Patent search ap:("ASML NETHERLANDS B.V.") AND inv:"Joost Jeroen OTTENS" Page 2

11.

发明申请
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM 有权

公开(公告)号：US20210255553A1

公开(公告)日：2021-08-19

申请号：US17306670

申请日：2021-05-03

Applicant: ASML Netherlands B.V.

Inventor： Zili ZHOU , Nitesh PANDEY , Olger Victor ZWIER , Patrick WARNAAR , Maurits VAN DER SCHAAR , Elliott Gerard MC NAMARA , Arie Jeffrey DEN BOEF , Paul Christiaan HINNEN , Murat BOZKURT , Joost Jeroen OTTENS , Kaustuve BHATTACHARYYA , Michael KUBIS

IPC: G03F7/20 , G01N21/47 , G01N21/95 , G01N21/956 , G03F9/00

Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shifht (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.

12.

发明申请
SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A METHOD FOR MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS 审中-公开

公开(公告)号：US20190243256A1

公开(公告)日：2019-08-08

申请号：US16271303

申请日：2019-02-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Takeshi KANEKO , Joost Jeroen OTTENS , Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70775

Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

13.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开

公开(公告)号：US20170212432A1

公开(公告)日：2017-07-27

申请号：US15483410

申请日：2017-04-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS , Nicolaas Rudolf KEMPER , Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70866 , G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

14.

发明申请
LITHOGRAPHIC APPARATUS 有权
Title translation: LITHOGRAPHIC设备

公开(公告)号：US20160109812A1

公开(公告)日：2016-04-21

申请号：US14965467

申请日：2015-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen OTTENS , Emiel Jozef Melanie EUSSEN , Johannes Henricus Wilhelmus JACOBS , William Peter VAN DRENT , Frank STAALS , Lukasz Jerzy MACHT , Erik Willem BOGAART

IPC: G03F7/20

CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

15.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER 审中-公开
Title translation: 涉及加热器的平面设备和装置制造方法

公开(公告)号：US20160048085A1

公开(公告)日：2016-02-18

申请号：US14882241

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。

16.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
Title translation: LITHOGRAPHIC装置和装置制造方法

公开(公告)号：US20150355556A1

公开(公告)日：2015-12-10

申请号：US14831663

申请日：2015-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS , Nicolaas Rudolf KEMPER , Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70866 , G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

Abstract translation: 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

17.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权

公开(公告)号：US20220197154A1

公开(公告)日：2022-06-23

申请号：US17692859

申请日：2022-03-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Koen Jacobus Johannes Maria ZAAL , Joost Jeroen OTTENS

IPC: G03F7/20

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

18.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权

公开(公告)号：US20210173294A1

公开(公告)日：2021-06-10

申请号：US17119331

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Joost Jeroen OTTENS , Edwin Cornelis KADIJK , Sergei SHULEPOV

IPC: G03B27/42 , G03F7/20

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.