公开(公告)号：US5496142A

公开(公告)日：1996-03-05

申请号：US94674

申请日：1993-07-20

申请人： Mark A. Fodor ,  Craig Bercaw ,  Charles Dornfest

发明人： Mark A. Fodor ,  Craig Bercaw ,  Charles Dornfest

IPC分类号： F16B1/00 ,  F16B43/00 ,  F16B39/24 ,  F16B43/02 ,  H01R4/38

CPC分类号： F16B43/004 ,  F16B2001/0064 ,  Y10S411/916

摘要： A slotted conical (non-flat) spring washer with an encircling ring provides improved spring washer performance. A split or slotted conical spring washer is encircled by a retaining ring that prevents the ends of the washer adjacent to the slot from expanding as the washer is compressed. The ends of the washer on both sides of the slot move to prevent the washer material from exceeding its yield strength. The ring restricts the radial movement of said outside diameter of the washer strip away from a center axis of the washer bore. The ring can be a counter bore in a member to be clamped, a retaining washer having an outside annular washer to act as the ring, or can be integral with the spring washer such that the slot appears not to pass completely through the washer strip.This slotted conical spring washer greatly increases the elastic spring travel available during repeated clamping cycles and during movement of clamped members due to differences in rates of thermal expansion and thermal gradients. A method for using the slotted spring washer fastening system invention assures electrical conductance and/or fluid vessel integrity under high temperatures and thermal gradients and when different materials are used in the clamped and clamping members.

摘要翻译： 带环圈的开槽锥形（非平面）弹簧垫圈提供了改进的弹簧垫圈性能。 分开或开槽的锥形弹簧垫圈由保持环包围，防止垫圈邻近槽的端部随着垫圈被压缩而膨胀。 槽的两侧的垫圈的端部移动以防止垫圈材料超过其屈服强度。 环限制了垫圈条的所述外径的径向移动远离垫圈孔的中心轴线。 环可以是待夹紧的构件中的沉孔，具有外部环形垫圈以用作环的保持垫圈，或者可以与弹簧垫圈成一体，使得狭槽看起来不能完全穿过垫圈条。 这种开槽的锥形弹簧垫圈大大增加了在重复的夹紧循环期间和由于热膨胀率和热梯度的差异而夹紧构件的运动期间可用的弹性弹簧行程。 使用开槽弹簧垫圈紧固系统的方法，确保了在高温和热梯度下的电导和/或流体容器的完整性，并且当在夹紧和夹紧构件中使用不同的材料时。

公开(公告)号：US07922440B2

公开(公告)日：2011-04-12

申请号：US12171594

申请日：2008-07-11

申请人： Dale R. Du Bois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Chiu Chan ,  Karthik Janakiraman

发明人： Dale R. Du Bois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Chiu Chan ,  Karthik Janakiraman

IPC分类号： B21B39/22 ,  B65G47/22

CPC分类号： H01L21/68 ,  Y10S414/136

摘要： The present invention comprises an apparatus and method for centering a substrate in a process chamber. In one embodiment, the apparatus comprises a substrate support having a support surface adapted to receive the placement of a substrate and a reference axis substantially perpendicular to the support surface, and a plurality of centering members extending above the support surface. Each centering member is biased into a first position and is movable to a second position by interacting with an opposing member. A movement between the first position and the second position thereby causes each centering member to releasably engage with a peripheral edge of the substrate to push the substrate in a direction toward the reference axis.

摘要翻译： 本发明包括用于使处理室中的衬底居中的装置和方法。 在一个实施例中，该装置包括具有适于接收基板的放置和基本上垂直于支撑表面的参考轴的支撑表面的基板支撑件，以及在支撑表面上方延伸的多个定心构件。 每个定心构件被偏压到第一位置，并且通过与相对构件相互作用而可移动到第二位置。 第一位置和第二位置之间的运动使得每个定心构件可释放地与基板的周缘接合，以沿着基准轴线的方向推动基板。

公开(公告)号：US20090017228A1

公开(公告)日：2009-01-15

申请号：US12171594

申请日：2008-07-11

申请人： Dale R. Du Bois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Chiu Chan ,  Karthik Janakiraman

发明人： Dale R. Du Bois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Chiu Chan ,  Karthik Janakiraman

IPC分类号： B01J19/08 ,  C23C16/54 ,  C23C16/458

CPC分类号： H01L21/68 ,  Y10S414/136

摘要： The present invention comprises an apparatus and method for centering a substrate in a process chamber. In one embodiment, the apparatus comprises a substrate support having a support surface adapted to receive the placement of a substrate and a reference axis substantially perpendicular to the support surface, and a plurality of centering members extending above the support surface. Each centering member is biased into a first position and is movable to a second position by interacting with an opposing member. A movement between the first position and the second position thereby causes each centering member to releasably engage with a peripheral edge of the substrate to push the substrate in a direction toward the reference axis.

