公开(公告)号：US06628389B1

公开(公告)日：2003-09-30

申请号：US09831420

申请日：2001-05-09

Applicant: Tomohiro Akada ,  Kenji Murano ,  Koichi Kuraue

Inventor： Tomohiro Akada ,  Kenji Murano ,  Koichi Kuraue

IPC: G01J400

CPC classification number: G02F1/1309 ,  G01B11/06 ,  G01B11/14 ,  G02F2001/133742

Abstract: Light is directed to a VA (Vertical Alignment) liquid crystal panel whose optical axis is in a direction perpendicular to the panel surface in such a manner that the light is incident obliquely on the VA liquid crystal panel surface, by which birefringence that results only from the liquid crystal layer is artificially generated so that measurement of the thickness (cell gap) of the VA liquid crystal is accurately performed.

Abstract translation: 光被引导到光轴垂直于面板表面的方向的VA（垂直取向）液晶面板，使得光倾斜地入射到VA液晶面板表面上，由此双折射仅由 人造地生成液晶层，从而精确地测量VA液晶的厚度（单元间隙）。

公开(公告)号：US06628388B2

公开(公告)日：2003-09-30

申请号：US09815087

申请日：2001-03-21

Applicant: Chris Darrow ,  Andrew Mirhej ,  Tino Seger

Inventor： Chris Darrow ,  Andrew Mirhej ,  Tino Seger

IPC: G01J400

CPC classification number: G01N21/23 ,  G01N21/05

Abstract: A transparent flow channel fluidly communicates a fluid source and a collection reservoir. A light beam passes through a first polarizer having a first plane of polarization. The flow channel is orthogonal to the light beam. The light beam passes through a fluid sample as it flows through the flow channel. The light beam is then filtered through a second polarizer having a second plane of polarization rotated 90° from the first plane of polarization. The birefringence of certain crystalline materials present in the fluid sample rotates the plane of polarization of the light beam. The presence of these microcrystals thus causes a component of the beam to pass through the second polarizer and impinge an electronic photo-detector located in the path of the beam. The photo-detector signals the presence of the microcrystals by generating voltage pulses. A display device visually presents the quantitative results of the assay.

公开(公告)号：US06590656B2

公开(公告)日：2003-07-08

申请号：US09960898

申请日：2001-09-21

Applicant: Yiping Xu ,  Ibrahim Abdulhalim

Inventor： Yiping Xu ,  Ibrahim Abdulhalim

IPC: G01J400

CPC classification number: G03F7/70625 ,  G01B11/0641 ,  G01N21/211 ,  G01N21/4788 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/213 ,  G01N2021/556 ,  G01N2021/95615 ,  G03F7/70491 ,  G03F7/70616 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.

公开(公告)号：US06559942B2

公开(公告)日：2003-05-06

申请号：US09803080

申请日：2001-03-08

Applicant: Zhifeng Sui ,  Coriolan Frum ,  Jie Yuan ,  Chang-Lin Hsieh

Inventor： Zhifeng Sui ,  Coriolan Frum ,  Jie Yuan ,  Chang-Lin Hsieh

IPC: G01J400

CPC classification number: G01N21/956 ,  G01N21/21 ,  G01N21/71 ,  G01N21/9501 ,  H01J37/32935 ,  H01L21/31116 ,  H01L21/31633

Abstract: A substrate is etched in a process zone by placing the substrate in the process zone, providing an energized process gas in the process zone, and exhausting the process gas. A first stage of the etching process is monitored to determine completion of the first stage by detecting the intensities of one or more wavelengths of a radiation emission generated by the energized gas, generating a first signal in relation to the detected intensities, and evaluating the first signal. A second stage of the etching process is monitored to determine completion of the second stage by detecting the intensities of one or more wavelengths of a polarized radiation reflected from the substrate being etched, generating a second signal in relation to the detected intensities, and evaluating the second signal.

公开(公告)号：US06538738B1

公开(公告)日：2003-03-25

申请号：US09713042

申请日：2000-11-16

Applicant: Masayuki Okamoto

Inventor： Masayuki Okamoto

IPC: G01J400

CPC classification number: G02F1/1309

Abstract: A quantity of modulation of brightness of bright display with respect to dark display is determined by obtaining a Mueller matrix regarding light since immediately before incidence to an optically anisotropic object until immediately after outgoing therefrom. It is possible to provide a method for evaluating optical modulation characteristics of a liquid crystal modulation element, in which: an index indicative of the brightness modulation quantity as an optical modulation characteristic of the liquid crystal modulation element is expressed by a general method that does not depend on the number of design parameters of optical elements to be finally determined; therefore, a value of the optical characteristic can be simply determined; and consequently conditions of design parameters necessary for optimizing the optical modulation characteristics and providing satisfactory optical modulation can be easily found.

Abstract translation: 相对于暗显示的明亮显示的亮度的调制量通过从紧接在光学各向异性物体之前获得关于光的Mueller矩阵来确定，直到从其出来之后。 可以提供一种用于评估液晶调制元件的光调制特性的方法，其中：表示作为液晶调制元件的光调制特性的亮度调制量的指标由不是 取决于要最终确定的光学元件的设计参数的数量; 因此，可以简单地确定光学特性的值; 因此可以容易地找到用于优化光学调制特性和提供令人满意的光学调制所需的设计参数的条件。

公开(公告)号：US06535284B1

公开(公告)日：2003-03-18

申请号：US09579338

申请日：2000-05-25

Applicant: Damian Hajduk ,  Eric Carlson

Inventor： Damian Hajduk ,  Eric Carlson

IPC: G01J400

CPC classification number: G01N21/21 ,  B01J2219/00286 ,  B01J2219/00315 ,  B01J2219/00585 ,  B01J2219/00659 ,  B01J2219/00707 ,  B01J2219/0072 ,  B01J2219/00745 ,  C40B40/18 ,  C40B60/14 ,  G01J4/04 ,  G01N2201/0813

