公开(公告)号：US20180286738A1

公开(公告)日：2018-10-04

申请号：US15767514

申请日：2016-09-28

Applicant: ASML Netherlands B.V.

Inventor： Mahdiar VALEFI ,  Raymond Wilhelmus Louis LAFARRE

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/687

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70775 ,  H01L21/6831 ,  H01L21/6875 ,  H01L21/68757

Abstract: A lithographic apparatus substrate table comprises a plurality of first projections, whereby the first projections define a first substrate supporting plane and a plurality of second projections, whereby the second projections define a second substrate supporting plane. The substrate table further comprises a clamping device configured to exert a clamping force onto the substrate. The second substrate supporting plane is parallel to the first substrate supporting plane. The second substrate supporting plane is offset in respect of the first substrate supporting plane in a direction perpendicular to the first and second substrate supporting planes. The lithographic apparatus substrate table is configured to support the substrate on the second projections at the second substrate supporting plane before application of the clamping force by the clamping device. The second projections are configured to deform upon application by the clamping device of the clamping force onto the substrate, thereby providing the substrate to move from the second substrate supporting plane to the first substrate supporting plane when clamped by the clamping device.

公开(公告)号：US20180267414A1

公开(公告)日：2018-09-20

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. DELPUERTO ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US20160377994A1

公开(公告)日：2016-12-29

申请号：US15261553

申请日：2016-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: G03F7/20

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的薄膜堆叠的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜叠层或薄膜叠层的孔中形成有用于支撑衬底的多个毛刺。

公开(公告)号：US20160202618A1

公开(公告)日：2016-07-14

申请号：US15078814

申请日：2016-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Abstract translation: 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。

公开(公告)号：US20150370180A1

公开(公告)日：2015-12-24

申请号：US14762452

申请日：2014-02-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Santiago E. DEL PUERTO ,  Matthew LIPSON ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Louis John MARKOYA ,  Tammo UITTERDIJK ,  Johannes VERMEULEN ,  Antonius Franciscus Johannes DE GROOT ,  Ronald VAN DER WILK

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持图案形成装置例如掩模版（300）以固定它并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

公开(公告)号：US20130162968A1

公开(公告)日：2013-06-27

申请号：US13686854

申请日：2012-11-27

Applicant: ASML Netherlands B.V.

Inventor： Antonius Franciscus Johannes DE GROOT ,  Raymond Wilhelmus Louis LAFARRE ,  Yang-Shan HUANG ,  Sander Christiaan BROERS ,  Peter Laurentius Maria ROS

IPC: G03B27/58

CPC classification number: G03F7/70758 ,  G03B27/58 ,  G03F7/70775

Abstract: A movable stage system is configured to support an object. The stage system comprises an object table configured to support the object and an object table support defining an object table support surface configured to support the object table. The object table support comprises at least one first actuator to drive the object table support in a first driving direction substantially parallel to the object table support surface. In a projection on a plane parallel to the object table support surface the at least one actuator is spaced with respect to the object table in a direction perpendicular to the first driving direction such that the risk on slip between the object table support and the object table supported thereon is decreased.

Abstract translation: 可移动台系统被配置为支撑物体。 舞台系统包括被配置为支撑对象的对象表和定义被配置为支持对象表的对象表支持表面的对象表支持。 物体台支撑件包括至少一个第一致动器，以在基本上平行于物体台支撑表面的第一驱动方向上驱动物体台支撑件。 在与物体台支撑表面平行的平面上的突起中，至少一个致动器在垂直于第一驱动方向的方向上相对于物体台间隔开，使得物体台支撑件和物体台之间的滑动风险 支撑在其上。

公开(公告)号：US20240337956A1

公开(公告)日：2024-10-10

申请号：US18578780

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Christiaan Johan HEIJMANS ,  Imre Rudolf Richard DEHNER ,  Raymond Wilhelmus Louis LAFARRE ,  Cornelis Christiaan OTTENS ,  Marcus Adrianus VAN DE KERKHOF ,  Andrey NIKIPELOV ,  Dennis VANOTTERDIJK ,  Edwin Johannes Theodorus SMULDERS ,  Andrei Mikhailovich YAKUNIN ,  Guido SALMASO ,  Luc VOORDECKERS ,  Chaitanya Krishna ANDE ,  Martinus Jacobus Johannes COENEN

IPC: G03F7/00 ,  G03F1/62

CPC classification number: G03F7/70925 ,  G03F7/70708 ,  G03F7/7085 ,  G03F7/70875 ,  G03F1/62

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.

公开(公告)号：US20210278772A1

公开(公告)日：2021-09-09

申请号：US17313054

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20210114101A1

公开(公告)日：2021-04-22

申请号：US17138480

申请日：2020-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20180308740A1

公开(公告)日：2018-10-25

申请号：US15766740

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Satish ACHANTA ,  Tiannan GUAN ,  Raymond Wilhelmus Louis LAFARRE ,  Ilya MALAKHOVSKY ,  Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC classification number: H01L21/68742 ,  G03F7/0002 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/6831 ,  H01L21/687 ,  H01L21/6875

Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.