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公开(公告)号：US20210233961A1
公开(公告)日：2021-07-29
申请号：US17210571
申请日：2021-03-24
Applicant: Micron Technology, Inc.
Inventor： Innocenzo Tortorelli
Abstract: Methods, systems, and devices for multi-component cell architectures for a memory device are described. A memory device may include self-selecting memory cells that include multiple self-selecting memory components (e.g., multiple layers or other segments of a self-selecting memory material, separated by electrodes). The multiple self-selecting memory components may be configured to collectively store one logic state based on the polarity of a programming pulse applied to the memory cell. The multiple memory component layers may be collectively (concurrently) programmed and read. The multiple self-selecting memory components may increase the size of a read window of the memory cell when compared to a memory cell with a single self-selecting memory component. The read window for the memory cell may correspond to the sum of the read windows of each self-selecting memory component.
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公开(公告)号：US11024372B2
公开(公告)日：2021-06-01
申请号：US16102493
申请日：2018-08-13
Applicant: Micron Technology, Inc.
Inventor： Mattia Boniardi , Agostino Pirovano , Innocenzo Tortorelli
IPC: G11C13/00
Abstract: Methods, systems, and devices for operating memory cell(s) are described. A resistance of a storage element included in a memory cell may be programmed by applying a voltage to the memory cell that causes ion movement within the storage element, where the storage element remains in a single phase and has different resistivity based on a location of the ions within the storage element. In some cases, multiple of such storage elements may be included in a memory cell, where ions within the storage elements respond differently to electric pulses, and a non-binary logic value may be stored in the memory cell by applying a series of voltages or currents to the memory cell.
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公开(公告)号：US20210091140A1
公开(公告)日：2021-03-25
申请号：US17069347
申请日：2020-10-13
Applicant: Micron Technology, Inc.
Inventor： Marcello Ravasio , Samuele Sciarrillo , Fabio Pellizzer , Innocenzo Tortorelli , Roberto Somaschini , Cristina Casellato , Riccardo Mottadelli
Abstract: The disclosed technology relates generally to integrated circuit devices, and in particular to cross-point memory arrays and methods for fabricating the same. In one aspect, a method of fabricating cross-point memory arrays comprises forming a memory cell material stack which includes a first active material and a second active material over the first active material, wherein one of the first and second active materials comprises a storage material and the other of the first and second active materials comprises a selector material. The method of fabricating cross-point arrays further comprises patterning the memory cell material stack, which includes etching through at least one of the first and second active materials of the memory cell material stack, forming protective liners on sidewalls of the at least one of the first and second active materials after etching through the one of the first and second active materials, and further etching the memory cell material stack after forming the protective liners on the sidewalls of the one of the first and second active materials.
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公开(公告)号：US10896932B2
公开(公告)日：2021-01-19
申请号：US16513797
申请日：2019-07-17
Applicant: Micron Technology, Inc.
Inventor： Fabio Pellizzer , Innocenzo Tortorelli , Agostino Pirovano , Andrea Redaelli
Abstract: The present disclosure includes three dimensional memory arrays, and methods of processing the same. A number of embodiments include a plurality of conductive lines separated from one other by an insulation material, a plurality of conductive extensions arranged to extend substantially perpendicular to the plurality of conductive lines, and a storage element material formed around each respective one of the plurality of conductive extensions and having two different contacts with each respective one of the plurality of conductive lines, wherein the two different contacts with each respective one of the plurality of conductive lines are at two different ends of that respective conductive line.
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公开(公告)号：US20200279604A1
公开(公告)日：2020-09-03
申请号：US16876641
申请日：2020-05-18
Applicant: Micron Technology, Inc.
Inventor： Marco Sforzin , Mattia Robustelli , Innocenzo Tortorelli , Mario Allegra , Paolo Amato
Abstract: In an example, a first data structure can be read with a first read voltage dedicated to the first data structure. A second data structure that stores a larger quantity of data than the first data structure can be with a second read voltage that is dedicated to the second data structure. The first data structure can be with a third read voltage in response to a quantity of errors in reading the first data structure being greater than or equal to a first threshold quantity. The second data structure can be read with the third read voltage in response to a quantity of errors in reading the second data structure being greater than or equal to a second threshold quantity. The read voltages can be based on a temperature of an apparatus that includes the first and second data structures.
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Patent Agency Ranking
公开(公告)号：US10510957B2
公开(公告)日：2019-12-17
申请号：US15660829
申请日：2017-07-26
Applicant: Micron Technology, Inc.
