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    METHOD FOR SUBSTANTIALLY UNIFORM COPPER DEPOSITION ONTO SEMICONDUCTOR WAFER
    11.
    发明申请
    METHOD FOR SUBSTANTIALLY UNIFORM COPPER DEPOSITION ONTO SEMICONDUCTOR WAFER 审中-公开
    用于将半导体沉积物沉积到半导体晶体上的方法

    公开(公告)号：US20110259752A1

    公开(公告)日：2011-10-27

    申请号：US13119125

    申请日：2008-09-16

    申请人： Yue Ma ,  Xi Wang ,  Chuan He ,  Hui Wang

    发明人： Yue Ma ,  Xi Wang ,  Chuan He ,  Hui Wang

    IPC分类号： C25D7/12

    CPC分类号： C25D5/08 ,  C25D5/18 ,  C25D7/123 ,  C25D17/001 ,  C25D17/12 ,  C25D21/12 ,  H01L21/2885

    摘要： The methods practiced in an electrochemical deposition apparatus with two or more electrodes, described in earlier inventions, are disclosed. The methods produce uniform copper films with WFNU less than 2.5% on semiconductor wafers bearing a resistive copper seed layer with a thickness ranging from 50 to 9O0 A in a copper sulfate based electrolyte whose conductivity is between 0.02 to 0.8 S/cm.

    摘要翻译： 公开了在具有两个或多个电极的电化学沉积设备中实施的方法，其在先前的发明中描述。 该方法在导电率为0.02至0.8S / cm的硫酸铜基电解质中，在半导体晶片上产生厚度范围为50至90的电阻铜籽晶层的WFNU小于2.5％的均匀铜膜。

    SOLUTION PREPARATION APPARATUS AND METHOD FOR TREATING INDIVIDUAL SEMICONDUCTOR WORKPIECE
    12.
    发明申请
    SOLUTION PREPARATION APPARATUS AND METHOD FOR TREATING INDIVIDUAL SEMICONDUCTOR WORKPIECE 审中-公开
    解决方案制备设备和处理个人半导体工件的方法

    公开(公告)号：US20110079247A1

    公开(公告)日：2011-04-07

    申请号：US12736178

    申请日：2008-03-17

    申请人： Yue Ma ,  Chuan He ,  Guangtao Shi ,  Voha Nuch ,  Hui Wang

    发明人： Yue Ma ,  Chuan He ,  Guangtao Shi ,  Voha Nuch ,  Hui Wang

    IPC分类号： B08B3/00

    CPC分类号： H01L21/6715 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67253

    摘要： The invention discloses a low-cost apparatus for chemical solution preparation with controlled process parameters such as chemical age, temperature, yield of active ingredients at the point of use. In addition, this apparatus provides chamber-to-chamber consistency on these parameters across multiple processing chambers on a single wafer wet-clean system. The invention also discloses a method to use chemical solution mixture resident time to achieve optimal combined effect of temperature, reactivity and yield of active ingredients of chemical solution mixture for best wafer treatment results.

    摘要翻译： 本发明公开了一种用于化学溶液制备的低成本装置，其具有受控的工艺参数，例如化学年龄，温度，使用时活性成分的产率。 此外，该装置在单个晶片湿清洁系统上的多个处理室上提供这些参数的腔室与室之间的一致性。 本发明还公开了一种使用化学溶液混合物驻留时间来实现化学溶液混合物的活性成分的温度，反应性和产率的最佳组合效果的方法，以获得最佳的晶片处理结果。

    TURBO SPEED SENSOR DIAGNOSTIC FOR TURBOCHARGED ENGINES
    13.
    发明申请
    TURBO SPEED SENSOR DIAGNOSTIC FOR TURBOCHARGED ENGINES 有权
    涡轮速度传感器用于涡轮发动机的诊断

    公开(公告)号：US20090055072A1

    公开(公告)日：2009-02-26

    申请号：US12141329

    申请日：2008-06-18

    申请人： Chuan He ,  Yun Xiao

    发明人： Chuan He ,  Yun Xiao

    IPC分类号： F01N11/00

    CPC分类号： F02D41/0007 ,  F02D41/222 ,  Y02T10/144 ,  Y02T10/40

    摘要： A method of diagnosing operation of a turbo speed sensor that monitors a turbocharger in an internal combustion engine system includes determining whether the engine system is operating in one of a high speed and a low speed range and determining a threshold turbo speed value based on whether engine system is operating in one of the high speed and the low speed range. An actual turbo speed value of the turbocharger is monitored based on a signal generated by the turbo speed sensor. The actual turbo speed value is compared to the threshold turbo speed value and a diagnostic signal is generated based on the step of comparing.

