公开(公告)号：US20220384705A1

公开(公告)日：2022-12-01

申请号：US17883508

申请日：2022-08-08

Applicant: Applied Materials, Inc.

Inventor： Mingwei Zhu ,  Zihao Yang ,  Nag B. Patibandla ,  Ludovic Godet ,  Yong Cao ,  Daniel Lee Diehl ,  Zhebo Chen

IPC: H01L39/24 ,  H01L39/12 ,  H01L39/22 ,  C23C14/54 ,  C23C14/34

Abstract: A physical vapor deposition system includes a chamber, three target supports to targets, a movable shield positioned having an opening therethrough, a workpiece support to hold a workpiece in the chamber, a gas supply to deliver nitrogen gas and an inert gas to the chamber, a power source, and a controller. The controller is configured to move the shield to position the opening adjacent each target in turn, and at each target cause the power source to apply power sufficient to ignite a plasma in the chamber to cause deposition of a buffer layer, a device layer of a first material that is a metal nitride suitable for use as a superconductor at temperatures above 8° K on the buffer layer, and a capping layer, respectively.

公开(公告)号：US11512385B2

公开(公告)日：2022-11-29

申请号：US16715906

申请日：2019-12-16

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen ,  Morgan Evans ,  Jinxin Fu

IPC: G03F7/20 ,  C23C14/22 ,  G02B5/18 ,  G03F7/00 ,  G03F7/16 ,  F21V8/00

Abstract: Embodiments of the disclosure generally relate to methods of forming gratings. The method includes depositing a resist material on a grating material disposed over a substrate, patterning the resist material into a resist layer, projecting a first ion beam to the first device area to form a first plurality of gratings, and projecting a second ion beam to the second device area to form a second plurality of gratings. Using a patterned resist layer allows for projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area.

公开(公告)号：US11289361B2

公开(公告)日：2022-03-29

申请号：US16183896

申请日：2018-11-08

Applicant: Applied Materials, Inc.

Inventor： Ludovic Godet ,  Rutger Meyer Timmerman Thijssen

IPC: B25B11/00 ,  H01L21/683 ,  H01L21/687 ,  F21V8/00

Abstract: Embodiments described herein relate to a substrate chucking apparatus having a plurality of cavities formed therein. The cavities are formed in a body of the chucking apparatus and a plurality of support elements extend from the body and separate each of the plurality of cavities. In one embodiment, a first plurality of ports are formed in a top surface of the body and extend to a bottom surface of the body through one or more of the plurality of support elements. In another embodiment, a second plurality of ports are formed in a bottom surface of the plurality of cavities and extend through the body to a bottom surface of the body. In yet another embodiment, a first electrode assembly is disposed adjacent the top surface of the body within each of the plurality of support elements and a second electrode assembly is disposed within the body adjacent each of the plurality of cavities.

公开(公告)号：US11226556B2

公开(公告)日：2022-01-18

申请号：US16844636

申请日：2020-04-09

Applicant: Applied Materials, Inc.

Inventor： Ludovic Godet ,  Chien-An Chen ,  Brian Alexander Cohen ,  Wayne McMillan ,  Ian Matthew McMackin

IPC: G03F7/00 ,  H01L21/311 ,  G02B6/34

Abstract: Methods for patterning of multi-depth layers for the fabrication of optical devices are provided. In one embodiment, a method is provided that includes disposing a resist layer over a device layer disposed over a top surface of a substrate, the device layer having a first portion and a second portion, patterning the resist layer to form a first resist layer pattern having a plurality of first openings and a second resist layer pattern having a plurality of second openings, and etching exposed portions of the device layer defined by the plurality of first openings and the plurality of second openings, wherein the plurality of first openings are configured to form at least a portion of a plurality of first structures within the optical device, and the plurality of second openings are configured to form at least a portion of a plurality of second structures within the optical device.

公开(公告)号：US11226440B2

公开(公告)日：2022-01-18

申请号：US16735603

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Yongan Xu ,  Rutger Meyer Timmerman Thijssen ,  Jinrui Guo ,  Ludovic Godet

IPC: G02B5/18 ,  G03F7/20 ,  G03F1/42

Abstract: A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.

公开(公告)号：US11226439B2

公开(公告)日：2022-01-18

申请号：US16228205

申请日：2018-12-20

Applicant: APPLIED Materials, Inc.

Inventor： Joseph C. Olson ,  Ludovic Godet ,  Costel Biloiu

IPC: G02B5/18 ,  G02B6/136

Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.

公开(公告)号：US11222809B2

公开(公告)日：2022-01-11

申请号：US16993069

申请日：2020-08-13

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Visweswaren Sivaramakrishnan ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/687

Abstract: Embodiments described herein relate to a substrate chucking apparatus having a plurality of cavities formed therein. The cavities are formed in a body of the chucking apparatus. In one embodiment, a first plurality of ports are formed in a chucking surface of the body and extend to a bottom surface of the body. In another embodiment, a second plurality of ports are formed in a bottom surface of the plurality of cavities and extend through the body to a bottom surface of the body.

公开(公告)号：US10921721B1

公开(公告)日：2021-02-16

申请号：US16596237

申请日：2019-10-08

Applicant: Applied Materials, Inc.

Inventor： Jinxin Fu ,  Yifei Wang ,  Yongan Xu ,  Ludovic Godet

IPC: G03F7/20 ,  G03F9/00 ,  G01D5/38 ,  G02B5/18

Abstract: Embodiments of the present disclosure include measurement systems and grating pattern arrays. The measurement systems include multiple subsystems for creating diffraction patterns or magnified real images of grating regions on a substrate. The measurements systems are configured to reflect and transmit light, and the reflected and transmitted beams create diffraction patterns and enlarged images. The diffraction patterns and images provide information on grating pitch and angles of grating regions. Grating pattern arrays disposed on a substrate include main regions and reference regions. The reference regions are used to locate corresponding main regions. The measurement systems do not include a rotating stage, and thus precise control of rotation of a stage is not needed.

公开(公告)号：US10818472B2

公开(公告)日：2020-10-27

申请号：US16716954

申请日：2019-12-17

Applicant: Applied Materials, Inc.

Inventor： Ludovic Godet ,  Rutger Meyer Timmerman Thijssen ,  Kartik Ramaswamy ,  Yang Yang ,  Manivannan Thothadri ,  Chien-An Chen

IPC: H01J37/305 ,  H01J37/32 ,  H01J37/073 ,  G02B6/13 ,  H01J37/147 ,  H01L21/3065 ,  G02B5/18 ,  H01J37/05 ,  G02B6/12 ,  G02B6/124 ,  G06T19/00 ,  H01J37/304

Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

公开(公告)号：US10811303B2

公开(公告)日：2020-10-20

申请号：US16259175

申请日：2019-01-28

Applicant: Applied Materials, Inc.

Inventor： Pramit Manna ,  Ludovic Godet ,  Rui Cheng ,  Erica Chen ,  Ziqing Duan ,  Abhijit Basu Mallick ,  Srinivas Gandikota

IPC: H01L21/762 ,  H01L21/02 ,  H01L21/768 ,  H01L23/31 ,  H01L29/06

Abstract: Methods for seam-less gapfill comprising sequentially depositing a film with a seam, reducing the height of the film to remove the seam and repeating until a seam-less film is formed. Some embodiments include optional film doping and film treatment (e.g., ion implantation and annealing).