公开(公告)号：US20070134078A1

公开(公告)日：2007-06-14

申请号：US11588962

申请日：2006-10-27

申请人： Theodore Rogers ,  Norma Riley

发明人： Theodore Rogers ,  Norma Riley

IPC分类号： B65G65/00

CPC分类号： H01L21/67769 ,  Y10S414/14

摘要： The present invention comprises a stocker. The stocker comprises multiple container storage locations arranged in a horizontal array. The horizontal array of storage locations may be suspended from the facility ceiling or supported by the facility floor. The stocker may include one or more stocker robots for transporting a workpiece container within the stocker and/or to a material transport system. The stocker may also include features such as container elevators and conveyor loops.

摘要翻译： 本发明包括储料器。 储料器包括以水平阵列布置的多个容器储存位置。 存储位置的水平阵列可以从设施顶棚悬挂或由设施楼层支撑。 储料器可以包括一个或多个储料器机器人，用于将储存器内的工件容器和/或物料输送系统运送。 储料器还可以包括诸如集装箱电梯和输送机回路的特征。

公开(公告)号：US20060131903A1

公开(公告)日：2006-06-22

申请号：US11014401

申请日：2004-12-16

申请人： Anthony Bonora ,  Roger Hine ,  D. Nobles ,  Norma Riley

发明人： Anthony Bonora ,  Roger Hine ,  D. Nobles ,  Norma Riley

IPC分类号： B65G49/07

CPC分类号： H01L21/68707 ,  Y10S294/902 ,  Y10S414/141

摘要： The present invention comprises a distal rest pad for supporting a portion of a wafer seated on an end effector. In one embodiment, the rest pad includes a bottom support pad and an edge stop. Each element is mounted separately to the distal end of a support plate. The bottom support pad includes an inclined surface that transitions to a substantially horizontal surface at its distal end. The edge stop has a substantially vertical wafer contact surface that the peripheral edge of a wafer eventually contacts as the wafer is urged towards the distal rest pad. In another embodiment, the bottom support pad comprises an inclined surface. In yet another embodiment, the distal rest pad comprises a single structure. This distal rest pad includes a backstop portion and a bottom support separated by a particle collection groove. The bottom support may include an inclined lead-in surface that transitions into a flat contact surface or only comprise an inclined lead-in surface.

摘要翻译： 本发明包括用于支撑位于末端执行器上的晶片的一部分的远端休息垫。 在一个实施例中，休息垫包括底部支撑垫和边缘止动件。 每个元件分别安装到支撑板的远端。 底部支撑垫包括在其远端处转变到基本水平的表面的倾斜表面。 边缘止动器具有基本垂直的晶片接触表面，当晶片被推向远侧支撑垫时，晶片的周边边缘最终接触。 在另一个实施例中，底部支撑垫包括倾斜表面。 在另一个实施例中，远侧支撑垫包括单个结构。 该远端休息垫包括由颗粒收集槽分隔的止挡部分和底部支撑件。 底部支撑件可以包括倾斜的导入表面，其转变成平坦的接触表面或仅包括倾斜的导入表面。

公开(公告)号：US06562720B2

公开(公告)日：2003-05-13

申请号：US10077439

申请日：2002-02-14

申请人： Anna Lena Thilderkvist ,  Paul Comita ,  Lance Scudder ,  Norma Riley

发明人： Anna Lena Thilderkvist ,  Paul Comita ,  Lance Scudder ,  Norma Riley

IPC分类号： H01L21302

CPC分类号： H01L21/02046 ,  C23C16/0236 ,  C30B29/06 ,  C30B33/12 ,  H01L21/02381 ,  H01L21/02433 ,  H01L21/0245 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02658 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/67115 ,  H01L21/67155 ,  H01L21/76254 ,  Y10S438/964 ,  Y10S438/977

摘要： A method of smoothing a silicon surface formed on a substrate. According to the present invention a substrate having a silicon surface is placed into a chamber and heated to a temperature of between 1000°-1300° C. While the substrate is heated to a temperature between 1000°-1300° C., the silicon surface is exposed to a gas mix comprising H2 and HCl in the chamber to smooth the silicon surface.

公开(公告)号：US06500734B2

公开(公告)日：2002-12-31

申请号：US09325597

申请日：1999-06-02

申请人： Roger N. Anderson ,  Peter W. Hey ,  David K. Carlson ,  Mahalingam Venkatesan ,  Norma Riley

发明人： Roger N. Anderson ,  Peter W. Hey ,  David K. Carlson ,  Mahalingam Venkatesan ,  Norma Riley

IPC分类号： H01L2120

CPC分类号： C23C16/45574 ,  C23C16/45504 ,  C23C16/45512 ,  H01L21/67017 ,  H01L21/67023

摘要： A system for supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.

摘要翻译： 一种用于向具有壁的基板处理装置提供处理流体的系统，其内表面限定了处理室，其中基板支撑基座位于该处理室中。 该系统由许多流体储存器组成，每个流体存储器存储单独的处理流体，至少两个流体管道，处理流体从该流体流体流过流体储存器至处理装置;以及流体入口，其将流体导管连接到处理室。 入口具有与沿其形成的每个流体管道相对应的单独的流体通道。 每个流体通道在壁的内表面处或附近打开以限定流体混合区，从而防止沿着一个流体通道移动的流体与沿着任何其它通道移动的流体混合直至到达混合区。