Abstract:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.
Abstract:
Methods and apparatus are provided for generating an animated message. Input objects in an image of the animated message are recognized, and input information, including information about an input time and input coordinates for the input objects, is extracted. Playback information, including information about a playback order of the input objects, is set. The image is displayed in a predetermined handwriting region of the animated message. An encoding region, which is allocated in a predetermined portion of the animated message and in which the input information and the playback information are stored, is divided into blocks having a predetermined size. Display information of the encoding region is generated by mapping the input information and the playback information to the blocks in the encoding region. An animated message including the predetermined handwriting region and the encoding region is generated. The generated animated message is transmitted.
Abstract:
A hardmask composition for processing a resist underlayer film includes a solvent and an organosilane polymer, wherein the organosilane polymer is represented by Formula 6: In Formula 6, R is methyl or ethyl, R′ is substituted or unsubstituted cyclic or acyclic alkyl, Ar is an aromatic ring-containing functional group, x, y and z satisfy the relations x+y=4, 0.4≦x≦4, 0≦y≦3.6, and 4×10−4≦z≦1, and n is from about 3 to about 500.
Abstract:
A composition includes a boron-containing hydrogen silsesquioxane polymer having a structure that includes: silicon-oxygen-silicon units, and oxygen-boron-oxygen linkages in which the boron is trivalent, wherein two silicon-oxygen-silicon units are covalently bound by an oxygen-boron-oxygen linkage therebetween.
Abstract:
A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y (A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.
Abstract:
A character input method using a touch screen, in which one or more areas requiring user input is defined in the touch screen, pre-recognized information is defined for each of the defined areas, character information is received by a user in one or more user desired areas among the defined areas, the character information is recognized using a character recognizer, and the recognized character information is updated in the user desired areas.
Abstract:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: (a) a polymer mixture including a first polymer that includes one or more of the following monomeric units wherein A is a bivalent radical selected from the group consisting of carbonyl, oxy, alkylene, fluoroalkylene, phenyldioxy, and any combination thereof; R1 and R2 are each independently a bivalent radical selected from the group consisting of an alkylene, an arylene, and any combination thereof; and x, y, and z are 0 or integers; and a second polymer including an aryl group; (b) a crosslinking component; and (c) an acid catalyst.
Abstract:
Provided herein are hardmask compositions for resist underlayer films, wherein in some embodiments, the hardmask compositions include (a) a first polymer prepared by the reaction of a compound of Formula 1 wherein n is a number of 3 to 20, with a compound of Formula 2 (R)m—Si—(OCH3)4-m (2) wherein R is a monovalent organic group and m is 0, 1 or 2; (b) a second polymer that includes at least one of the structures represented by Formulae 3-6; (c) an acid or base catalyst; and (d) an organic solvent. Further provided herein are methods for producing a semiconductor integrated circuit device using a hardmask composition according to an embodiment of the present invention. In addition, provided herein are semiconductor integrated circuit devices produced by a method embodiment of the invention.
Abstract:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: (a) a polymer component including at least one polymer having a monomeric unit of Formula (I) wherein R1 and R2 may each independently be hydrogen, hydroxyl, alkyl, aryl, allyl, halo, or any combination thereof; R3 and R4 may each independently be hydrogen, a crosslinking functionality, a chromophore, or any combination thereof; R5 and R6 may each independently be hydrogen or an alkoxysilane group; R7 may each independently be hydrogen, alkyl, aryl, allyl, or any combination thereof; and n may be a positive integer; (b) a crosslinking component; and (c) an acid catalyst.
Abstract translation:提供了具有抗平滑印刷工艺中有用的抗反射性能的硬掩模组合物,其使用方法以及通过这些方法制造的半导体器件。 本发明的抗反射硬掩模组合物包括:(a)包含至少一种具有式(I)的单体单元的聚合物的聚合物组分,其中R 1和R 2各自 独立地是氢,羟基,烷基,芳基,烯丙基,卤素或其任何组合; R 3和R 4可各自独立地为氢,交联官能团,发色团或其任何组合; R 5和R 6可各自独立地为氢或烷氧基硅烷基; R 7可各自独立地为氢,烷基,芳基,烯丙基或其任何组合; n可以是正整数; (b)交联组分; 和(c)酸催化剂。
Abstract:
A method and a portable terminal for identifying a counterfeit bill. The method includes receiving, by the portable terminal, an image of a bill photographed using visible rays and an image of the bill photographed using infrared rays; determining a denomination of the bill by comparing the image photographed using the visible rays with a denomination database; obtaining correction information for making the image photographed using the visible rays correspond to a corresponding bill image in the denomination database; forming a corrected image by correcting the image photographed using the infrared rays using the correction information; binary-coding the corrected image; and determining whether the bill is counterfeit by comparing the binary-coded corrected image with an image of the corresponding bill pre-stored in a genuine bill database.