公开(公告)号：US20220416032A1

公开(公告)日：2022-12-29

申请号：US17358436

申请日：2021-06-25

Applicant: Intel Corporation

Inventor： Debaleena Nandi ,  Chi-Hing Choi ,  Gilbert Dewey ,  Harold Kennel ,  Omair Saadat ,  Jitendra Kumar Jha ,  Adedapo Oni ,  Nazila Haratipour ,  Anand Murthy ,  Tahir Ghani

IPC: H01L29/417 ,  H01L27/088 ,  H01L29/161 ,  H01L21/8234 ,  H01L21/28 ,  H01L21/768

Abstract: Source and drain contacts that provide improved contact resistance and contact interface stability for transistors employing silicon and germanium source and drain materials, related transistor structures, integrated circuits, systems, and methods of fabrication are disclosed. Such source and drain contacts include a contact layer of co-deposited titanium and silicon on the silicon and germanium source and drain. The disclosed source and drain contacts improve transistor performance including switching speed and reliability.

公开(公告)号：US20220415892A1

公开(公告)日：2022-12-29

申请号：US17358073

申请日：2021-06-25

Applicant: INTEL CORPORATION

Inventor： Wilfred Gomes ,  Abhishek A. Sharma ,  Conor P. Puls ,  Mauro J. Kobrinsky ,  Kevin J. Fischer ,  Derchang Kau ,  Albert Fazio ,  Tahir Ghani

IPC: H01L27/105

Abstract: Integrated circuit (IC) devices with stacked two-level backend memory, and associated systems and methods, are disclosed. An example IC device includes a front end of line (FEOL) layer, including frontend transistors, and a back end of line (BEOL) layer above the FEOL layer. The BEOL layer includes a first memory layer with memory cells of a first type, and a second memory layer with memory cells of a second type. The first memory layer may be between the FEOL layer and the second memory layer, thus forming stacked backend memory. Stacked backend memory architecture may allow significantly increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density. Implementing two different types of backend memory may advantageously increase functionality and performance of backend memory.

公开(公告)号：US11522072B2

公开(公告)日：2022-12-06

申请号：US17080458

申请日：2020-10-26

Applicant: Intel Corporation

Inventor： Rishabh Mehandru ,  Patrick Morrow ,  Ranjith Kumar ,  Cory E. Weber ,  Seiyon Kim ,  Stephen M. Cea ,  Tahir Ghani

IPC: H01L29/45 ,  H01L29/16 ,  H01L29/66 ,  H01L29/78 ,  H01L21/822 ,  H01L21/8238 ,  H01L27/06 ,  H01L27/11 ,  H01L21/8234 ,  H01L21/84 ,  H01L27/108 ,  H01L27/12 ,  H01L29/778

Abstract: Vertical integration schemes and circuit elements architectures for area scaling of semiconductor devices are described. In an example, an inverter structure includes a semiconductor fin separated vertically into an upper region and a lower region. A first plurality of gate structures is included for controlling the upper region of the semiconductor fin. A second plurality of gate structures is included for controlling the lower region of the semiconductor fin. The second plurality of gate structures has a conductivity type opposite the conductivity type of the first plurality of gate structures.

公开(公告)号：US11450669B2

公开(公告)日：2022-09-20

申请号：US16043548

申请日：2018-07-24

Applicant: Intel Corporation

Inventor： Abhishek A. Sharma ,  Juan G. Alzate-Vinasco ,  Fatih Hamzaoglu ,  Bernhard Sell ,  Pei-hua Wang ,  Van H. Le ,  Jack T. Kavalieros ,  Tahir Ghani ,  Umut Arslan ,  Travis W. Lajoie ,  Chieh-jen Ku

IPC: H01L27/108 ,  G11C7/06 ,  G11C11/407 ,  H01L23/00 ,  H01L25/065 ,  H01L27/06 ,  H01L29/417 ,  H01L29/786 ,  H01L27/11

Abstract: Described herein are arrays of embedded dynamic random-access memory (eDRAM) cells that use TFTs as selector transistors. When at least some selector transistors are implemented as TFTs, different eDRAM cells may be provided in different layers above a substrate, enabling a stacked architecture. An example stacked TFT based eDRAM includes one or more memory cells provided in a first layer over a substrate and one or more memory cells provided in a second layer, above the first layer, where at least the memory cells in the second layer, but preferably the memory cells in both the first and second layers, use TFTs as selector transistors. Stacked TFT based eDRAM allows increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density.

公开(公告)号：US11444159B2

公开(公告)日：2022-09-13

申请号：US16612259

申请日：2017-06-30

Applicant: Intel Corporation

Inventor： Sean T. Ma ,  Gilbert Dewey ,  Willy Rachmady ,  Matthew V. Metz ,  Cheng-Ying Huang ,  Harold W. Kennel ,  Jack T. Kavalieros ,  Anand S. Murthy ,  Tahir Ghani

IPC: H01L29/10 ,  H01L29/205 ,  H01L29/66 ,  H01L29/775 ,  H01L29/78

Abstract: An electronic device comprises a channel layer on a buffer layer on a substrate. The channel layer has a first portion and a second portion adjacent to the first portion. The first portion comprises a first semiconductor. The second portion comprises a second semiconductor that has a bandgap greater than a bandgap of the first semiconductor.

