magnetron (2), a reference signal lower in electric power and stabler in frequency than the output from the magnetron (2). The oscillation frequency of the magnetron (2) is locked to the frequency of the reference signal by injection of the reference signal. The impedance generator (5) can reduce the change width of the oscillation frequency of the magnetron (2) by adjusting the load impedance of the magnetron (2). This implements a magnetron oscillator (1) which has high frequency stability and does not fluctuate the frequency even when the output power is changed.

Abstract translation: 磁控管（2），提取磁控管（2）的输出功率的发射器（4），具有连接到发射器（4）的输出端子的一个端子的阻抗发生器（5）和参考信号供应器 包括连接到阻抗发生器（5）的另一端的6）。 参考信号供应器（6）向磁控管（2）提供电力较低的参考信号并且频率比来自磁控管（2）的输出更稳定。 通过注入参考信号，磁控管（2）的振荡频率被锁定到参考信号的频率上。 阻抗发生器（5）可以通过调整磁控管（2）的负载阻抗来减小磁控管（2）的振荡频率的变化宽度。 这实现了具有高频稳定性的磁控管振荡器（1），即使当输出功率改变时也不会使频率波动。

公开(公告)号：US20080309239A1

公开(公告)日：2008-12-18

申请号：US12044625

申请日：2008-03-07

Applicant: Shigeru Kasai ,  Yuki Osada

Inventor： Shigeru Kasai ,  Yuki Osada

IPC: H01J25/50

CPC classification number: H05B6/666 ,  H01J37/32192 ,  H01J37/32201 ,  H05B6/806 ,  H05B2206/043

Abstract: A microwave generation device includes: a magnetron having a cathode containing a filament and an anode containing a hollow resonator arranged to oppose to each other; a filament current measuring unit; and an application voltage measuring unit for measuring voltage applied to the filament. Based on the current and the voltage obtained by the current measuring unit and the voltage measuring unit, a resistance value calculation unit obtains a resistance value of the filament. A temperature calculation unit calculates the filament temperature from the resistance value and the resistance-temperature dependent characteristic. A filament power source is controlled by a power control unit so that the filament temperature is within a predetermined temperature range.

Abstract translation: 微波发生装置包括：具有包含灯丝的阴极的磁控管和包含彼此相对的中空谐振器的阳极; 灯丝电流测量单元; 以及用于测量施加到灯丝​​上的电压的施加电压测量单元。 基于由电流测量单元和电压测量单元获得的电流和电压，电阻值计算单元获得灯丝的电阻值。 温度计算单元根据电阻值和电阻温度依赖特性来计算灯丝温度。 灯丝电源由功率控制单元控制，使得灯丝温度在预定的温度范围内。

公开(公告)号：US20070098916A1

公开(公告)日：2007-05-03

申请号：US11264596

申请日：2005-11-01

Applicant: Michael Stowell

Inventor： Michael Stowell

IPC: B05D3/00 ,  H05H1/24

CPC classification number: C23C16/515 ,  C23C16/029 ,  C23C16/308 ,  C23C16/401 ,  C23C16/52 ,  H01J37/32201

Abstract: A method of generating a film during a chemical vapor deposition process is disclosed. One embodiment includes generating a first electrical pulse having a first pulse amplitude; using the first electrical pulse to generate a first density of radicalized species; disassociating a feedstock gas using the radicalized species in the first density of radicalized species, thereby creating a first deposition material; depositing the first deposition material on a substrate; generating a second electrical pulse having a second pulse amplitude, wherein the second pulse amplitude is different from the first pulse width; using the second electrical pulse to generate a second density of radicalized species; disassociating a feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second deposition material; and depositing the second plurality of deposition materials on the first deposition material.

Abstract translation: 公开了一种在化学气相沉积工艺期间产生膜的方法。 一个实施例包括产生具有第一脉冲幅度的第一电脉冲; 使用第一电脉冲产生第一密度的自由基化物种; 使用第一密度的自由基化物质中的自由基化物质分离原料气体，从而产生第一沉积材料; 将第一沉积材料沉积在基底上; 产生具有第二脉冲幅度的第二电脉冲，其中所述第二脉冲幅度不同于所述第一脉冲宽度; 使用第二电脉冲来产生第二密度的激进化物种; 使用第二密度的自由基化物质中的自由基化物质分解原料气体，从而产生第二沉积材料; 以及将所述第二多个沉积材料沉积在所述第一沉积材料上。