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公开(公告)号：US11287743B2
公开(公告)日：2022-03-29
申请号：US16977667
申请日：2019-02-21
Applicant: ASML Netherlands B.V.
Abstract: A control system for controlling a laser, comprising a sensor for sensing a physical value indicative of a characteristic of a laser beam emitted by the laser, a switch, a first controller and a second controller. Each controller is configured, to receive a further sensor value from the sensor, adjust a received setpoint value based on the received further sensor value to give an output value and cause the laser to operate in accordance with the output value. The switch is configured to switch between the controllers such that output values are provided from each controller in a cyclic fashion.
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公开(公告)号：US20210239998A1
公开(公告)日：2021-08-05
申请号：US17240050
申请日：2021-04-26
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/20 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US11054665B2
公开(公告)日：2021-07-06
申请号：US16503073
申请日：2019-07-03
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/20 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00 , G02B19/00
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US10451890B2
公开(公告)日：2019-10-22
申请号：US15407153
申请日：2017-01-16
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G01J3/02 , G01J3/26 , G01J9/02 , G02F1/01 , G03F7/20 , H01S3/00 , H01S4/00 , G01J11/00 , G02B19/00 , G02B27/48
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US20180203248A1
公开(公告)日：2018-07-19
申请号：US15407153
申请日：2017-01-16
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op `t Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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Patent Agency Ranking
公开(公告)号：US09762023B2
公开(公告)日：2017-09-12
申请号：US14976829
申请日：2015-12-21
Applicant: CYMER, LLC , ASML NETHERLANDS B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC classification number: G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US11686951B2
公开(公告)日：2023-06-27
申请号：US17240050
申请日：2021-04-26
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/00 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00 , G02B19/00
CPC classification number: G02B27/48 , G01J3/027 , G01J3/26 , G01J9/02 , G01J11/00 , G02F1/0121 , G03F7/70008 , G03F7/70041 , G03F7/7055 , H01S3/0085 , H01S3/225 , H01S4/00 , G01J2009/0211 , G02B19/0095 , G02F2203/18 , G03F7/70025 , G03F7/70583 , H01S3/0057
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US10727642B2
公开(公告)日：2020-07-28
申请号：US15700754
申请日：2017-09-11
Applicant: Cymer, LLC , ASML NETHERLANDS B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC: G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US10146134B2
公开(公告)日：2018-12-04
申请号：US15511570
申请日：2015-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Wilhelmus Patrick Elisabeth Maria Op 'T Root
IPC: G03F7/20 , G02B26/08 , G02F1/1335
Abstract: An illumination system for a lithographic apparatus includes an array of lenses configured to receive a radiation beam and focus the beam into a plurality of sub-beams, an array of reflective elements configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam, a beam splitting device configured to split the illumination beam into a first portion and a second portion wherein the first portion is directed to be incident on a lithographic patterning device, a focusing unit configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements configured to measure the intensity of radiation which is incident on the detection plane.
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公开(公告)号：US20180006425A1
公开(公告)日：2018-01-04
申请号：US15700754
申请日：2017-09-11
Applicant: Cymer, LLC , ASML NETHERLANDS B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC classification number: H01S3/1305 , G01J1/0228 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/0385 , H01S3/09702 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S3/2333
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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