公开(公告)号：US07508489B2

公开(公告)日：2009-03-24

申请号：US11294860

申请日：2005-12-05

申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03B27/42 ,  G03F7/70258

摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane; disposing a substrate carrying a resist in a region of the image plane and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在物平面的区域中; 在所述图像平面的区域中配置携带抗蚀剂的基板，并使用所述投影曝光系统以调整的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

公开(公告)号：US20090015845A1

公开(公告)日：2009-01-15

申请号：US12195920

申请日：2008-08-21

申请人： Joerge Tschischgale ,  Toralf Gruner

发明人： Joerge Tschischgale ,  Toralf Gruner

IPC分类号： G01B11/02 ,  G03B27/42

CPC分类号： G03F7/70591 ,  G03B13/00 ,  G03F7/70266

摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

摘要翻译： 在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。 为此，测量光束被引导到这些点上，并且测量反射或折射的光束。 使用干涉仪。 基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。 校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。 例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

公开(公告)号：US20080297754A1

公开(公告)日：2008-12-04

申请号：US12031595

申请日：2008-02-14

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

IPC分类号： G03B27/54 ,  G02B5/00

CPC分类号： G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

摘要翻译： 本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。 本公开特别涉及光学元件的涂层以增加或降低反射率。

公开(公告)号：US07456933B2

公开(公告)日：2008-11-25

申请号：US11220643

申请日：2005-09-08

申请人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

发明人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/706 ,  G03F7/701 ,  G03F7/70566 ,  G03F7/70591

摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.

摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当的照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。

公开(公告)号：US20080198455A1

公开(公告)日：2008-08-21

申请号：US11813902

申请日：2006-02-22

申请人： Michael Totzeck ,  Daniel Kraehmer ,  Toralf Gruner

发明人： Michael Totzeck ,  Daniel Kraehmer ,  Toralf Gruner

IPC分类号： G02B27/18 ,  G02B27/28 ,  G02B1/08

CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70966

摘要： The invention relates to an optical system, in particular an objective or an illumination system for a microlithographic projection exposure apparatus, which in particular also permits the use of crystal materials with a high refractive index while reducing the influence of intrinsic birefringence on the imaging properties. In particular the invention relates to an optical system having at least two lens groups (10-60) with lenses of intrinsically birefringent material, wherein the lens groups (10-60) respectively comprise a first subgroup with lenses in a (100)-orientation and a second subgroup with lenses in (111)-orientation, and wherein the lenses of each subgroup are arranged rotated relative to each other about their lens axes.

摘要翻译： 本发明涉及一种用于微光刻投影曝光装置的光学系统，特别是物镜或照明系统，其特别地还允许使用具有高折射率的晶体材料，同时减少本征双折射对成像性能的影响。 特别地，本发明涉及一种具有至少两个具有本征双折射材料透镜的透镜组（10-60）的光学系统，其中透镜组（10-60）分别包括具有（100）取向的透镜的第一子组 以及具有（111）取向的透镜的第二子组，并且其中每个子组的透镜被布置为围绕其透镜轴线相对于彼此旋转。

公开(公告)号：US20080192224A1

公开(公告)日：2008-08-14

申请号：US11814928

申请日：2005-02-12

申请人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

发明人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70108 ,  G03F7/70141 ,  G03F7/70191

摘要： A projection exposure apparatus has a projection lens (10) with an object plane (34), an image plane, an optical axis (28) and a non-telecentric entrance pupil (32). The apparatus further comprises an illumination system (12) having an intermediate field plane (80) and a field stop (36; 36). The field stop is positioned in or in close proximity to the intermediate field plane (80) and defines an illuminated field (14) in the object plane (34) that does not contain the optical axis (28) of the projection lens (24). The illumination system (12) is configured such that, in the object plane (34), a mean of the angles formed between all principal rays (42) emanating from the intermediate field plane (80) on the one hand and the optical axis (28) of the projection lens (24) on the other hand differs from 0°.

摘要翻译： 投影曝光装置具有具有物平面（34），像平面，光轴（28）和非远心入射光瞳（32）的投影透镜（10）。 该装置还包括具有中间场平面（80）和场停止（36; 36）的照明系统（12）。 场停止件位于中间场平面（80）中或紧邻中间场平面（80），并且在物平面（34）中限定不包含投影透镜（24）的光轴（28）的照明场（14） 。 照明系统（12）被配置为使得在物平面（34）中，一方面从中间场平面（80）发射的所有主光线（42）和光轴（42）之间形成的平均角 另一方面，投影透镜（24）的光圈28（28）不同于0°。

公开(公告)号：US20080106711A1

公开(公告)日：2008-05-08

申请号：US11719074

申请日：2005-11-17

申请人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

发明人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Baerbel Schwaer ,  Olaf Rogalsky ,  Ari Kazi

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

公开(公告)号：US20070285637A1

公开(公告)日：2007-12-13

申请号：US10597776

申请日：2005-01-13

申请人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

发明人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

IPC分类号： G03B27/42

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： Imaging system of a microlithographic projection exposure apparatus with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.

摘要翻译： 具有投影物镜（200,300,500,600）的微光刻投影曝光装置的成像系统，其用于投射能够被设置在物平面内的掩模的图像到感光涂层上，该感光涂层可以是 设置在图像平面中的位置，以及用于将浸没液体（202,310,507）填充到图像平面和最后光学元件（201,309,506）之间的间隙空间中的液体输送装置（205） 在投影物镜的像平面侧; 其特征在于，所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看，所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时，所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件（201,309,506）布置在图像平面下方，使浸液（202,310,507,601） 至少部分地保持在图像平面侧上的最后一个光学元件上的大致桶形区域中。 此外，可以提供旋转器，其用于使承载感光涂层（401）的基板在传感方向之间旋转，其中感光涂层位于与重力方向相对的基板表面上，并且曝光取向 感光涂层（401）位于面向重力方向的基板表面上。

公开(公告)号：US07286284B2

公开(公告)日：2007-10-23

申请号：US10917626

申请日：2004-08-13

申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

IPC分类号： G02B23/00

CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.

摘要翻译： 用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。

公开(公告)号：US07180667B2

公开(公告)日：2007-02-20

申请号：US10817527

申请日：2004-04-01

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B5/30

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。