摘要翻译： 本发明包括用于使处理室中的衬底居中的装置和方法。 在一个实施例中，该装置包括具有适于接收基板的放置和基本上垂直于支撑表面的参考轴的支撑表面的基板支撑件，以及在支撑表面上方延伸的多个定心构件。 每个定心构件被偏压到第一位置，并且通过与相对构件相互作用而可移动到第二位置。 第一位置和第二位置之间的运动使得每个定心构件可释放地与基板的周缘接合，以沿着基准轴线的方向推动基板。

公开(公告)号：US07354288B2

公开(公告)日：2008-04-08

申请号：US11145258

申请日：2005-06-03

申请人： Kazutoshi Maehara ,  Visweswaren Sivaramakrishnan ,  Kentaro Wada ,  Mark A. Fodor ,  Andrzei Kaszuba

发明人： Kazutoshi Maehara ,  Visweswaren Sivaramakrishnan ,  Kentaro Wada ,  Mark A. Fodor ,  Andrzei Kaszuba

IPC分类号： H01R4/60

CPC分类号： C23C16/4586 ,  H01L21/68757

摘要： A substrate support comprises a ceramic disc with an electrode that is chargeable through an electrode terminal. An electrical connector connects an external power source to the electrode terminal. The electrical connector has a pair of opposing pincer arms, a groove sized to fit around the electrode terminal, and a pair of through holes to receive a tightening assembly capable of tightening the opposing pincer arms about the electrode terminal.

摘要翻译： 衬底支撑件包括具有可通过电极端子充电的电极的陶瓷盘。 电连接器将外部电源连接到电极端子。 电连接器具有一对相对的钳形臂，尺寸适于围绕电极端子的凹槽和一对通孔，用于接收能够围绕电极端子紧固相对的夹持臂的紧固组件。

公开(公告)号：US5817406A

公开(公告)日：1998-10-06

申请号：US591333

申请日：1996-01-24

申请人： David W. Cheung ,  Mark A. Fodor ,  Christopher Lane ,  Ryusuke Ushikoshi ,  Hideyoshi Tsuruta ,  Tomoyuki Fujii

发明人： David W. Cheung ,  Mark A. Fodor ,  Christopher Lane ,  Ryusuke Ushikoshi ,  Hideyoshi Tsuruta ,  Tomoyuki Fujii

IPC分类号： C23C16/458 ,  H01L21/683 ,  H05B6/10 ,  B32B3/00

CPC分类号： C23C16/4586 ,  H01L21/6831 ,  Y10T428/24926

摘要： A ceramic susceptor with an embedded metal electrode. The metal electrode has multiple apertures, and the ceramic material is cross-linked through the apertures. An electrical connection to the electrode protects the electrode from the environment in the processing chamber. The ceramic may be aluminum nitride, and the metal electrode may be a mesh of molybdenum wires. To form the electrical connection, the susceptor may be heated until an eutectic forms between a conductive connector and the metal electrode. Alternately, a brazing material may be placed between the metal layer and a conductive connector.

摘要翻译： 具有嵌入式金属电极的陶瓷感受体。 金属电极具有多个孔，陶瓷材料通过孔交联。 与电极的电连接保护电极免受处理室中的环境的影响。 陶瓷可以是氮化铝，金属电极可以是钼丝网。 为了形成电连接，基座可以被加热直到在导电连接器和金属电极之间形成共晶体。 或者，钎焊材料可以放置在金属层和导电连接器之间。

公开(公告)号：US5680013A

公开(公告)日：1997-10-21

申请号：US213880

申请日：1994-03-15

申请人： Charles N. Dornfest ,  John M. White ,  Craig A. Bercaw ,  Hiroyuki Steven Tomosawa ,  Mark A. Fodor

