公开(公告)号：US20210173315A1

公开(公告)日：2021-06-10

申请号：US16629337

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yang-Shan HUANG ,  Marcel Joseph Louis BOONEN ,  Han-Kwang NIENHUYS ,  Jacob BRINKERT ,  Richard Joseph BRULS ,  Peter Conrad KOCHERSPERGER

IPC: G03F7/20

Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

公开(公告)号：US20200296817A1

公开(公告)日：2020-09-17

申请号：US16649025

申请日：2018-08-16

Applicant: ASML Netherlands B.V.

Inventor： Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS

IPC: H05G2/00

Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.

公开(公告)号：US20180314164A1

公开(公告)日：2018-11-01

申请号：US15523938

申请日：2015-11-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen DEKKERS ,  Han-Kwang NIENHUYS ,  Michael Jozef Mathijs RENKENS ,  Johannes Antonius Gerardus AKKERMANS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA

IPC: G03F7/20 ,  G02B5/18 ,  G02B26/00

CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B5/1838 ,  G02B5/1861 ,  G02B6/29314 ,  G02B26/004 ,  G03F7/70266 ,  G03F7/70308

Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

公开(公告)号：US20170184975A1

公开(公告)日：2017-06-29

申请号：US15129360

申请日：2015-03-30

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Erik Roelof LOOPSTRA ,  Michael Jozef Mathijs RENKENS ,  Adrian TOMA ,  Han-Kwang NIENHUYS

IPC: G03F7/20 ,  H01F7/02 ,  H01F6/04 ,  H01S3/09 ,  H05H7/04

CPC classification number: G03F7/70025 ,  G03F7/70008 ,  H01F6/04 ,  H01F7/0273 ,  H01F7/0278 ,  H01S3/0903 ,  H05H7/04 ,  H05H2007/041

Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：US20230100123A1

公开(公告)日：2023-03-30

申请号：US17910118

申请日：2021-03-03

Applicant: ASML Netherlands B.V.

Inventor： Ilse VAN WEPEREN ,  Han-Kwang NIENHUYS ,  Teis Johan COENEN

IPC: G03F7/20 ,  G01B11/27 ,  G01B15/00

Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

公开(公告)号：US20180246414A1

公开(公告)日：2018-08-30

申请号：US15753811

申请日：2016-08-02

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Han-Kwang NIENHUYS ,  Luigi SCACCABAROZZI

IPC: G03F7/20 ,  H05G2/00 ,  G02B27/42 ,  G02B5/18

Abstract: Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.

公开(公告)号：US20180058928A1

公开(公告)日：2018-03-01

申请号：US15549133

申请日：2016-02-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Gerrit Jacobus Hendrik BRUSSAARD ,  Willem Jakobus Cornelis KOPPERT ,  Otger Jan LUITEN ,  Han-Kwang NIENHUYS ,  Job BECKERS ,  Ruud Martinus VAN DER HORST

IPC: G01J1/58 ,  G01J1/42 ,  G03F7/20 ,  H01S3/13 ,  G01T1/20

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

公开(公告)号：US20240255279A1

公开(公告)日：2024-08-01

申请号：US18561892

申请日：2022-05-09

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Patrick Philipp HELFENSTEIN ,  Sander Bas ROOBOL ,  Loes Frederique VAN RIJSWIJK ,  Sandy Claudia SCHOLZ

IPC: G01B11/27 ,  G03F7/00

CPC classification number: G01B11/27 ,  G03F7/70616 ,  G03F7/706835

Abstract: Disclosed is a method of measuring a target on a substrate using a metrology tool comprising an illumination source operable to emit an illumination beam for illuminating the target and a metrology sensor for collecting the scattered radiation having been scattered by the target. The method comprises calculating a target angle based on cell dimensions of a unit cell of said target in a first direction and a second direction orthogonal to said first direction; and order numbers of a selected pair of complementary diffraction orders in said first direction and second direction. At least one pair of measurement acquisitions is performed at a first target orientation and a second target orientation with respect to the illumination beam, wherein said target angle for at least one of said at least one pair of measurement acquisitions is an oblique angle.

公开(公告)号：US20180031982A1

公开(公告)日：2018-02-01

申请号：US15549132

申请日：2016-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang NIENHUYS ,  Erik Willem BOGAART ,  Rilpho Ludovicus Donker ,  Borgert KRUIZINGA ,  Erik Roelof LOOPSTRA ,  Hako BOTMA ,  Gosse Charles DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Johannes Jacobus Matheus BASELMANS

IPC: G03F7/20 ,  G02B5/02

Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.