Abstract: A method and apparatus for characterizing and screening an array of material samples is disclosed. The apparatus includes a sample block having a plurality of regions for containing the material samples, a polarized light source to illuminate the materials, an analyzer having a polarization direction different than the polarization direction of the polarized light source, and a detector for analyzing changes in the intensity of the light beams. The light source, together with a polarizer, may include a plurality of light beams to simultaneously illuminate the entire array of materials with linearly polarized light so that characterization and screening can be performed in parallel. In addition, the materials in the sample block maybe subjected to different environmental conditions or mechanical stresses, and the detector analyzes the array as a function of the different environmental conditions or mechanical stresses.

Abstract translation: 公开了一种表征和筛选材料样品阵列的方法和装置。 该装置包括具有用于容纳材料样本的多个区域的样本块，用于照射材料的偏振光源，具有与偏振光源的偏振方向不同的偏振方向的分析器，以及用于分析变化的检测器 光束的强度。 光源与偏振器一起可以包括多个光束，以同时以线性偏振光照射整个材料阵列，从而可以并行执行表征和筛选。 此外，样品块中的材料可能经受不同的环境条件或机械应力，并且检测器根据不同的环境条件或机械应力来分析阵列。

公开(公告)号：US06515746B2

公开(公告)日：2003-02-04

申请号：US10138984

申请日：2002-05-03

Applicant: Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

Inventor： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC: G01J400

CPC classification number: G01B11/0641 ,  G01J4/00 ,  G01N21/211

Abstract: An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

公开(公告)号：US06473181B1

公开(公告)日：2002-10-29

申请号：US09463532

申请日：2000-01-21

Applicant: Theodore C. Oakberg

Inventor： Theodore C. Oakberg

IPC: G01J400

CPC classification number: G01N21/23

Abstract: A practical system and method for measuring waveplate retardation. The system employs a photoelastic modulator (22) in an optical setup and provides high sensitivity. The analysis is particularly appropriate for quality-control testing of waveplates (26). The system is also adaptable for slightly varying the retardation provided by a waveplate (26) or any other retarder device in a given optical setup. To this end, the waveplate (26) position may be precisely altered to introduce correspondingly precise adjustments of the retardation values that the waveplate (26) provides. The system is further refined to permit one to compensate for errors in the retardation measurements just mentioned. Such errors may be attributable to static birefringence present in the optical element of the photoelastic modulator (22) that is incorporated in the system.

Abstract translation: 用于测量波片延迟的实用系统和方法。 该系统在光学设置中采用光弹性调制器（22）并提供高灵敏度。 该分析特别适用于波片的质量控制测试（26）。 该系统还适用于在给定的光学设置中稍微改变由波片（26）或任何其它延迟器装置提供的延迟。 为此，可以精确地改变波片（26）位置，以对波片（26）提供的延迟值进行相应的精确调节。 该系统被进一步细化以允许一个补偿刚刚提到的延迟测量中的误差。 这种错误可归因于存在于光弹性调制器（22）的光学元件中的并入系统中的静态双折射。

公开(公告)号：US06456376B1

公开(公告)日：2002-09-24

申请号：US09864840

申请日：2001-05-24

Applicant: Martin M. Liphardt ,  Blaine D. Johs ,  Craig M. Herzinger ,  Ping He

Inventor： Martin M. Liphardt ,  Blaine D. Johs ,  Craig M. Herzinger ,  Ping He

IPC: G01J400

CPC classification number: G01J3/447 ,  G01J4/00 ,  G01J2003/2866 ,  G01N21/21 ,  G01N21/211 ,  G02B5/3058 ,  G02B5/3083 ,  G02B27/46

Abstract: Disclosed is the application of spatial filter(s) in rotating compensator ellipsometer systems prior to or after a sample system. The purpose is, for instance, to eliminate a radially outer annulus of a generally arbitrary Profile beam that presents with low intensity level irregular content, so that electromagnetic beam intensity is caused to quickly decay to zero as a function of radius.

Abstract translation: 公开了在采样系统之前或之后在旋转补偿器椭偏仪系统中应用空间滤波器。 目的是例如消除具有低强度水平不规则内容的大致任意轮廓波束的径向外环，使得使电磁波强度作为半径的函数快速衰减到零。

公开(公告)号：US06441902B1

公开(公告)日：2002-08-27

申请号：US09474318

申请日：1999-12-29

Applicant: James N. Hilfiker ,  Corey L. Bungay ,  Craig M. Herzinger

Inventor： James N. Hilfiker ,  Corey L. Bungay ,  Craig M. Herzinger

IPC: G01J400

CPC classification number: G01N21/211

Abstract: Disclosed is a method of evaluating sample system anisotropic refractive indices, and orientations thereof with respect to an alignment surface, in multiple dimensions. The preferred method involves a sequence of steps which allows overcoming mathematical model parameter correlation during mathematical regression parameter evaluation, even though individually, steps of the present invention method wherein anisotropic refractive indices, or differences therebetween, are evaluated, require that only a relatively simple one dimensional data set be acquired.

Abstract translation: 公开了一种在多个维度上评估样品系统各向异性折射率及其相对于对准表面的取向的方法。 优选的方法包括一系列步骤，其允许在数学回归参数评估期间克服数学模型参数相关性，即使单独地评估其中各向异性折射率或其间的差异的本发明方法的步骤仅需要相对简单的一个 获取二维数据集。