发明人： Charles N. Dornfest ,  John M. White ,  Craig A. Bercaw ,  Hiroyuki Steven Tomosawa ,  Mark A. Fodor

IPC分类号： B01J19/00 ,  B01J19/08 ,  C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/46 ,  H01L21/30

CPC分类号： H01J37/32495 ,  H01J37/32559

摘要： Non-bonded ceramic protection is provided for metal surfaces in a plasma processing chamber, particularly heated metal electrode surfaces, in a plasma processing chamber, to prevent or inhibit attack of the heated metal surfaces by chemically aggressive species generated in the plasma during processing of materials, without bonding the ceramic material to the metal surface. In accordance with the invention the ceramic protection material comprises a thin cover material which is fitted closely, but not bonded, to the heated metal. This form of ceramic protection is particularly useful for protecting the surfaces of glow discharge electrodes and gas distribution apparatus in plasma process chambers used for processing semiconductor substrates to form integrated circuit structures. The particular ceramic material used to provide the desired protection from the gaseous species generated by the plasma are selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide.

摘要翻译： 在等离子体处理室中的等离子体处理室（特别是加热的金属电极表面）中的金属表面提供非粘合陶瓷保护，以防止或抑制在材料加工期间在等离子体中产生的化学腐蚀物质对加热的金属表面的侵蚀 ，而不将陶瓷材料粘合到金属表面。 根据本发明，陶瓷保护材料包括薄的覆盖材料，该覆盖材料与加热的金属紧密地配合但不结合。 这种形式的陶瓷保护对于保护用于处理半导体衬底的等离子体处理室中的辉光放电电极和气体分配装置的表面特别有用，以形成集成电路结构。 用于提供由等离子体产生的气态物质所需保护的特定陶瓷材料选自氮化铝，结晶氧化铝，氟化镁和烧结氧化铝。

公开(公告)号：US20090236214A1

公开(公告)日：2009-09-24

申请号：US12052431

申请日：2008-03-20

申请人： Karthik Janakiraman ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Mark A. Fodor ,  Dale R. Du Bois ,  Amit Bansal ,  Mohamad Ayoub ,  Eller Y. Juco ,  Visweswaren Sivaramakrishnan ,  Hichem M'Saad

发明人： Karthik Janakiraman ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Mark A. Fodor ,  Dale R. Du Bois ,  Amit Bansal ,  Mohamad Ayoub ,  Eller Y. Juco ,  Visweswaren Sivaramakrishnan ,  Hichem M'Saad

IPC分类号： C23C16/00 ,  H05H1/24

CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/458 ,  C23C16/4586 ,  C23C16/503 ,  C23C16/505 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32532 ,  H01J37/32541

摘要： An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.

摘要翻译： 提供了一种用于控制等离子体室中的等离子体放电的强度和分布的装置和方法。 在一个实施例中，成形电极嵌入在基板支撑件中以在腔室内提供具有径向和轴向分量的电场。 在另一个实施例中，喷头组件的面板电极被隔离器分成区域，使不同的电压能够施加到不同的区域。 此外，一个或多个电极可以嵌入在腔室侧壁中。

公开(公告)号：US20090017635A1

公开(公告)日：2009-01-15

申请号：US12171708

申请日：2008-07-11

申请人： Ashish Shah ,  Ganesh Balasubramanian ,  Dale R. Du Bois ,  Mark A. Fodor ,  Eui Kyoon Kim ,  Chiu Chan ,  Karthik Janakiraman ,  Thomas Nowak ,  Joseph C. Werner ,  Visweswaren Sivaramakrishnan ,  Mohamad Ayoub ,  Amir Al-Bayati ,  Jianhua Zhou

发明人： Ashish Shah ,  Ganesh Balasubramanian ,  Dale R. Du Bois ,  Mark A. Fodor ,  Eui Kyoon Kim ,  Chiu Chan ,  Karthik Janakiraman ,  Thomas Nowak ,  Joseph C. Werner ,  Visweswaren Sivaramakrishnan ,  Mohamad Ayoub ,  Amir Al-Bayati ,  Jianhua Zhou

IPC分类号： H01L21/302 ,  C23F1/00

CPC分类号： H01L21/68 ,  Y10S414/136

摘要： The present invention comprises an apparatus and method for etching at a substrate edge region. In one embodiment, the apparatus comprises a chamber having a process volume, a substrate support arranged inside the process volume and having a substrate support surface, a plasma generator coupled to the chamber and configured to supply an etching agent in a plasma phase to a peripheral region of the substrate support surface, and a gas delivery assembly coupled to a gas source for generating a radial gas flow over the substrate support surface from an approximately central region of the substrate support surface toward the peripheral region of the substrate support surface.

