公开(公告)号：US20180088468A1

公开(公告)日：2018-03-29

申请号：US15828523

申请日：2017-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  B29C43/02 ,  B82Y40/00 ,  B82Y10/00 ,  G03F7/00 ,  B29C43/14 ,  B29C43/04

CPC classification number: G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20180314164A1

公开(公告)日：2018-11-01

申请号：US15523938

申请日：2015-11-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen DEKKERS ,  Han-Kwang NIENHUYS ,  Michael Jozef Mathijs RENKENS ,  Johannes Antonius Gerardus AKKERMANS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA

IPC: G03F7/20 ,  G02B5/18 ,  G02B26/00

CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B5/1838 ,  G02B5/1861 ,  G02B6/29314 ,  G02B26/004 ,  G03F7/70266 ,  G03F7/70308

Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

公开(公告)号：US20170184975A1

公开(公告)日：2017-06-29

申请号：US15129360

申请日：2015-03-30

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Erik Roelof LOOPSTRA ,  Michael Jozef Mathijs RENKENS ,  Adrian TOMA ,  Han-Kwang NIENHUYS

IPC: G03F7/20 ,  H01F7/02 ,  H01F6/04 ,  H01S3/09 ,  H05H7/04

CPC classification number: G03F7/70025 ,  G03F7/70008 ,  H01F6/04 ,  H01F7/0273 ,  H01F7/0278 ,  H01S3/0903 ,  H05H7/04 ,  H05H2007/041

Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.

公开(公告)号：US20230221651A1

公开(公告)日：2023-07-13

申请号：US18124350

申请日：2023-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/00

CPC classification number: G03F7/7035 ,  G03F7/709 ,  G03F9/7042 ,  G03F7/70825 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/0002

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20160225477A1

公开(公告)日：2016-08-04

申请号：US14917623

申请日：2014-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Peturs Rutgerus BARTRAIJ ,  Ramon Pascal VAN GORKOM ,  Lucas Johannes Peter AMENT ,  Pieter Willem Herman DE JAGER ,  Gosse Charles DE VRIES ,  Rilpho Ludovicus DONKER ,  Wouter Joep ENGELEN ,  Olav Waldemar Vladimir FRIJNS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Andelko KATALENIC ,  Erik Roelof LOOPSTRA ,  Han-Kwang NIENHUYS ,  Andrey Alexandrovich NIKIPELOV ,  Michael Jozef Mathijs RENKENS ,  Franciscus Johannes Joseph JANSSEN ,  Borgert KRUIZINGA

IPC: G21K1/06 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。

公开(公告)号：US20210096468A1

公开(公告)日：2021-04-01

申请号：US17120506

申请日：2020-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.