Surface Micromachining Process of MEMS Ink Jet Drop Ejectors On Glass Substrates
    11.
    发明申请
    Surface Micromachining Process of MEMS Ink Jet Drop Ejectors On Glass Substrates 有权
    MEMS墨滴喷射器在玻璃基板上的表面微加工工艺

    公开(公告)号:US20110003405A1

    公开(公告)日:2011-01-06

    申请号:US12495827

    申请日:2009-07-01

    IPC分类号: H01L21/30

    CPC分类号: B81C1/00158 Y10T29/42

    摘要: Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.

    摘要翻译: 用于形成膜的方法和装置包括提供玻璃基板,以及在玻璃基板上沉积薄层的铬。 图案化薄层的铬以形成偏转电极和互连引线。 在图案化的铬层的顶部上沉积铝的牺牲层,然后将牺牲层图案化以限定锚定区域。 在牺牲层的顶部,沉积厚厚的铬层,并且将厚的铬层图案化以形成膜。 然后蚀刻牺牲层以释放膜。

    Full width array mechanically tunable spectrophotometer
    13.
    发明授权
    Full width array mechanically tunable spectrophotometer 有权
    全宽阵列机械可调分光光度计

    公开(公告)号:US07333208B2

    公开(公告)日:2008-02-19

    申请号:US11016952

    申请日:2004-12-20

    IPC分类号: G01J3/45 G01B11/02 G01B9/02

    摘要: Apparatus and methods are provided for implementing a full width array material scanning spectrophotometer by integrating a Fabry-Perot cavity filter with a silicon photodetector and a light focusing device (an optical guide or a SELFOC® lens). The material to be scanned is illuminated by a broad band illumination source (white LEDs or a fluorescence light source). The Fabry-Perot cavity gap can be tuned electromechanically to get multiple measurements to resolve the spectral distribution of the transmitted light signal. The array spectrophotometric architecture facilitates an elongated, substantially linear band detection and the associated spectral reconstruction technique resolves spectral distribution in the presence of multiple resonant peaks.

    摘要翻译: 提供了通过将法布里 - 珀罗腔滤波器与硅光电检测器和光聚焦装置(光导或透镜)集成来实现全宽阵列材料扫描分光光度计的装置和方法。 待扫描的材料由宽带照明源(白色LED或荧光光源)照明。 法布里 - 珀罗腔间隙可以机电调整以获得多次测量,以解决透射光信号的光谱分布。 阵列分光光度结构有助于细长的,基本上线性的带检测,并且相关的光谱重建技术在存在多个共振峰的情况下解决了光谱分布。

    Monolithic reconfigurable optical multiplexer systems and methods
    14.
    发明授权
    Monolithic reconfigurable optical multiplexer systems and methods 失效
    单片可重构光复用器系统和方法

    公开(公告)号:US06990265B2

    公开(公告)日:2006-01-24

    申请号:US10721849

    申请日:2003-11-25

    IPC分类号: G02B6/26

    摘要: A micro-optical device having an aligned waveguide switch. The device includes a stationary input part, a stationary output part and a movable part. The stationary input part and the stationary output part each have a plurality of input and output waveguides, respectively. The movable part has a plurality of switching waveguides and is movable relative to the stationary input and output parts. A stop block limits movement of the movable part in order to align at least one of the switching waveguides with the applicable input waveguide(s) and output waveguide(s). The movement of the movable part is substantially transverse.

    摘要翻译: 具有对准的波导开关的微型光学器件。 该装置包括固定输入部分,固定输出部分和可动部分。 固定输入部分和固定输出部分别分别具有多个输入和输出波导。 可移动部件具有多个开关波导,并且可相对于固定的输入和输出部件移动。 止动块限制了可移动部件的移动,以便将至少一个开关波导与可应用的输入波导和输出波导对准。 可移动部件的运动基本上是横向的。

    Bistable microelectromechanical system based structures, systems and methods
    15.
    发明授权
    Bistable microelectromechanical system based structures, systems and methods 失效
    双稳态微机电系统的结构,系统和方法

    公开(公告)号:US06828887B2

    公开(公告)日:2004-12-07

    申请号:US10063762

    申请日:2002-05-10

    IPC分类号: H01H5122

    摘要: A bistable microelectromechanical system (MEMS) based system comprises a micromachined beam having a first stable state, in which the beam is substantially stress-free and has a specified non-linear shape, and a second stable state. The curved shape may comprises a simple curve or a compound curve. In embodiments, the boundary conditions for the beam are fixed boundary conditions, bearing boundary conditions, spring boundary conditions, or a combination thereof. The system may further comprise an actuator arranged to move the beam between the first and second stable states and a movable element that is moved between a first position and a second position in accordance with the movement of the beam between the first and second stable states. The actuator may comprise one of a thermal actuator, an electrostatic actuator, a piezoelectric actuator and a magnetic actuator. The actuator may further comprise a thermal impact actuator or a zippering electrostatic actuator.

