公开(公告)号：US20120270155A1

公开(公告)日：2012-10-25

申请号：US13449727

申请日：2012-04-18

Applicant: Yoshitaka Komuro ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Masatoshi Arai

Inventor： Yoshitaka Komuro ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Masatoshi Arai

IPC: C07C309/23 ,  C07D327/04 ,  G03F7/20 ,  C07D493/18 ,  C08F128/02 ,  G03F7/027

CPC classification number: C07C381/12 ,  C07C309/12 ,  C07C309/19 ,  C07C309/42 ,  C07C309/43 ,  C07C311/09 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D307/93 ,  C07D493/18 ,  C08F220/28 ,  C08F228/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S522/904

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,

Abstract translation: 提供了一种新型化合物，高分子化合物，抗蚀剂组合物，酸产生剂和由通式（1-1）表示的化合物形成抗蚀剂图案的方法：其中R 1和R 3各自独立地表示单键或 二价连接基团; A表示二价连接基团; R2和R4各自独立地表示羟基，可以具有取代基的烃基或由通式（1-an1），（1-an2）或（1-an3）表示的基团），条件是至少一个 R 2和R 4表示由通式（1-an1），（1-an2）或（1-an3）表示的基团。 n0优选为0或1，并且其中Y1表示单键或-SO2-; R5表示1〜10个碳原子的直链或支链一价烃基，3〜20个碳原子的环状一价烃基或具有可被氟原子取代的环状部分结构的3〜20个碳原子的一价烃基; M +表示有机阳离子或金属阳离子，

公开(公告)号：US20120149916A1

公开(公告)日：2012-06-14

申请号：US13313993

申请日：2011-12-07

Applicant: Yoshiyuki UTSUMI ,  Masaru TAKESHITA ,  Yoshitaka Komuro

Inventor： Yoshiyuki UTSUMI ,  Masaru TAKESHITA ,  Yoshitaka Komuro

IPC: C07D333/54 ,  C07C381/12

CPC classification number: C07C311/09 ,  C07C381/12 ,  C07C2601/08 ,  C07C2603/74 ,  C07D307/33 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0397

Abstract: A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation or a metal cation).

Abstract translation: 由通式（c1）表示的化合物（R1表示可以具有取代基的碳原子数为5以上的脂环式基团; X表示二价连接基团; Y表示直链状，支链状或环状的亚烷基或亚芳基） 表示含氟原子的烃基; M +表示有机阳离子或金属阳离子）。

公开(公告)号：US07955777B2

公开(公告)日：2011-06-07

申请号：US12327549

申请日：2008-12-03

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

IPC: G03F7/00 ,  G03F7/004

CPC classification number: C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

Abstract: There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern.[Chemical Formula 1] X—Q1—Y1—SO3−M+  (I) X—Q1—Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.).

Abstract translation: 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 [化学式1] X-Q1-Y1-SO3-M +（I）X-Q1-Y1-SO3-A +（b1-1）（其中，Q1表示二价连接基或单键; Y1表示亚烷基 其可以含有取代基或可以含有取代基的氟化亚烷基; X表示含有氟原子且含有取代基的碳原子数为5〜30的芳香族环状基团，M +表示碱金属离子， A +表示有机阳离子。）

公开(公告)号：US08614049B2

公开(公告)日：2013-12-24

申请号：US13313990

申请日：2011-12-07

Applicant: Yoshiyuki Utsumi ,  Masaru Takeshita ,  Hiroaki Shimizu ,  Syo Abe ,  Yoshitaka Komuro

Inventor： Yoshiyuki Utsumi ,  Masaru Takeshita ,  Hiroaki Shimizu ,  Syo Abe ,  Yoshitaka Komuro

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/028

CPC classification number: G03F7/0397 ,  G03F7/0045

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).

Abstract translation: 一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸 发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的 或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。

公开(公告)号：US20130065180A1

公开(公告)日：2013-03-14

申请号：US13605338

申请日：2012-09-06

Applicant: Tsuyoshi Kurosawa ,  Kotaro Endo ,  Yuta Iwasawa ,  Yoshitaka Komuro ,  Akiya Kawaue

Inventor： Tsuyoshi Kurosawa ,  Kotaro Endo ,  Yuta Iwasawa ,  Yoshitaka Komuro ,  Akiya Kawaue

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A resist composition comprising: a base component (A) which exhibits changed solubility in a developing solution under action of acid; an acid-generator component (B) which generates acid upon exposure; and a compound (D1) including of a cation moiety which contains a quaternary nitrogen atom, and an anion moiety represented by formula (d1-an1) or (d1-an2) shown below. In the formulas, X represents a cyclic aliphatic hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent.