    摘要翻译： 一种诊断内燃机系统中的涡轮增压器的涡轮速度传感器的操作的方法包括：确定发动机系统是否以高速和低速范围中的一个运行，并且基于发动机是否确定阈值涡轮转速值 系统运行在高速和低速范围之一。 基于由涡轮转速传感器产生的信号来监测涡轮增压器的实际涡轮转速值。 将实际的turbo速度值与阈值turbo速度值进行比较，并且基于比较步骤生成诊断信号。

    High numerical aperture optical focusing device having a conical incident facet and a parabolic reflector for use in data storage systems
    15.
    发明授权
    High numerical aperture optical focusing device having a conical incident facet and a parabolic reflector for use in data storage systems 有权
    具有锥形入射面和用于数据存储系统的抛物面反射器的高数值孔径光学聚焦装置

    公开(公告)号：US06377535B1

    公开(公告)日：2002-04-23

    申请号：US09179279

    申请日：1998-10-26

    申请人： Hong Chen ,  Chuan He ,  Carl J. Carlson ,  Joseph J. Miceli, Jr. ,  Charles C. Cheng ,  Yugang Wang

    发明人： Hong Chen ,  Chuan He ,  Carl J. Carlson ,  Joseph J. Miceli, Jr. ,  Charles C. Cheng ,  Yugang Wang

    IPC分类号： G11B7135

    CPC分类号： G11B11/10554 ,  B82Y10/00 ,  G02B5/1876 ,  G02B5/1885 ,  G11B7/122 ,  G11B7/1353 ,  G11B7/1372 ,  G11B7/1374 ,  G11B7/22 ,  G11B11/10532 ,  G11B11/10543 ,  G11B11/1058 ,  G11B2007/13722

    摘要： An optical focusing device for focusing an incident optical beam onto a focal plane, as a focal spot. The optical focusing device includes an incident central refractive facet upon which an optical beam impinges, and a high-index glass body through which the incident optical beam passes toward a bottom reflective surface. The bottom reflective surface reflects the optical beam through the body, toward a peripheral reflector. The peripheral reflector focuses the optical beam toward a focal plane on which the focal spot is formed. The focal plane is defined within a pedestal that forms part of the optical focusing device, and that extends from the bottom reflective surface. The central facet is conically shaped for refracting the incident optical beam away from the pedestal, onto the bottom reflective surface. The peripheral reflector surrounds the central facet and can have various appropriate shapes, such as an aspherical shape or a tilted parabolic shape, which compensates for the conical factor and aberrations introduced by the central facet. The top surface includes the central facet and the peripheral facet, and can be made substantially flat using diffractive optical elements or Fresnel optics.

    摘要翻译： 一种用于将入射光束聚焦到焦平面上的聚焦装置作为焦点。 光聚焦装置包括光束入射的入射中心折射面和入射光束通过其朝向底部反射表面的高折射率玻璃体。 底部反射表面将光束通过主体反射到外围反射器。 外围反射器将光束聚焦到其上形成焦点的焦平面上。 焦平面被限定在形成光学聚焦装置的一部分的基座内，并且从底部反射表面延伸。 中心小面是圆锥形的，用于将入射光束从基座折回到底部反射表面上。 外围反射器围绕中心小平面并且可以具有各种适当的形状，例如非球面形状或倾斜的抛物线形状，其补偿由中心小面引入的锥形因子和像差。 顶表面包括中心小面和外围小面，并且可以使用衍射光学元件或菲涅耳光学器件使其基本上平坦。

    Wafer processing techniques for near field magneto-optical head
    16.
    发明授权
    Wafer processing techniques for near field magneto-optical head 有权
    近场磁光头的晶片处理技术