Inventor： Agostino Pirovano , Fabio Pellizzer , Anna Maria Conti , Andrea Redaelli , Innocenzo Tortorelli
Abstract: A multi-layer memory device with an array having multiple memory decks of self-selecting memory cells is provided in which N memory decks may be fabricated with N+1 mask operations. The multiple memory decks may be self-aligned and certain manufacturing operations may be performed for multiple memory decks at the same time. For example, patterning a bit line direction of a first memory deck and a word line direction in a second memory deck above the first memory deck may be performed in a single masking operation, and both decks may be etched in a same subsequent etching operation. Such techniques may provide efficient fabrication which may allow for enhanced throughput, additional capacity, and higher yield for fabrication facilities relative to processing techniques in which each memory deck is processed using two or more mask and etch operations per memory deck.
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公开(公告)号：US20190341425A1
公开(公告)日：2019-11-07
申请号：US16513797
申请日：2019-07-17
Applicant: Micron Technology, Inc.
Inventor： Fabio Pellizzer , Innocenzo Tortorelli , Agostino Pirovano , Andrea Redaelli
Abstract: The present disclosure includes three dimensional memory arrays, and methods of processing the same. A number of embodiments include a plurality of conductive lines separated from one other by an insulation material, a plurality of conductive extensions arranged to extend substantially perpendicular to the plurality of conductive lines, and a storage element material formed around each respective one of the plurality of conductive extensions and having two different contacts with each respective one of the plurality of conductive lines, wherein the two different contacts with each respective one of the plurality of conductive lines are at two different ends of that respective conductive line.
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公开(公告)号：US10381077B2
公开(公告)日：2019-08-13
申请号：US16137950
申请日：2018-09-21
Applicant: MICRON TECHNOLOGY, INC.
Inventor： Innocenzo Tortorelli , Stephen Tang , Christina Papagianni
Abstract: Disclosed herein is a memory cell. The memory cell may act both as a combined selector device and memory element. The memory cell may be programmed by applying write pulses having different polarities. Different polarities of the write pulses may program different logic states into the memory cell. The memory cell may be read by read pulses all having the same polarity. The logic state of the memory cell may be detected by observing different threshold voltages when the read pulses are applied. The different threshold voltages may be responsive to the different polarities of the write pulses.
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公开(公告)号：US20190206506A1
公开(公告)日：2019-07-04
申请号：US16284491
申请日：2019-02-25
Applicant: Micron Technology, Inc.
Inventor： Innocenzo Tortorelli , Agostino Pirovano , Andrea Redaelli , Fabio Pellizzer , Hongmei Wang
CPC classification number: G11C29/00 , G11C13/00 , G11C13/0004 , G11C13/0033 , G11C13/004 , G11C29/52 , G11C2013/0052 , G11C2213/71 , H01L27/2409 , H01L27/2427 , H01L27/2463 , H01L27/2481 , H01L45/06 , H01L45/08 , H01L45/1233 , H01L45/142 , H01L45/143 , H01L45/144
Abstract: Methods, systems, and devices for drift mitigation with embedded refresh are described. A memory cell may be written to and read from using write and read voltages, respectively, that are of different polarities. For example, a memory cell may be written to by applying a first write voltage and may be subsequently read from by applying a first read voltage of a first polarity. At least one additional (e.g., a second) read voltage—a setback voltage—of a second polarity may be utilized to return the memory cell to its original state. Thus the setback voltage may mitigate a shift in the voltage distribution of the cell caused by the first read voltage.
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公开(公告)号：US20190180817A1
公开(公告)日：2019-06-13
申请号：US16279585
申请日：2019-02-19
Applicant: Micron Technology, Inc.
Inventor： Innocenzo Tortorelli , Fabio Pellizzer , Ferdinando Bedeschi
IPC: G11C13/00
Abstract: A method is provided for a reading memory even if there is a threshold voltage in an overlapped threshold voltage (VTH) region between a first state distribution and a second state distribution. The method includes ramping a bias on a memory cell a first time to determine a first threshold voltage (VTH1) of the memory cell and determining whether the VTH1 is within the overlapped VTH region. Upon determination that the memory cell is within the overlapped VTH region, the method further includes applying a write pulse to the memory cell; ramping a bias on the memory cell a second time to determine a second threshold voltage (VTH2); and determining the state of the memory cell prior to receiving the write pulse based on a comparison between the VTH1 and the VTH2.
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