    摘要翻译: 基于双稳态微机电系统(MEMS)的系统包括具有第一稳定状态的微加工梁,其中梁基本上无应力且具有特定的非线性形状和第二稳定状态。 弯曲形状可以包括简单曲线或复合曲线。 在实施例中,梁的边界条件是固定的边界条件,轴承边界条件,弹簧边界条件或其组合。 系统还可以包括致动器,其被布置成在第一和第二稳定状态之间移动梁,以及根据梁在第一和第二稳定状态之间的移动而在第一位置和第二位置之间移动的可动元件。 致动器可以包括热致动器,静电致动器,压电致动器和磁致动器中的一个。 致动器还可以包括热冲击致动器或拉链静电致动器。

    Spacing compensating electrostatic voltmeter
    16.
    发明授权
    Spacing compensating electrostatic voltmeter 失效
    间距补偿静电电压表

    公开(公告)号:US06806717B2

    公开(公告)日:2004-10-19

    申请号:US10225555

    申请日:2002-08-21

    IPC分类号: G01R2912

    CPC分类号: G01R29/12

    摘要: An electrostatic type voltmeter for measuring the potential on a surface, the voltmeter including a probe; a support for supporting the probe in spaced relationship with the surface, the probe having a plurality of spacing element sites thereon for measuring a distance between each of the plurality of spacing element sites and a corresponding area on the surface opposite of each of the plurality of spacing element sites; a plurality of electrostatic element sites, intermixed and adjacent to the plurality of spacing element sites on the probe, for measuring a voltage between each of the plurality of spacing element sites and an area on the surface adjacent to the corresponding area opposite of each of the plurality of spacing element sites. A processor for compensating an output signal of the probe in response to the measurements received from the plurality of spacing element sites and the plurality of electrostatic element sites.

    摘要翻译: 一种用于测量表面上的电位的静电型电压表,所述电压表包括探针; 用于支撑所述探针与所述表面间隔开的关系,所述探针在其上具有多个间隔元件位置,用于测量所述多个间隔元件位置中的每一个之间的距离以及与所述多个 间距单元; 多个静电元件位置,与探针上的多个间隔元件位置相互混合并相邻,用于测量多个间隔元件位置中的每一个之间的电压,以及与相邻区域相对的相应区域相邻的表面上的区域 多个间距元件位置。 一种处理器,用于响应于从多个间隔元件位置和多个静电元件位点接收的测量值来补偿探针的输出信号。

    Micro-optoelectromechanical system based device with aligned structures and method for fabricating same
    19.
    发明授权
    Micro-optoelectromechanical system based device with aligned structures and method for fabricating same 失效
    具有对准结构的微光电机电系统装置及其制造方法

    公开(公告)号:US06510275B1

    公开(公告)日:2003-01-21

    申请号:US09986399

    申请日:2001-11-08

    IPC分类号: G02B600

    摘要: A micro-optoelectromechanical system based device with aligned structures comprises at least one optical structure formed in a silicon layer of the device and at least one optical fiber connection structure that is self-aligned with the at least one optical structure. In embodiments, the at least one optical fiber connection structure is formed in a substrate of the device and may comprise a V-groove. In other embodiments, the at least one optical structure may comprise a waveguide. A nitride layer may be formed on at least a portion of the waveguide. In various embodiments, the silicon layer may be a single-crystal-silicon layer of a silicon-on-insulator wafer. A method for fabricating a micro-optoelectromechanical system based device with aligned structures is provided in which the at least one optical structure and the at least one optical fiber connection structure are defined using the same masking layer.

    摘要翻译: 具有对准结构的基于微光机电系统的器件包括形成在器件的硅层中的至少一个光学结构以及与所述至少一个光学结构自对准的至少一个光纤连接结构。 在实施例中,至少一个光纤连接结构形成在器件的衬底中,并且可以包括V形槽。 在其他实施例中,所述至少一个光学结构可以包括波导。 可以在波导的至少一部分上形成氮化物层。 在各种实施例中,硅层可以是绝缘体上硅晶片的单晶硅层。 提供一种用于制造具有对准结构的基于微光机电系统的装置的方法,其中使用相同的掩模层限定所述至少一个光学结构和所述至少一个光纤连接结构。

    Process for manufacture of microoptomechanical structures
    20.
    发明授权
    Process for manufacture of microoptomechanical structures 有权
    微机电结构的制造工艺

    公开(公告)号:US06379989B1

    公开(公告)日:2002-04-30

    申请号:US09468141

    申请日:1999-12-21

    IPC分类号: H01L2100

    CPC分类号: G02B6/43 G02B6/4214

    摘要: A microoptomechanical structure produced by defining a microoptical structure in a single-crystal silicon layer separated by an insulator layer from a handle wafer, such as a SOI wafer, selectively etching the single crystal silicon layer, depositing a sacrificial oxide layer on the etched single crystal silicon layer, depositing and etching a polysilicon layer on the sacrificial oxide layer, with remaining polysilcon forming hinge elements, and releasing formed microoptical structures. Embodiments use an oxide as an insulator, and other embodiments provide for wafer bonding of the silicon layer to the insulator layer.

    摘要翻译: 通过在由诸如SOI晶片的处理晶片分离的绝缘体层的单晶硅层中限定微光学结构而产生的微机电结构,选择性地蚀刻单晶硅层,在蚀刻的单晶上沉积牺牲氧化物层 硅层,沉积和蚀刻牺牲氧化物层上的多晶硅层,形成铰链元件,并释放形成的微光学结构。 实施例使用氧化物作为绝缘体,并且其它实施例提供硅层与绝缘体层的晶片结合。