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公开(公告)号：US08351022B2
公开(公告)日：2013-01-08
申请号：US12774284
申请日：2010-05-05
Applicant: Wilhelmus Petrus De Boeij , Leon Martin Levasier
Inventor： Wilhelmus Petrus De Boeij , Leon Martin Levasier
CPC classification number: G03B27/54 , G03F7/7025
Abstract: A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.
Abstract translation: 用于控制光刻设备中的辐射束的性质的辐射束修改设备包括设置有多个孔的柔性片和包括第一可旋转构件和第二可旋转构件的定位装置，其中第一端部 柔性片联接到第一可旋转构件，柔性片的第二端部联接到第二可旋转构件，并且柔性片的中心部分在第一可旋转构件和第二可旋转构件之间延伸。 孔可用于控制光刻设备的投影系统的数值孔径。
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公开(公告)号：US07859686B2
公开(公告)日：2010-12-28
申请号：US12426713
申请日：2009-04-20
Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC: G01B11/14
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
Abstract translation: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。
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公开(公告)号：US20100220335A1
公开(公告)日：2010-09-02
申请号：US12781202
申请日：2010-05-17
Applicant: Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
Abstract translation: 一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。
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公开(公告)号：US07528965B2
公开(公告)日：2009-05-05
申请号：US11902786
申请日：2007-09-25
Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC: G01B11/14
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
Abstract translation: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。
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公开(公告)号：US07271917B2
公开(公告)日：2007-09-18
申请号：US11120193
申请日：2005-05-03
Applicant: Edwin Teunis Van Donkelaar , Evert Hendrink Jan Draaijer , Leon Martin Levasier , Nicolas Alban Lallemant , Gerardus Martinus Antonius De Rooij
Inventor： Edwin Teunis Van Donkelaar , Evert Hendrink Jan Draaijer , Leon Martin Levasier , Nicolas Alban Lallemant , Gerardus Martinus Antonius De Rooij
IPC: G01B11/02
CPC classification number: G03F7/70858 , G03F7/70775
Abstract: A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.
Abstract translation: 光刻设备包括位置量确定系统，用于确定至少部分地被包括流体的区域包围的可操作部件的位置量。 位置量确定系统包括干涉仪系统，用于确定该区域中的流体的物理量的总体值的全局传感器，以及局部传感器，用于确定该部分中的流体的物理量的局部值 区。 位置量确定系统被配置为从干涉仪的输出，物理量的总体值和物理量的局部值确定位置量。 物理量可以包括压力，温度等。局部物理量确定系统可以包括传感器，例如高速传感器，计算流体动力学模型或线性近似模型。
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Patent Agency Ranking
16.发明授权Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby 有权具有对准子系统的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07002667B2
公开(公告)日：2006-02-21
申请号：US10736230
申请日：2003-12-16
Applicant: Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
Inventor： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
CPC classification number: G03F9/7003 , G03F9/7049 , G03F9/7076
Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
Abstract translation: 根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。 对准结构包括非周期性特征，其可以被检测为例如。 在对准子系统中使用参考光栅的捕获位置或检查位置。 非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。
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公开(公告)号：US08797504B2
公开(公告)日：2014-08-05
申请号：US13408471
申请日：2012-02-29
Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
Inventor： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC classification number: G03F7/70933 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
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公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
Applicant: Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
Inventor： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
CPC classification number: G03F7/709 , G03F7/70808
Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
Abstract translation: 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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19.发明申请公开(公告)号：US20100231890A1
公开(公告)日：2010-09-16
申请号：US12531230
申请日：2008-03-14
Applicant: Alex Oudshoorn , Roland Blok , Erik Roelof Loopstra , Leon Martin Levasier
Inventor： Alex Oudshoorn , Roland Blok , Erik Roelof Loopstra , Leon Martin Levasier
IPC: G03B27/32
CPC classification number: G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
Abstract: The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
Abstract translation: 本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数 的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。 本发明还涉及光刻设备和计算机程序。
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公开(公告)号：US07542127B2
公开(公告)日：2009-06-02
申请号：US11312660
申请日：2005-12-21
Applicant: Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
Inventor： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
CPC classification number: G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
Abstract translation: 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。
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