    公开(公告)号：US6094803A

    公开(公告)日：2000-08-01

    申请号：US234615

    申请日：1999-01-21

    申请人： Carl Carlson ,  Joseph Miceli ,  Hong Chen ,  Chuan He ,  Charles C. Cheng ,  Ross W Stovall

    发明人： Carl Carlson ,  Joseph Miceli ,  Hong Chen ,  Chuan He ,  Charles C. Cheng ,  Ross W Stovall

    IPC分类号： G11B7/135 ,  G11B7/22 ,  G11B11/105 ,  H01F41/02

    CPC分类号： G11B7/1387 ,  G11B11/10536 ,  G11B11/10554 ,  G11B7/22 ,  G11B11/1058 ,  Y10T29/4902 ,  Y10T29/49041

    摘要： A method of making and self-aligning a disk data storage read/write head that uses a catadioptric focusing device (or lens) having a high numerical aperture (NA), which does not introduce significant spot aberration on a storage medium. The manufacturing process of the head is carried out at a wafer level, and is facilitated significantly by the flatness of the focusing device. An exemplary manufacturing process is implemented as follows: A lens coil/plate is formed by molding a flat optical substrate to form the desired lens shapes. Coil cavities or depressions are formed simultaneously with the lens to accommodate a coil. Conductive plugs are formed in proximity to cutting lines for wire bonding attachment to the coil. A slider wafer is formed and bonded to the lens/coil wafer. Coils and pedestals are also formed on the lens/coil plate using thin-film processing techniques, and reflective surfaces are deposited on the bottom surface of the substrate, opposite the lens. The focusing device includes an incident surface, a reflective surface, a focal pedestal, and a body. The incident surface is generally flat and is comprised of a central diffractive, optically transmissive surface and a peripheral reflector. The peripheral reflector is comprised of a reflective-diffractive surface, or alternatively, a reflective-kinoform phase profile.

    摘要翻译： 一种制造和自对准使用具有高数值孔径（NA）的反折射聚焦装置（或透镜）的盘数据存储读/写头的方法，其不会在存储介质上引入显着的像差。 头的制造过程在晶片级进行，并且由于聚焦装置的平坦度而显着地促进。 示例性制造过程如下实现：透镜线圈/板通过模制平面光学基板以形成所需的透镜形状而形成。 线圈腔或凹陷部与透镜同时形成以容纳线圈。 导电插塞形成在切割线附近，用于引线接合附接到线圈。 滑块晶片形成并结合到透镜/线圈晶片。 使用薄膜处理技术也在透镜/线圈板上形成线圈和基座，并且反射表面沉积在与透镜相对的基板的底表面上。 聚焦装置包括入射表面，反射表面，焦点基座和主体。 入射表面通常是平坦的，并且由中心衍射，光学透射表面和外围反射器组成。 外围反射器由反射衍射表面或者反射型kinoform相位轮廓构成。

    Method and apparatus for thermal treatment of semiconductor workpieces
    19.
    发明授权
    Method and apparatus for thermal treatment of semiconductor workpieces 有权
    半导体工件热处理方法和装置

    公开(公告)号：US08383429B2

    公开(公告)日：2013-02-26

    申请号：US12733436

    申请日：2007-08-29

    申请人： Yue Ma ,  Chuan He ,  Zhenxu Pang ,  David Wang ,  Voha Nuch

    发明人： Yue Ma ,  Chuan He ,  Zhenxu Pang ,  David Wang ,  Voha Nuch

    IPC分类号： H01L21/00

    CPC分类号： H01L21/324 ,  F27B17/0025 ,  H01L21/67109 ,  H01L21/6719

    摘要： The present invention provides an apparatus and method for rapid and uniform thermal treatment of semiconductor workpieces in two closely arranged thermal treatment chambers with a retractable door between them. The retractable door moves in between two thermal treatment chambers during heating or cooling process, and additional heating and cooling sources are provided for double-side thermal treatment of the semiconductor workpiece.

    摘要翻译： 本发明提供了一种用于在两个紧密布置的热处理室中快速均匀地热处理半导体工件的装置和方法，其间具有可伸缩门。 可伸缩门在加热或冷却过程中在两个热处理室之间移动，并且为半导体工件的双面热处理提供附加的加热和冷却源。