Abstract translation: 一种抗蚀剂组合物，其包含：在酸的作用下在显影液中表现出改变的溶解度的碱成分（A） 暴露时产生酸的酸发生剂组分（B）; 和包含季氮原子的阳离子部分的化合物（D1）和由下式（d1-an1）或（d1-an2）表示的阴离子部分。 式中，X表示可以具有取代基的碳原子数3〜30的环状脂肪族烃基， Y1表示可以具有取代基的1〜4个碳原子的氟化亚烷基。

公开(公告)号：US20120107744A1

公开(公告)日：2012-05-03

申请号：US13282920

申请日：2011-10-27

Applicant: Yoshiyuki Utsumi ,  Akiya Kawaue ,  Yoshitaka Komuro ,  Kenichiro Miyashita

Inventor： Yoshiyuki Utsumi ,  Akiya Kawaue ,  Yoshitaka Komuro ,  Kenichiro Miyashita

IPC: G03F7/20 ,  G03F7/027 ,  C07D311/02 ,  G03F7/004

CPC classification number: G03F7/0045 ,  C07D307/00 ,  C07D327/02 ,  C07D327/04 ,  C07D493/18 ,  C07D497/18 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/115

Abstract: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.

Abstract translation: 一种抗蚀剂组合物，其含有在酸的作用下在显影液中显示出改变的溶解性的碱成分（A）和暴露时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸发生剂 （B1）在阳离子部分具有下述通式（b1-1）表示的基团。

公开(公告)号：US20120015297A1

公开(公告)日：2012-01-19

申请号：US13177859

申请日：2011-07-07

Applicant: Yoshitaka KOMURO ,  Yoshiyuki Utsumi

Inventor： Yoshitaka KOMURO ,  Yoshiyuki Utsumi

IPC: G03F7/027 ,  C07D333/46 ,  G03F7/20

CPC classification number: C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397

Abstract: A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1), wherein R1 represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R2 represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X− represents an anion.

Abstract translation: 通式（b1）表示的化合物; 包含该化合物的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 发生剂（B1），其包含通式（b1）表示的化合物，其中R1表示氢原子，1〜10个碳原子的直链，支链或环状烷基或1〜10个碳原子的杂环基; R2表示1〜10个碳原子的直链或支链烷基; x表示0〜6的整数， n表示0〜3的整数， X-表示阴离子。

公开(公告)号：US20090162787A1

公开(公告)日：2009-06-25

申请号：US12327549

申请日：2008-12-03

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

IPC: G03F7/029 ,  G03F7/031 ,  G03F7/20 ,  C07C309/84

CPC classification number: C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

Abstract: There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern. [Chemical Formula 1] X-Q1-Y1—SO3−M+  (I) X-Q1-Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.)

Abstract translation: 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 <？in-line-formula description =“In-line Formulas”end =“lead”？> [化学式1] <？in-line-formula description =“In-line formula”end =“tail”？> ？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M +（I）<？in-line-formula description =“In-line Formulas”end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A +（b1-1）<？in-line-formula description = “其中，Q1表示二价连接基团或单键，Y1表示可以含有取代基的亚烷基或可以含有取代基的氟化亚烷基”。 X表示含有氟原子且含有取代基的5〜30个碳原子的芳香族环状基团，M +表示碱金属离子，A +表示有机阳离子。

公开(公告)号：US20090142697A1

公开(公告)日：2009-06-04

申请号：US11947850

申请日：2007-11-30

Applicant: Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

Inventor： Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

Abstract: To provide a photosensitive resin which realizes formation of a pattern having a good shape, without involving a problem in terms of poor compatibility between an acid generator and a photoresist primary-component polymer having an acid dissociable group, and a photosensitive composition containing the photosensitive resin.The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X− represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).

Abstract translation: 为了提供形成具有良好形状的图案的感光性树脂，不会引起酸产生剂和具有酸解离基团的光致抗蚀剂初级组分聚合物之间的相容性差，并且含有感光性树脂的感光性组合物 。 光敏树脂包括由式（1）表示的重复单元：（其中R1表示C2-C9直链或支链二价烃基; R2至R5各自表示氢原子或C1-C3直链或支链烃基; R6和R7表示有机基团，其中R6和R7可以一起形成二价有机基团; X代表阴离子）; 由式（2）表示的重复单元中的至少一种：其中R8表示C2-C9直链或支链烃基）和由式（3）表示的重复单元：式（4）表示的重复单元：任选地 ，式（5）表示的重复单元。