公开(公告)号：US10012914B2

公开(公告)日：2018-07-03

申请号：US15505885

申请日：2015-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Antonius Gerardus Akkermans ,  Ruud Antonius Catharina Maria Beerens ,  Sander Christiaan Broers ,  Jeroen Johannes Theodorus Hendrikus De Best ,  Adrianus Marinus Wouter Heeren ,  George Alois Leonie Leenknegt ,  Bo Lenssen ,  Hendrikus Johannes Schellens ,  Peter Van Der Krieken ,  Theodorus Petrus Maria Cadee ,  Jan Van Eijk ,  Richard Henricus Adrianus Van Lieshout

IPC: G03F7/20 ,  G01L1/16 ,  G01P15/09

Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

公开(公告)号：US09785060B2

公开(公告)日：2017-10-10

申请号：US14423405

申请日：2013-08-19

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Rob Johan Theodoor Rutten ,  Jan Steven Christiaan Westerlaken ,  Koen Jacobus Johannes Maria Zaal ,  Richard Henricus Adrianus Van Lieshout ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20 ,  G01D5/38 ,  G01D5/34

CPC classification number: G03F7/70725 ,  G01D5/34 ,  G01D5/38 ,  G03F7/70775 ,  G03F7/70933

Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.

公开(公告)号：US09383659B2

公开(公告)日：2016-07-05

申请号：US14407038

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Andre Bernardus Jeunink ,  Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Richard Henricus Adrianus Van Lieshout ,  Henricus Martinus Johannes Van De Groes ,  Saartje Willemijn Van Der Hoeven

IPC: G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70783

Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Abstract translation: 提供了一种用于将物体定位在光刻设备中的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。

公开(公告)号：US20150212428A1

公开(公告)日：2015-07-30

申请号：US14419910

申请日：2013-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US20140340666A1

公开(公告)日：2014-11-20

申请号：US14357530

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Arno Jan Bleeker ,  Pieter Renaat Marie Hennus ,  Martinus Hendricus Henricus Hoeks ,  Sven Antoin Johan Hol ,  Harmen Klaas Van Der Schoot ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Ruud Antonius Catharina Maria Beerens ,  Olof Martinus Josephus Fischer ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Niels Johannes Maria Bosch

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。