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52 条记录 (耗时 0.03 秒)

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND
    3.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND 有权
    耐蚀组合物，形成耐火图案的方法和新化合物

    公开(公告)号：US20120148955A1

    公开(公告)日：2012-06-14

    申请号：US13312013

    申请日：2011-12-06

    申请人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    发明人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    IPC分类号： G03F7/20 ,  C07D405/02 ,  C07D409/02 ,  C07D411/02 ,  G03F7/027 ,  C07D213/79

    CPC分类号： C07D213/79 ,  C07D213/80 ,  C07D215/48 ,  C07D215/50 ,  C07D215/54 ,  C07D219/04 ,  C07D221/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.

    摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在显影液中表现出改变的溶解度的碱成分（A） 含有下述通式（c1）表示的化合物（C1）的含氮有机化合物成分（C） 以及暴露后产生酸的酸产生剂组分（B），条件是化合物（C1）不在酸产生剂组分（B）中：其中RN表示可以具有取代基的含氮杂环基; X 0表示1〜10个碳原子的直链或支链的二价脂族烃基，3〜20个碳原子的环状二价脂族烃基或具有环状部分结构的3〜20个碳的二价脂肪族烃基， 这些基团中的一部分或全部氢原子被氟原子取代; M +表示有机阳离子。

    Compound, acid generator, resist composition and method of forming resist pattern
    5.
    发明授权
    Compound, acid generator, resist composition and method of forming resist pattern 有权
    化合物，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US07955777B2

    公开(公告)日：2011-06-07

    申请号：US12327549

    申请日：2008-12-03

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

    摘要： There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern.[Chemical Formula 1] X—Q1—Y1—SO3−M+  (I) X—Q1—Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.).

    摘要翻译： 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 [化学式1] X-Q1-Y1-SO3-M +（I）X-Q1-Y1-SO3-A +（b1-1）（其中，Q1表示二价连接基或单键; Y1表示亚烷基 其可以含有取代基或可以含有取代基的氟化亚烷基; X表示含有氟原子且含有取代基的碳原子数为5〜30的芳香族环状基团，M +表示碱金属离子， A +表示有机阳离子。）

    NOVEL COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    6.
    发明申请
    NOVEL COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    新型化合物，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US20090162787A1

    公开(公告)日：2009-06-25

    申请号：US12327549

    申请日：2008-12-03

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    IPC分类号： G03F7/029 ,  G03F7/031 ,  G03F7/20 ,  C07C309/84

    CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

    摘要： There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern. [Chemical Formula 1] X-Q1-Y1—SO3−M+  (I) X-Q1-Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.)

    摘要翻译： 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 <？in-line-formula description =“In-line Formulas”end =“lead”？> [化学式1] <？in-line-formula description =“In-line formula”end =“tail”？> ？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M +（I）<？in-line-formula description =“In-line Formulas”end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A +（b1-1）<？in-line-formula description = “其中，Q1表示二价连接基团或单键，Y1表示可以含有取代基的亚烷基或可以含有取代基的氟化亚烷基”。 X表示含有氟原子且含有取代基的5〜30个碳原子的芳香族环状基团，M +表示碱金属离子，A +表示有机阳离子。

    Resist composition, method of forming resist pattern, and new compound
    7.
    发明授权
    Resist composition, method of forming resist pattern, and new compound 有权
    抗蚀剂组合物，形成抗蚀剂图案的方法和新化合物

    公开(公告)号：US08846291B2

    公开(公告)日：2014-09-30

    申请号：US13312013

    申请日：2011-12-06

    申请人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    发明人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    IPC分类号： G03F7/004 ,  C07C303/32 ,  C07C309/07 ,  C07D213/79 ,  C07D213/80 ,  C07D215/48 ,  C07D215/50 ,  C07D215/54 ,  C07D219/04 ,  C07D221/10 ,  G03F7/039

    CPC分类号： C07D213/79 ,  C07D213/80 ,  C07D215/48 ,  C07D215/50 ,  C07D215/54 ,  C07D219/04 ,  C07D221/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.

    摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在显影液中表现出改变的溶解度的碱成分（A） 含有下述通式（c1）表示的化合物（C1）的含氮有机化合物成分（C） 以及暴露后产生酸的酸产生剂组分（B），条件是化合物（C1）不在酸产生剂组分（B）中：其中RN表示可以具有取代基的含氮杂环基; X 0表示1〜10个碳原子的直链或支链的二价脂族烃基，3〜20个碳原子的环状二价脂族烃基或具有环状部分结构的3〜20个碳的二价脂肪族烃基， 这些基团中的一部分或全部氢原子被氟原子取代; M +表示有机阳离子。

    Positive resist composition and method of forming resist pattern
    9.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08206891B2

    公开(公告)日：2012-06-26

    申请号：US12573686

    申请日：2009-10-05

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/123

    摘要： A positive resist composition including: a base component (A) which includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) and a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group; and an acid generator component (B) which includes an acid generator (B1) containing an anion moiety represented by the general formula (I): (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In the formula (I), X represents a cyclic group of 3 to 30 carbon atoms, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).

    摘要翻译： 一种正型抗蚀剂组合物，其包含：包含含有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）和由具有由通式（a0-1）表示的结构单元（a0））的结构单元（a1）的基础组分（A） 酸解离，溶解抑制组; 和含有由通式（I）表示的阴离子部分的酸发生剂（B1）的酸产生剂成分（B）：（式（a0-1）中，R 1表示氢原子，低级烷基 1〜5个碳原子的卤代低级烷基或1〜5个碳原子的卤代低级烷基; R2表示二价连接基团; R3表示环状骨架中含有-SO2-的环状基团，式（I）中，X表示 3〜30个碳原子的环状基团，Q1表示含有氧原子的二价连接基团，Y1表示碳原子数1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。