摘要翻译： 本发明包括用于在衬底边缘区域刻蚀的设备和方法。 在一个实施例中，该装置包括具有处理体积的腔室，布置在处理体积内的衬底支撑件并且具有衬底支撑表面，等离子体发生器，耦合到腔室并且被配置为将等离子体相中的蚀刻剂供应到外围 基板支撑表面的区域以及耦合到气体源的气体输送组件，用于从衬底支撑表面的大致中心区域朝向衬底支撑表面的周边区域产生在衬底支撑表面上的径向气流。

公开(公告)号：US20090014127A1

公开(公告)日：2009-01-15

申请号：US12106881

申请日：2008-04-21

申请人： Ashish Shah ,  Dale R. DuBois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Eui Kyoon Kim ,  Chiu Chan ,  Karthik Janakiraman ,  Thomas Nowak ,  Joseph C. Werner ,  Visweswaren Sivaramakrishnan ,  Mohamad Ayoub ,  Amir Al-Bayati ,  Jianhua Zhou

发明人： Ashish Shah ,  Dale R. DuBois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Eui Kyoon Kim ,  Chiu Chan ,  Karthik Janakiraman ,  Thomas Nowak ,  Joseph C. Werner ,  Visweswaren Sivaramakrishnan ,  Mohamad Ayoub ,  Amir Al-Bayati ,  Jianhua Zhou

IPC分类号： C23F1/02

CPC分类号： H01L21/6719 ,  H01J37/32366 ,  H01J2237/3321 ,  H01L21/67201 ,  H01L21/67207

摘要： Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions.

摘要翻译： 本文所述的实施例涉及集成衬底边缘处理能力的衬底处理系统。 处理系统的说明性示例包括但不限于工厂接口，负载锁定室，传送室和具有两个或更多个处理区域的一个或多个双处理室，其可彼此隔离并且共享公共气体供应和 普通排气泵。 每个双处理室中的处理区域包括单独的气体分配组件和RF功率源，以在每个处理区域的衬底表面上的选择性区域提供等离子体。 因此，每个双处理室被配置为允许在处理区域中的至少两个基板上同时执行多个隔离过程。

公开(公告)号：US07024105B2

公开(公告)日：2006-04-04

申请号：US10684054

申请日：2003-10-10

申请人： Mark A. Fodor ,  Sophia M. Velastegui ,  Soovo Sen ,  Visweswaren Sivaramakrishnan ,  Peter Wai-Man Lee ,  Mario David Silvetti

发明人： Mark A. Fodor ,  Sophia M. Velastegui ,  Soovo Sen ,  Visweswaren Sivaramakrishnan ,  Peter Wai-Man Lee ,  Mario David Silvetti

IPC分类号： F26B19/00

CPC分类号： C23C16/4585 ,  C23C16/46 ,  H01L21/68735

摘要： A substrate heater assembly for supporting a substrate of a predetermined standardized diameter during processing is provided. In one embodiment, the substrate heater assembly includes a body having an upper surface, a lower surface and an embedded heating element. A substrate support surface is formed in the upper surface of the body and defines a portion of a substrate receiving pocket. An annular wall is oriented perpendicular to the upper surface and has a length of at least one half a thickness of the substrate. The wall bounds an outer perimeter of the substrate receiving pocket and has a diameter less than about 0.5 mm greater than the predetermined substrate diameter.

摘要翻译： 提供了一种用于在处理期间支撑预定标准直径的基板的基板加热器组件。 在一个实施例中，基板加热器组件包括具有上表面，下表面和嵌入式加热元件的主体。 衬底支撑表面形成在主体的上表面中并且限定衬底接收袋的一部分。 环形壁垂直于上表面定向并且具有衬底的至少一半厚度的长度。 该壁限定了基板接收槽的外周边，并具有小于预定基板直径的直径小于约0.5mm的直径。