公开(公告)号：US11430868B2

公开(公告)日：2022-08-30

申请号：US16020361

申请日：2018-06-27

Applicant: INTEL CORPORATION

Inventor： Rishabh Mehandru ,  Biswajeet Guha ,  Anupama Bowonder ,  Anand S. Murthy ,  Tahir Ghani ,  Stephen M. Cea

IPC: H01L29/10 ,  H01L29/06 ,  H01L29/423 ,  H01L29/786 ,  H01L29/78 ,  H01L21/74 ,  H01L29/66 ,  H01L29/20 ,  H01L29/161 ,  H01L29/16

Abstract: Integrated circuit structures including a buried etch-stop layer to help control transistor source/drain depth are provided herein. The buried etch-stop layer addresses the issue of the source/drain etch (or epi-undercut (EUC) etch) going below the bottom of the active height of the channel region, as such an issue can result in un-controlled sub-fin leakage that causes power consumption degradation and other undesired performance issues. The buried etch-stop layer is formed below the channel material, such as in the epitaxial stack that includes the channel material, and acts to slow the removal of material after the channel material has been removed when etching to form the source/drain trenches. In other words, the buried etch-stop layer includes different material from the channel material that can be etched, for at least one given etchant, at a relatively slower rate than the channel material to help control the source/drain trench depth.

公开(公告)号：US11380797B2

公开(公告)日：2022-07-05

申请号：US16604146

申请日：2017-06-20

Applicant: Intel Corporation

Inventor： Gilbert Dewey ,  Van H. Le ,  Abhishek A. Sharma ,  Shriram Shivaraman ,  Ravi Pillarisetty ,  Tahir Ghani ,  Jack T. Kavalieros

IPC: H01L29/778 ,  H01L29/786 ,  H01L27/12 ,  H01L29/06 ,  H01L29/22 ,  H01L29/417

Abstract: Thin film core-shell fin and nanowire transistors are described. In an example, an integrated circuit structure includes a fin on an insulator layer above a substrate. The fin has a top and sidewalls. The fin is composed of a first semiconducting oxide material. A second semiconducting oxide material is on the top and sidewalls of the fin. A gate electrode is over a first portion of the second semiconducting oxide material on the top and sidewalls of the fin. A first conductive contact is adjacent the first side of the gate electrode, the first conductive contact over a second portion of the second semiconducting oxide material on the top and sidewalls of the fin. A second conductive contact is adjacent the second side of the gate electrode, the second conductive contact over a third portion of the second semiconducting oxide material on the top and sidewalls of the fin.

公开(公告)号：US11367796B2

公开(公告)日：2022-06-21

申请号：US16134817

申请日：2018-09-18

Applicant: Intel Corporation

Inventor： Biswajeet Guha ,  Mauro J. Kobrinsky ,  Tahir Ghani

IPC: H01L29/786 ,  H01L29/423 ,  H01L27/088 ,  H01L21/8234 ,  H01L29/06

Abstract: Gate-all-around integrated circuit structures having asymmetric source and drain contact structures, and methods of fabricating gate-all-around integrated circuit structures having asymmetric source and drain contact structures, are described. For example, an integrated circuit structure includes a vertical arrangement of nanowires above a fin. A gate stack is over the vertical arrangement of nanowires. A first epitaxial source or drain structure is at a first end of the vertical arrangement of nanowires. A second epitaxial source or drain structure is at a second end of the vertical arrangement of nanowires. A first conductive contact structure is coupled to the first epitaxial source or drain structure. A second conductive contact structure is coupled to the second epitaxial source or drain structure. The second conductive contact structure is deeper along the fin than the first conductive contact structure.

公开(公告)号：US11276780B2

公开(公告)日：2022-03-15

申请号：US16024724

申请日：2018-06-29

Applicant: Intel Corporation

Inventor： Rishabh Mehandru ,  Tahir Ghani ,  Stephen Cea

IPC: H01L29/78 ,  H01L29/06 ,  H01L29/08 ,  H01L29/10 ,  H01L29/417 ,  H01L29/66

Abstract: A semiconductor device includes a semiconductor body that includes a surface and a first region and a second region formed in the semiconductor body, where a channel region is located between the first region and the second region, and where the second region includes a sub-region that includes a blanket dopant; a first conductive contact on the surface of the semiconductor body above the first region; a semiconductor-on-insulator (SOI) at a bottom of the first region; and a pocket channel dopant (PCD) formed in the channel, where a first portion of the PCD is adjacent to a first portion of the SOI; and a second conductive contact on a bottom portion of the sub-region, where a first portion of the second conductive contact is adjacent to a second portion of the SOI, and a second portion of the second conductive contact is adjacent to a second portion of the PCD.

公开(公告)号：US11257822B2

公开(公告)日：2022-02-22

申请号：US16691163

申请日：2019-11-21

Applicant: Intel Corporation

Inventor： Wilfred Gomes ,  Kinyip Phoa ,  Mauro J. Kobrinsky ,  Tahir Ghani ,  Uygar E. Avci ,  Rajesh Kumar

IPC: H01L27/108 ,  H01L29/78 ,  H01L49/02 ,  H01L29/06 ,  H01L29/423 ,  H01L29/49 ,  H01L29/51 ,  H01L29/786

Abstract: Described herein are IC devices that include semiconductor nanoribbons stacked over one another to realize high-density three-dimensional (3D) dynamic random-access memory (DRAM). An example device includes a first semiconductor nanoribbon, a second semiconductor nanoribbon, a first source or drain (S/D) region and a second S/D region in each of the first and second nanoribbons, a first gate stack at least partially surrounding a portion of the first nanoribbon between the first and second S/D regions in the first nanoribbon, and a second gate stack, not electrically coupled to the first gate stack, at least partially surrounding a portion of the second nanoribbon between the first and second S/D regions in the second nanoribbon. The device further includes a bitline coupled to the first S/D regions of both the first and second nanoribbons.