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公开(公告)号:US11822122B2
公开(公告)日:2023-11-21
申请号:US17462491
申请日:2021-08-31
Applicant: GLOBALFOUNDRIES U.S. INC.
Inventor: Yusheng Bian , Ajey Poovannummoottil Jacob , Steven M. Shank
CPC classification number: G02B6/1225 , G02B1/002 , G02B1/005 , G02B6/125 , G02B2006/1213 , G02B2006/12061 , G02B2006/12147
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to waveguide structures with metamaterial structures and methods of manufacture. The structure includes: at least one waveguide structure; and metamaterial structures separated from the at least one waveguide structure by an insulator material, the metamaterial structures being structured to decouple the at least one waveguide structure to simultaneously reduce insertion loss and crosstalk of the at least one waveguide structure.
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公开(公告)号:US11821924B2
公开(公告)日:2023-11-21
申请号:US17684683
申请日:2022-03-02
Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
Inventor: Eng Huat Toh , Yongshun Sun
CPC classification number: G01R15/202 , G01R33/077
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to an on-chip current sensor. The on-chip current sensor includes: a vertical Hall sensor; and a current carrying conductor in a first wiring layer above the vertical Hall sensor.
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公开(公告)号:US11815717B2
公开(公告)日:2023-11-14
申请号:US17525293
申请日:2021-11-12
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Vibhor Jain , Nicholas A. Polomoff , Yusheng Bian
CPC classification number: G02B6/122 , G02B6/243 , H01L23/573 , G02B2006/12061 , G02B2006/12126
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a photonic chip security structure and methods of manufacture. The structure includes an optical component and a photonic chip security structure having a vertical wall composed of light absorbing material surrounding the optical component.
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公开(公告)号:US11811390B2
公开(公告)日:2023-11-07
申请号:US16403639
申请日:2019-05-06
Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
Inventor: You Qian , Humberto Campanella Pineda , Rakesh Kumar
Abstract: According to various embodiments, there is provided a resonator device that includes a first interdigital transducer and a second interdigital transducer that is electrically connected to the first interdigital transducer. Both the first interdigital transducer and the second interdigital transducer are configured to resonate at a common frequency. At least one of an electrode width and an electrode pitch of the first interdigital transducer is different from the respective electrode width and/or electrode pitch of the second interdigital transducer such that spurious peaks of the resonator device are lower in amplitude as compared to spurious peaks of each of the first interdigital transducer and the second interdigital transducer.
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公开(公告)号:US11810969B2
公开(公告)日:2023-11-07
申请号:US17509384
申请日:2021-10-25
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Haiting Wang , Alexander Derrickson , Jagar Singh , Vibhor Jain , Andreas Knorr , Alexander Martin , Judson R. Holt , Zhenyu Hu
IPC: H01L29/735 , H01L29/66 , H01L29/737 , H01L29/08 , H01L29/417
CPC classification number: H01L29/735 , H01L29/0808 , H01L29/0821 , H01L29/41708 , H01L29/6625 , H01L29/737
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a lateral bipolar transistor and methods of manufacture. A structure includes: an intrinsic base comprising semiconductor material in a channel region of a semiconductor substrate; an extrinsic base vertically above the intrinsic base; a raised collector region on the semiconductor substrate and laterally connected to the intrinsic base; and a raised emitter region on the semiconductor substate and laterally connected to the intrinsic base.
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公开(公告)号:US11810853B2
公开(公告)日:2023-11-07
申请号:US17702255
申请日:2022-03-23
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Il Goo Kim , Roderick A. Augur
IPC: H01L23/522 , H01L21/768 , H10B61/00 , H10B63/00
CPC classification number: H01L23/5226 , H01L21/76897 , H10B61/00 , H10B63/84
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to top electrode interconnect structures and methods of manufacture. The structure includes: a lower metallization feature; an upper metallization feature; a bottom electrode in direct contact with the lower metallization feature; one or more switching materials over the bottom electrode; a top electrode over the one or more switching materials; and a self-aligned via interconnection in contact with the top electrode and the upper metallization feature.
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公开(公告)号:US11808995B2
公开(公告)日:2023-11-07
申请号:US17707403
申请日:2022-03-29
Applicant: GlobalFoundries U.S. Inc.
Inventor: Yusheng Bian
CPC classification number: G02B6/4203 , G02B6/1228 , G02B6/12002 , G02B2006/12152
Abstract: Structures for an edge coupler and methods of fabricating such structures. The structure includes a back-end-of-line stack located over a substrate. The back-end-of-line stack includes a waveguide core having a longitudinal axis and a tapered section with a width that varies with position along the longitudinal axis based on a non-linear function.
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公开(公告)号:US11804491B2
公开(公告)日:2023-10-31
申请号:US17872812
申请日:2022-07-25
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Anupam Dutta
IPC: H01L27/12 , H01L29/417 , H01L29/423
CPC classification number: H01L27/1203 , H01L29/41733 , H01L29/42384
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to devices with staggered body contacts and methods of manufacture. The device includes: a gate structure on a semiconductor substrate material, the gate structure comprising a gate body with a width and a length; a plurality of body contacts electrically contacting a channel region under the gate body on at least one side of the gate body along its width; and isolation structures isolating the plurality of body contacts from a source region and a drain region associated with the gate structure.
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公开(公告)号:US11804440B2
公开(公告)日:2023-10-31
申请号:US17160447
申请日:2021-01-28
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Saquib B. Halim , Frank G. Kuechenmeister , Kashi V Machani , Christian Goetze
IPC: H01L23/538 , H01L23/00
CPC classification number: H01L23/5384 , H01L23/5383 , H01L23/5386 , H01L24/14
Abstract: Disclosed are chip module structures, each having a robust in-package interconnect for reliable performance. Some of the chip module structures achieve interconnect robustness through the use of vias in a spiral step pattern within the interconnect itself. Some chip module structures achieve interconnect robustness through the use of an interconnect stabilizer (referred to herein as a stabilization structure, fence or cage)), which includes vias in a repeating step pattern encircling the in-package interconnect, which is electrically isolated from back side solder balls, front side collapse chip connections (referred to herein as C4 connections), and the interconnect itself, and which is optionally connected to ground. Some chip module structures achieve interconnect robustness through the use of a combination of both vias in a spiral step pattern within the interconnect itself and an interconnect stabilizer.
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公开(公告)号:US20230343778A1
公开(公告)日:2023-10-26
申请号:US17724548
申请日:2022-04-20
Applicant: GlobalFoundries U.S. Inc.
Inventor: Prantik Mahajan , Ajay , Vishal Ganesan , Ruchil Jain , Souvick Mitra
IPC: H01L27/02
CPC classification number: H01L27/0262
Abstract: Structures for an electrostatic discharge device including a silicon-controlled rectifier and methods of forming a structure for an electrostatic discharge device that includes a silicon-controlled rectifier. The structure includes a first well in a semiconductor substrate, a second well and a third well in the first well, and a fourth well in the first well. The first well has a first conductivity type, and the second well and the third well have the first conductivity type. The fourth well positioned in a lateral direction between the second well and the third well, and the fourth well has a second conductivity type opposite to the first conductivity type. The second well, the third well, and the fourth well are positioned in a vertical direction between the first well and a top surface of the semiconductor substrate.
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